JPS5793346A - Production of photomask plate - Google Patents
Production of photomask plateInfo
- Publication number
- JPS5793346A JPS5793346A JP17040080A JP17040080A JPS5793346A JP S5793346 A JPS5793346 A JP S5793346A JP 17040080 A JP17040080 A JP 17040080A JP 17040080 A JP17040080 A JP 17040080A JP S5793346 A JPS5793346 A JP S5793346A
- Authority
- JP
- Japan
- Prior art keywords
- laser light
- metallic
- chamber
- plate
- irregularities
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17040080A JPS5793346A (en) | 1980-12-03 | 1980-12-03 | Production of photomask plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17040080A JPS5793346A (en) | 1980-12-03 | 1980-12-03 | Production of photomask plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5793346A true JPS5793346A (en) | 1982-06-10 |
Family
ID=15904218
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17040080A Pending JPS5793346A (en) | 1980-12-03 | 1980-12-03 | Production of photomask plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5793346A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59105320A (ja) * | 1982-12-08 | 1984-06-18 | Sanyo Electric Co Ltd | ホトマスクの欠損欠陥修正法 |
JPS60196942A (ja) * | 1984-03-21 | 1985-10-05 | Hitachi Ltd | フオトマスク欠陥修正方法 |
JPS60245135A (ja) * | 1984-05-18 | 1985-12-04 | Matsushita Electric Ind Co Ltd | ホトマスク修正方法 |
JPS6114640A (ja) * | 1984-06-20 | 1986-01-22 | グールド・インコーポレイテツド | フオトマスクの欠陥修正方法及び装置 |
JPS6336249A (ja) * | 1986-07-31 | 1988-02-16 | Nec Corp | ホトマスク修正方式 |
-
1980
- 1980-12-03 JP JP17040080A patent/JPS5793346A/ja active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59105320A (ja) * | 1982-12-08 | 1984-06-18 | Sanyo Electric Co Ltd | ホトマスクの欠損欠陥修正法 |
JPS60196942A (ja) * | 1984-03-21 | 1985-10-05 | Hitachi Ltd | フオトマスク欠陥修正方法 |
JPS60245135A (ja) * | 1984-05-18 | 1985-12-04 | Matsushita Electric Ind Co Ltd | ホトマスク修正方法 |
JPS6114640A (ja) * | 1984-06-20 | 1986-01-22 | グールド・インコーポレイテツド | フオトマスクの欠陥修正方法及び装置 |
JPS6336249A (ja) * | 1986-07-31 | 1988-02-16 | Nec Corp | ホトマスク修正方式 |
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