JPS5785634A - Manufacture of mold - Google Patents
Manufacture of moldInfo
- Publication number
- JPS5785634A JPS5785634A JP15945580A JP15945580A JPS5785634A JP S5785634 A JPS5785634 A JP S5785634A JP 15945580 A JP15945580 A JP 15945580A JP 15945580 A JP15945580 A JP 15945580A JP S5785634 A JPS5785634 A JP S5785634A
- Authority
- JP
- Japan
- Prior art keywords
- colloidal silica
- organic substance
- silica liquid
- mixing
- amine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15945580A JPS5785634A (en) | 1980-11-14 | 1980-11-14 | Manufacture of mold |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15945580A JPS5785634A (en) | 1980-11-14 | 1980-11-14 | Manufacture of mold |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5785634A true JPS5785634A (en) | 1982-05-28 |
Family
ID=15694131
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15945580A Pending JPS5785634A (en) | 1980-11-14 | 1980-11-14 | Manufacture of mold |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5785634A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4895592A (en) * | 1987-12-14 | 1990-01-23 | Eastman Kodak Company | High purity sputtering target material and method for preparing high purity sputtering target materials |
WO2006053192A3 (en) * | 2004-11-12 | 2007-03-08 | Nalco Co | Amino alcohol stabalized colloidal silica |
JP2021519214A (ja) * | 2018-03-30 | 2021-08-10 | ビーエイエスエフ・ソシエタス・エウロパエアBasf Se | 鋳物用鋳型の洗浄 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53130224A (en) * | 1977-04-20 | 1978-11-14 | Nippon Chemical Ind | Colloidal silica type bond for precision inverstment casting and component for precision inverstment casting mold that use th0is bond |
JPS5422775A (en) * | 1977-07-22 | 1979-02-20 | Hitachi Ltd | Semiconductor device |
JPS5422774A (en) * | 1977-07-22 | 1979-02-20 | Fujitsu Ltd | Semiconductor device |
-
1980
- 1980-11-14 JP JP15945580A patent/JPS5785634A/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53130224A (en) * | 1977-04-20 | 1978-11-14 | Nippon Chemical Ind | Colloidal silica type bond for precision inverstment casting and component for precision inverstment casting mold that use th0is bond |
JPS5422775A (en) * | 1977-07-22 | 1979-02-20 | Hitachi Ltd | Semiconductor device |
JPS5422774A (en) * | 1977-07-22 | 1979-02-20 | Fujitsu Ltd | Semiconductor device |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4895592A (en) * | 1987-12-14 | 1990-01-23 | Eastman Kodak Company | High purity sputtering target material and method for preparing high purity sputtering target materials |
WO2006053192A3 (en) * | 2004-11-12 | 2007-03-08 | Nalco Co | Amino alcohol stabalized colloidal silica |
JP2021519214A (ja) * | 2018-03-30 | 2021-08-10 | ビーエイエスエフ・ソシエタス・エウロパエアBasf Se | 鋳物用鋳型の洗浄 |
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