JPS5785634A - Manufacture of mold - Google Patents

Manufacture of mold

Info

Publication number
JPS5785634A
JPS5785634A JP15945580A JP15945580A JPS5785634A JP S5785634 A JPS5785634 A JP S5785634A JP 15945580 A JP15945580 A JP 15945580A JP 15945580 A JP15945580 A JP 15945580A JP S5785634 A JPS5785634 A JP S5785634A
Authority
JP
Japan
Prior art keywords
colloidal silica
organic substance
silica liquid
mixing
amine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15945580A
Other languages
Japanese (ja)
Inventor
Goro Sato
Yusaku Arima
Hiroyasu Nishida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SHOKUBAI KASEI KOGYO KK
JGC Catalysts and Chemicals Ltd
Original Assignee
SHOKUBAI KASEI KOGYO KK
Catalysts and Chemicals Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SHOKUBAI KASEI KOGYO KK, Catalysts and Chemicals Industries Co Ltd filed Critical SHOKUBAI KASEI KOGYO KK
Priority to JP15945580A priority Critical patent/JPS5785634A/en
Publication of JPS5785634A publication Critical patent/JPS5785634A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE: To obtain a mold excellent in strength in manufacturing a moldusing refractory mixture containing colloidal silica liquid by using an organic substance of amine group to enable homogeneous mixing.
CONSTITUTION: In manufacturing a mold using colloidal silica liquid as a binder, mixing it with powder of refractory material, and drying or burning after forming the mixture, an organic substance of amine group is mixed with the colloidal silica liquid prior to mixing. The organic substance of amine group includes methyl amine, ethyl amine, monoethanol amine etc. Allowing for dispersion, this is added slowly to the colloidal silica liquid while agitating. The proportion of mixing is 1.5:1W60; 1 in ratio of dry weight of SiO2 of the colloidal silica liquid to weight of organic substance of amine group.
COPYRIGHT: (C)1982,JPO&Japio
JP15945580A 1980-11-14 1980-11-14 Manufacture of mold Pending JPS5785634A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15945580A JPS5785634A (en) 1980-11-14 1980-11-14 Manufacture of mold

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15945580A JPS5785634A (en) 1980-11-14 1980-11-14 Manufacture of mold

Publications (1)

Publication Number Publication Date
JPS5785634A true JPS5785634A (en) 1982-05-28

Family

ID=15694131

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15945580A Pending JPS5785634A (en) 1980-11-14 1980-11-14 Manufacture of mold

Country Status (1)

Country Link
JP (1) JPS5785634A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4895592A (en) * 1987-12-14 1990-01-23 Eastman Kodak Company High purity sputtering target material and method for preparing high purity sputtering target materials
WO2006053192A3 (en) * 2004-11-12 2007-03-08 Nalco Co Amino alcohol stabalized colloidal silica
JP2021519214A (en) * 2018-03-30 2021-08-10 ビーエイエスエフ・ソシエタス・エウロパエアＢａｓｆ Ｓｅ Cleaning of casting molds

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53130224A (en) * 1977-04-20 1978-11-14 Nippon Chemical Ind Colloidal silica type bond for precision inverstment casting and component for precision inverstment casting mold that use th0is bond
JPS5422774A (en) * 1977-07-22 1979-02-20 Fujitsu Ltd Semiconductor device
JPS5422775A (en) * 1977-07-22 1979-02-20 Hitachi Ltd Semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53130224A (en) * 1977-04-20 1978-11-14 Nippon Chemical Ind Colloidal silica type bond for precision inverstment casting and component for precision inverstment casting mold that use th0is bond
JPS5422774A (en) * 1977-07-22 1979-02-20 Fujitsu Ltd Semiconductor device
JPS5422775A (en) * 1977-07-22 1979-02-20 Hitachi Ltd Semiconductor device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4895592A (en) * 1987-12-14 1990-01-23 Eastman Kodak Company High purity sputtering target material and method for preparing high purity sputtering target materials
WO2006053192A3 (en) * 2004-11-12 2007-03-08 Nalco Co Amino alcohol stabalized colloidal silica
JP2021519214A (en) * 2018-03-30 2021-08-10 ビーエイエスエフ・ソシエタス・エウロパエアＢａｓｆ Ｓｅ Cleaning of casting molds

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