JPS5785235A - Sampling stand - Google Patents

Sampling stand

Info

Publication number
JPS5785235A
JPS5785235A JP55162340A JP16234080A JPS5785235A JP S5785235 A JPS5785235 A JP S5785235A JP 55162340 A JP55162340 A JP 55162340A JP 16234080 A JP16234080 A JP 16234080A JP S5785235 A JPS5785235 A JP S5785235A
Authority
JP
Japan
Prior art keywords
loading surface
hole
wafer
sample loading
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55162340A
Other languages
Japanese (ja)
Inventor
Hiroshige Ogawa
Yoshihiko Ootsuki
Yoshihiko Kudo
Hideo Maeda
Naoto Kihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP55162340A priority Critical patent/JPS5785235A/en
Publication of JPS5785235A publication Critical patent/JPS5785235A/en
Priority to US06/499,024 priority patent/US4448404A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
    • B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
    • B25B11/005—Vacuum work holders

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To surely support a sample by providing a sample loading surface with a spiral groove surrounding a center and extending toward the circumference in a sampling stand supporting a platy sample on the sample loading surface by vacuum adsorption. CONSTITUTION:A throgh hole 2 is provided at the central section of a round sampling stand and the whole surface of a sample loading surface 10 is grinded to serve as a reference plane for reforming a wafer. A spiral groove 9 is formed by extending to the circumference section from around the through hole 2 on the sample loading surface 10. Furthermore, an adsorption hole 4 is formed at the place close to the through hole 2 of the spiral groove 9. In this case, when a wafer which is smaller than the sample loading surface 10 is held by adsprotion, leakage will occur from the groove locating outside of the wafer. However, the wafer can positively be held as the conductance of the groove up to the adsorption hole 4 can sufficiently be maintained at low value.
JP55162340A 1980-11-18 1980-11-18 Sampling stand Pending JPS5785235A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP55162340A JPS5785235A (en) 1980-11-18 1980-11-18 Sampling stand
US06/499,024 US4448404A (en) 1980-11-18 1983-06-02 Device for holding a sheet-like sample

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55162340A JPS5785235A (en) 1980-11-18 1980-11-18 Sampling stand

Publications (1)

Publication Number Publication Date
JPS5785235A true JPS5785235A (en) 1982-05-27

Family

ID=15752689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55162340A Pending JPS5785235A (en) 1980-11-18 1980-11-18 Sampling stand

Country Status (1)

Country Link
JP (1) JPS5785235A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5230741A (en) * 1990-07-16 1993-07-27 Novellus Systems, Inc. Gas-based backside protection during substrate processing
US5238499A (en) * 1990-07-16 1993-08-24 Novellus Systems, Inc. Gas-based substrate protection during processing
JPH05251544A (en) * 1992-03-05 1993-09-28 Fujitsu Ltd Conveyor
US5578532A (en) * 1990-07-16 1996-11-26 Novellus Systems, Inc. Wafer surface protection in a gas deposition process
US5620525A (en) * 1990-07-16 1997-04-15 Novellus Systems, Inc. Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate
US5843233A (en) * 1990-07-16 1998-12-01 Novellus Systems, Inc. Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus
JP2015005778A (en) * 2009-04-22 2015-01-08 エーファウ・グループ・ゲーエムベーハー Workpiece holding fixture for holding semiconductor substrate
CN104616953A (en) * 2015-02-02 2015-05-13 武汉新芯集成电路制造有限公司 Bearing device and preparation method thereof
CN106881532A (en) * 2015-12-10 2017-06-23 武汉楚天工业激光设备有限公司 Negative pressure absorption type potsherd cutting clamper and control method

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5230741A (en) * 1990-07-16 1993-07-27 Novellus Systems, Inc. Gas-based backside protection during substrate processing
US5238499A (en) * 1990-07-16 1993-08-24 Novellus Systems, Inc. Gas-based substrate protection during processing
US5578532A (en) * 1990-07-16 1996-11-26 Novellus Systems, Inc. Wafer surface protection in a gas deposition process
US5620525A (en) * 1990-07-16 1997-04-15 Novellus Systems, Inc. Apparatus for supporting a substrate and introducing gas flow doximate to an edge of the substrate
US5843233A (en) * 1990-07-16 1998-12-01 Novellus Systems, Inc. Exclusion guard and gas-based substrate protection for chemical vapor deposition apparatus
US5882417A (en) * 1990-07-16 1999-03-16 Novellus Systems, Inc. Apparatus for preventing deposition on frontside peripheral region and edge of wafer in chemical vapor deposition apparatus
US5925411A (en) * 1990-07-16 1999-07-20 Siliconix Incorporated Gas-based substrate deposition protection
JPH05251544A (en) * 1992-03-05 1993-09-28 Fujitsu Ltd Conveyor
JP2015005778A (en) * 2009-04-22 2015-01-08 エーファウ・グループ・ゲーエムベーハー Workpiece holding fixture for holding semiconductor substrate
CN104616953A (en) * 2015-02-02 2015-05-13 武汉新芯集成电路制造有限公司 Bearing device and preparation method thereof
CN106881532A (en) * 2015-12-10 2017-06-23 武汉楚天工业激光设备有限公司 Negative pressure absorption type potsherd cutting clamper and control method

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