JPS575048A - Coating method by dipping - Google Patents

Coating method by dipping

Info

Publication number
JPS575048A
JPS575048A JP7896080A JP7896080A JPS575048A JP S575048 A JPS575048 A JP S575048A JP 7896080 A JP7896080 A JP 7896080A JP 7896080 A JP7896080 A JP 7896080A JP S575048 A JPS575048 A JP S575048A
Authority
JP
Japan
Prior art keywords
speed
pulling
dipping
concn
atmosphere
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7896080A
Other languages
Japanese (ja)
Inventor
Masao Yoshikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP7896080A priority Critical patent/JPS575048A/en
Publication of JPS575048A publication Critical patent/JPS575048A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
    • G03G5/0525—Coating methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

PURPOSE:To reduce unevenness in the thickness of a photosensitive layer by changing the speed of pulling up a drum substrate for a photoreceptor during coating by dipping. CONSTITUTION:When a substrate for a photoreceptor is dipped in a coating soln. and pulled up, the pulling speed is changed. By pulling up the drum substrate at a higher speed at first and at a lower speed later, the upper part is rapidly transferred to an atmosphere with lower vapor concn., so solidification is effected at a higher speed, resulting in less sagging. The lower part is slowly placed in an atmosphere with higher vapor concn., so more sagging is caused at a lower solidifying speed. Thus, a change in the film thickness is compensated.
JP7896080A 1980-06-13 1980-06-13 Coating method by dipping Pending JPS575048A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7896080A JPS575048A (en) 1980-06-13 1980-06-13 Coating method by dipping

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7896080A JPS575048A (en) 1980-06-13 1980-06-13 Coating method by dipping

Publications (1)

Publication Number Publication Date
JPS575048A true JPS575048A (en) 1982-01-11

Family

ID=13676451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7896080A Pending JPS575048A (en) 1980-06-13 1980-06-13 Coating method by dipping

Country Status (1)

Country Link
JP (1) JPS575048A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6026344A (en) * 1983-07-22 1985-02-09 Hitachi Ltd Electrophotographic sensitive body
US4680246A (en) * 1982-06-29 1987-07-14 Mitsubishi Chemical Industries Limited Method for producing an electrophotographic element
JP2006088059A (en) * 2004-09-24 2006-04-06 Canon Chemicals Inc Dip coating method and roller for electrophotographic apparatus
US8591782B2 (en) 2002-08-23 2013-11-26 National Cerebral And Cardiovascular Center Process for producing stent

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4680246A (en) * 1982-06-29 1987-07-14 Mitsubishi Chemical Industries Limited Method for producing an electrophotographic element
JPS6026344A (en) * 1983-07-22 1985-02-09 Hitachi Ltd Electrophotographic sensitive body
JPH0447814B2 (en) * 1983-07-22 1992-08-05 Hitachi Ltd
US8591782B2 (en) 2002-08-23 2013-11-26 National Cerebral And Cardiovascular Center Process for producing stent
JP2006088059A (en) * 2004-09-24 2006-04-06 Canon Chemicals Inc Dip coating method and roller for electrophotographic apparatus

Similar Documents

Publication Publication Date Title
DE3163367D1 (en) Laminating process
JPS575048A (en) Coating method by dipping
GB2038362B (en) Method of producing smooth aluminium layers on substrates
JPS5344014A (en) Diazo photosensitive material for intermediate original
JPS5762056A (en) Electrophotographic receptor
JPS53120527A (en) Forming method of positive type radiation sensitive material layer
JPS5430797A (en) Formation method of substrate for liquid-crystal cell
JPS5567360A (en) Apparatus for coating linear article
JPS5646230A (en) Exposing method
JPS56131933A (en) Forming method of pattern of metallic film
JPS53143173A (en) Detecting method of pinholes
JPS54105959A (en) Manufacture of color picture tube
JPS53119042A (en) Transfer material forming process
JPS57191090A (en) Electric discharge recording paper and copying method using the same
JPS5354901A (en) Shielding method for electrical apparatus
JPS5376747A (en) Forming method of insulation film
JPS56115222A (en) Manufacture of frp tube with smooth external surface
JPS5536812A (en) Formation method for sand blast resist image of photosensitive resin
JPS6490063A (en) Spin coating method
JPS5766643A (en) Pattern forming method by lift-off
JPS54155235A (en) Adhesive coating device
JPS52117550A (en) Electrode formation method
JPS52120685A (en) Semi-conductor selection oxidation method
JPS5336566A (en) Method of forming coating layer varying thickness on core surface
JPS568821A (en) Formation of photoresist layer