JPS574891B2 - - Google Patents
Info
- Publication number
- JPS574891B2 JPS574891B2 JP15193878A JP15193878A JPS574891B2 JP S574891 B2 JPS574891 B2 JP S574891B2 JP 15193878 A JP15193878 A JP 15193878A JP 15193878 A JP15193878 A JP 15193878A JP S574891 B2 JPS574891 B2 JP S574891B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
- Paints Or Removers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15193878A JPS5579437A (en) | 1978-12-11 | 1978-12-11 | Photosensitive polyamide resin composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15193878A JPS5579437A (en) | 1978-12-11 | 1978-12-11 | Photosensitive polyamide resin composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5579437A JPS5579437A (en) | 1980-06-14 |
JPS574891B2 true JPS574891B2 (en) | 1982-01-28 |
Family
ID=15529478
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15193878A Granted JPS5579437A (en) | 1978-12-11 | 1978-12-11 | Photosensitive polyamide resin composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5579437A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4029264A1 (en) * | 1989-09-14 | 1991-03-28 | Asahi Chemical Ind | POLYURETHANE CONTAINING SULPHONIC ACID AND A LIGHT-SENSITIVE RESIN COMPOSITION CONTAINING SUCH AS |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58117537A (en) * | 1982-01-06 | 1983-07-13 | Toray Ind Inc | Photosensitive resin composition |
JPS59119345A (en) * | 1982-12-24 | 1984-07-10 | Toyobo Co Ltd | Photosensitive resin original plate |
JP3362797B2 (en) | 1993-04-30 | 2003-01-07 | 東洋紡績株式会社 | Photosensitive resin laminate for printing original plate |
JP2002094218A (en) * | 2000-09-18 | 2002-03-29 | Sankyo Kasei Co Ltd | Method of manufacturing molded circuit component |
JP5305793B2 (en) | 2008-03-31 | 2013-10-02 | 富士フイルム株式会社 | Relief printing plate and method for producing relief printing plate |
US20090311494A1 (en) | 2008-06-17 | 2009-12-17 | Fujifilm Corporation | Relief printing plate precursor for laser engraving, relief printing plate, and process for producing relief printing plate |
JP4247725B1 (en) | 2008-07-16 | 2009-04-02 | 東洋紡績株式会社 | Photosensitive relief printing original plate |
JP5398282B2 (en) | 2008-09-17 | 2014-01-29 | 富士フイルム株式会社 | Resin composition for laser engraving, relief printing plate precursor for laser engraving, method for producing relief printing plate, and relief printing plate |
JP6136927B2 (en) | 2011-09-09 | 2017-05-31 | 東洋紡株式会社 | Flexographic printing plate |
EP3605229B1 (en) | 2017-03-31 | 2021-09-15 | Toyobo Co., Ltd. | Photosensitive ctp flexographic printing original plate |
JP7229332B2 (en) | 2019-02-27 | 2023-02-27 | 旭化成株式会社 | Original flexographic printing plate and method for producing flexographic printing plate |
US20240152051A1 (en) | 2021-03-30 | 2024-05-09 | Asahi Kasei Kabushiki Kaisha | Flexographic printing raw plate and manufacturing method of flexographic printing plate |
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1978
- 1978-12-11 JP JP15193878A patent/JPS5579437A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4029264A1 (en) * | 1989-09-14 | 1991-03-28 | Asahi Chemical Ind | POLYURETHANE CONTAINING SULPHONIC ACID AND A LIGHT-SENSITIVE RESIN COMPOSITION CONTAINING SUCH AS |
DE4029264C2 (en) * | 1989-09-14 | 1994-03-03 | Asahi Chemical Ind | Polyurethane containing sulfonic acid groups and its use for photosensitive resin compositions |
Also Published As
Publication number | Publication date |
---|---|
JPS5579437A (en) | 1980-06-14 |