JPS574891B2 - - Google Patents

Info

Publication number
JPS574891B2
JPS574891B2 JP15193878A JP15193878A JPS574891B2 JP S574891 B2 JPS574891 B2 JP S574891B2 JP 15193878 A JP15193878 A JP 15193878A JP 15193878 A JP15193878 A JP 15193878A JP S574891 B2 JPS574891 B2 JP S574891B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15193878A
Other languages
Japanese (ja)
Other versions
JPS5579437A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15193878A priority Critical patent/JPS5579437A/en
Publication of JPS5579437A publication Critical patent/JPS5579437A/en
Publication of JPS574891B2 publication Critical patent/JPS574891B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Paints Or Removers (AREA)
JP15193878A 1978-12-11 1978-12-11 Photosensitive polyamide resin composition Granted JPS5579437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15193878A JPS5579437A (en) 1978-12-11 1978-12-11 Photosensitive polyamide resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15193878A JPS5579437A (en) 1978-12-11 1978-12-11 Photosensitive polyamide resin composition

Publications (2)

Publication Number Publication Date
JPS5579437A JPS5579437A (en) 1980-06-14
JPS574891B2 true JPS574891B2 (en) 1982-01-28

Family

ID=15529478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15193878A Granted JPS5579437A (en) 1978-12-11 1978-12-11 Photosensitive polyamide resin composition

Country Status (1)

Country Link
JP (1) JPS5579437A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4029264A1 (en) * 1989-09-14 1991-03-28 Asahi Chemical Ind POLYURETHANE CONTAINING SULPHONIC ACID AND A LIGHT-SENSITIVE RESIN COMPOSITION CONTAINING SUCH AS

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58117537A (en) * 1982-01-06 1983-07-13 Toray Ind Inc Photosensitive resin composition
JPS59119345A (en) * 1982-12-24 1984-07-10 Toyobo Co Ltd Photosensitive resin original plate
JP3362797B2 (en) 1993-04-30 2003-01-07 東洋紡績株式会社 Photosensitive resin laminate for printing original plate
JP2002094218A (en) * 2000-09-18 2002-03-29 Sankyo Kasei Co Ltd Method of manufacturing molded circuit component
JP5305793B2 (en) 2008-03-31 2013-10-02 富士フイルム株式会社 Relief printing plate and method for producing relief printing plate
US20090311494A1 (en) 2008-06-17 2009-12-17 Fujifilm Corporation Relief printing plate precursor for laser engraving, relief printing plate, and process for producing relief printing plate
JP4247725B1 (en) 2008-07-16 2009-04-02 東洋紡績株式会社 Photosensitive relief printing original plate
JP5398282B2 (en) 2008-09-17 2014-01-29 富士フイルム株式会社 Resin composition for laser engraving, relief printing plate precursor for laser engraving, method for producing relief printing plate, and relief printing plate
JP6136927B2 (en) 2011-09-09 2017-05-31 東洋紡株式会社 Flexographic printing plate
EP3605229B1 (en) 2017-03-31 2021-09-15 Toyobo Co., Ltd. Photosensitive ctp flexographic printing original plate
JP7229332B2 (en) 2019-02-27 2023-02-27 旭化成株式会社 Original flexographic printing plate and method for producing flexographic printing plate
US20240152051A1 (en) 2021-03-30 2024-05-09 Asahi Kasei Kabushiki Kaisha Flexographic printing raw plate and manufacturing method of flexographic printing plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4029264A1 (en) * 1989-09-14 1991-03-28 Asahi Chemical Ind POLYURETHANE CONTAINING SULPHONIC ACID AND A LIGHT-SENSITIVE RESIN COMPOSITION CONTAINING SUCH AS
DE4029264C2 (en) * 1989-09-14 1994-03-03 Asahi Chemical Ind Polyurethane containing sulfonic acid groups and its use for photosensitive resin compositions

Also Published As

Publication number Publication date
JPS5579437A (en) 1980-06-14

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