JPS5579437A - Photosensitive polyamide resin composition - Google Patents

Photosensitive polyamide resin composition

Info

Publication number
JPS5579437A
JPS5579437A JP15193878A JP15193878A JPS5579437A JP S5579437 A JPS5579437 A JP S5579437A JP 15193878 A JP15193878 A JP 15193878A JP 15193878 A JP15193878 A JP 15193878A JP S5579437 A JPS5579437 A JP S5579437A
Authority
JP
Japan
Prior art keywords
plate
polymer base
polyamide
unsaturated compound
molecular weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15193878A
Other languages
Japanese (ja)
Other versions
JPS574891B2 (en
Inventor
Kazumasa Chiba
Keiichi Egawa
Toshio Muraki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP15193878A priority Critical patent/JPS5579437A/en
Publication of JPS5579437A publication Critical patent/JPS5579437A/en
Publication of JPS574891B2 publication Critical patent/JPS574891B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Paints Or Removers (AREA)

Abstract

PURPOSE:To improve reproductivity of thin lines and small dots, flexibility, toughness, and other characteristics, by incorporating a photo-polymerizable unsaturated compound, etc. with a polyamide polymer base containing a specified amount of polyoxyethylene segments of high molecular weight. CONSTITUTION:A polymer base consists of a polyamide containing polyoxyethylene segments of average molecular weight 150-3000 in the molecular chain by 10-30 weight %. A photopolymerizable unsaturated compound, and when needed, a proper amount of photosensitizer, and/or thermopolymerization inhibitor are incorporated with this polymer base. This photosensitive polyamide resin domposition is formed into a sheet or the like, and leminated on a substrate. This laminate or the non-laminated sheet itself is directly used for a photosensitive resin crinting plate. A negative film is brought into close contact with this plate to expose and develop the plate, thus permitting image lines or the like to be sharply reproduced and a flexible printing plate of improved flatness or the like to be obtained.
JP15193878A 1978-12-11 1978-12-11 Photosensitive polyamide resin composition Granted JPS5579437A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15193878A JPS5579437A (en) 1978-12-11 1978-12-11 Photosensitive polyamide resin composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15193878A JPS5579437A (en) 1978-12-11 1978-12-11 Photosensitive polyamide resin composition

Publications (2)

Publication Number Publication Date
JPS5579437A true JPS5579437A (en) 1980-06-14
JPS574891B2 JPS574891B2 (en) 1982-01-28

Family

ID=15529478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15193878A Granted JPS5579437A (en) 1978-12-11 1978-12-11 Photosensitive polyamide resin composition

Country Status (1)

Country Link
JP (1) JPS5579437A (en)

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58117537A (en) * 1982-01-06 1983-07-13 Toray Ind Inc Photosensitive resin composition
JPS59119345A (en) * 1982-12-24 1984-07-10 Toyobo Co Ltd Photosensitive resin original plate
US6333134B1 (en) 1993-04-30 2001-12-25 Toyo Boseki Kabushiki Kaisha Multilayered photopolymer element including sensitivity controlling agents
JP2002094218A (en) * 2000-09-18 2002-03-29 Sankyo Kasei Co Ltd Method of manufacturing molded circuit component
EP2106906A1 (en) 2008-03-31 2009-10-07 FUJIFILM Corporation Relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate
EP2135739A2 (en) 2008-06-17 2009-12-23 FUJIFILM Corporation Relief printing plate precursor for laser engraving, relief printing plate, and process for producing relief printing plate
WO2010007707A1 (en) 2008-07-16 2010-01-21 東洋紡績株式会社 Photosensitive letterpress printing original plate
EP2165828A1 (en) 2008-09-17 2010-03-24 FUJIFILM Corporation Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same
WO2013035535A1 (en) 2011-09-09 2013-03-14 東洋紡株式会社 Flexographic printing original plate and water-developable photosensitive resin laminate
WO2018181354A1 (en) 2017-03-31 2018-10-04 東洋紡株式会社 Photosensitive ctp flexographic printing plate
WO2020175422A1 (en) 2019-02-27 2020-09-03 旭化成株式会社 Flexographic printing original plate, and method for manufacturing flexographic printing plate
WO2022210577A1 (en) 2021-03-30 2022-10-06 旭化成株式会社 Flexographic printing original plate, and method for manufacturing flexographic printing plate

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2235927B (en) * 1989-09-14 1992-10-21 Asahi Chemical Ind A sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58117537A (en) * 1982-01-06 1983-07-13 Toray Ind Inc Photosensitive resin composition
JPS59119345A (en) * 1982-12-24 1984-07-10 Toyobo Co Ltd Photosensitive resin original plate
JPH039456B2 (en) * 1982-12-24 1991-02-08 Toyo Boseki
US6333134B1 (en) 1993-04-30 2001-12-25 Toyo Boseki Kabushiki Kaisha Multilayered photopolymer element including sensitivity controlling agents
JP2002094218A (en) * 2000-09-18 2002-03-29 Sankyo Kasei Co Ltd Method of manufacturing molded circuit component
EP2106906A1 (en) 2008-03-31 2009-10-07 FUJIFILM Corporation Relief printing plate precursor for laser engraving, relief printing plate, and method of manufacturing relief printing plate
EP2135739A2 (en) 2008-06-17 2009-12-23 FUJIFILM Corporation Relief printing plate precursor for laser engraving, relief printing plate, and process for producing relief printing plate
WO2010007707A1 (en) 2008-07-16 2010-01-21 東洋紡績株式会社 Photosensitive letterpress printing original plate
EP2165828A1 (en) 2008-09-17 2010-03-24 FUJIFILM Corporation Resin composition for laser engraving, relief printing plate precursor for laser engraving, relief printing plate and method of producing the same
WO2013035535A1 (en) 2011-09-09 2013-03-14 東洋紡株式会社 Flexographic printing original plate and water-developable photosensitive resin laminate
WO2018181354A1 (en) 2017-03-31 2018-10-04 東洋紡株式会社 Photosensitive ctp flexographic printing plate
WO2020175422A1 (en) 2019-02-27 2020-09-03 旭化成株式会社 Flexographic printing original plate, and method for manufacturing flexographic printing plate
WO2022210577A1 (en) 2021-03-30 2022-10-06 旭化成株式会社 Flexographic printing original plate, and method for manufacturing flexographic printing plate

Also Published As

Publication number Publication date
JPS574891B2 (en) 1982-01-28

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