JPS5745542A - Method for construction of pattern - Google Patents

Method for construction of pattern

Info

Publication number
JPS5745542A
JPS5745542A JP12205480A JP12205480A JPS5745542A JP S5745542 A JPS5745542 A JP S5745542A JP 12205480 A JP12205480 A JP 12205480A JP 12205480 A JP12205480 A JP 12205480A JP S5745542 A JPS5745542 A JP S5745542A
Authority
JP
Japan
Prior art keywords
photomask
inert atmosphere
cassette
patterns
construction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12205480A
Other languages
Japanese (ja)
Inventor
Isao Morita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP12205480A priority Critical patent/JPS5745542A/en
Publication of JPS5745542A publication Critical patent/JPS5745542A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a photomask of good accuracy by constructing patterns for a photomask using photoresist in an inert atmosphere. CONSTITUTION:After the inside of a sealed vessel 10 is evacuated to a vacuum through a vacuum exhausting valve 11, gaseous N2 is sucked through an N2 purging valve 12, whereby an inert atmosphere is created therein. The cassette 7 on the supply side of an automatic carry-in and out device, a photomask 4 using the emulsion in this cassette 7, a passage 9 for the photomask 4, a movable stage 6, the photomask 4 on the stage 6, a cassette 8 on the receiving side, and the photomask 4 in this cassette 8 exist in the inert atmosphere, and therefore, the construction of patterns is accomplished in the inert atmosphere. Since the working atmosphere is an inert atmosphere, the reaction by which the sensitivity specks produced in exposure parts are changed to silver halide is suppressed, and the degradation in dimensional accuracy owing to insufficient density after development is obviated.
JP12205480A 1980-09-02 1980-09-02 Method for construction of pattern Pending JPS5745542A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12205480A JPS5745542A (en) 1980-09-02 1980-09-02 Method for construction of pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12205480A JPS5745542A (en) 1980-09-02 1980-09-02 Method for construction of pattern

Publications (1)

Publication Number Publication Date
JPS5745542A true JPS5745542A (en) 1982-03-15

Family

ID=14826466

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12205480A Pending JPS5745542A (en) 1980-09-02 1980-09-02 Method for construction of pattern

Country Status (1)

Country Link
JP (1) JPS5745542A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0855792A (en) * 1995-07-17 1996-02-27 Canon Inc Element formation method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0855792A (en) * 1995-07-17 1996-02-27 Canon Inc Element formation method

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