JPS5745061B2 - - Google Patents
Info
- Publication number
- JPS5745061B2 JPS5745061B2 JP4414172A JP4414172A JPS5745061B2 JP S5745061 B2 JPS5745061 B2 JP S5745061B2 JP 4414172 A JP4414172 A JP 4414172A JP 4414172 A JP4414172 A JP 4414172A JP S5745061 B2 JPS5745061 B2 JP S5745061B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/221—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities of killers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Chemically Coating (AREA)
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4414172A JPS5745061B2 (ja) | 1972-05-02 | 1972-05-02 | |
FR7315568A FR2183111B1 (ja) | 1972-05-02 | 1973-04-27 | |
GB2009073A GB1379011A (en) | 1972-05-02 | 1973-04-27 | Method of manufacturing semiconductor devices |
DE19732321390 DE2321390C3 (de) | 1972-05-02 | 1973-04-27 | Verfahren zur Herstellung einer Halbleitervorrichtung |
CA170,129A CA980918A (en) | 1972-05-02 | 1973-05-01 | Method of forming a nickel electrode on a silicon substrate |
IT4975573A IT988158B (it) | 1972-05-02 | 1973-05-02 | Procedimento per la fabbricazio ne di dispositivi a semicondut tori e prodotto ottenuto |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4414172A JPS5745061B2 (ja) | 1972-05-02 | 1972-05-02 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS495575A JPS495575A (ja) | 1974-01-18 |
JPS5745061B2 true JPS5745061B2 (ja) | 1982-09-25 |
Family
ID=12683347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4414172A Expired JPS5745061B2 (ja) | 1972-05-02 | 1972-05-02 |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS5745061B2 (ja) |
CA (1) | CA980918A (ja) |
DE (1) | DE2321390C3 (ja) |
FR (1) | FR2183111B1 (ja) |
GB (1) | GB1379011A (ja) |
IT (1) | IT988158B (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60182010A (ja) * | 1984-02-29 | 1985-09-17 | Canon Electronics Inc | ヘツド装置 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS591667A (ja) * | 1982-05-20 | 1984-01-07 | ゼネラル・エレクトリツク・カンパニイ | シリコンに対する白金の無電解めつき法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL241982A (ja) * | 1958-08-13 | 1900-01-01 | ||
NL134170C (ja) * | 1963-12-17 | 1900-01-01 | ||
DE1213921B (de) * | 1964-08-25 | 1966-04-07 | Bosch Gmbh Robert | Verfahren zur Herstellung einer Halbleiteranordnung |
DE1283970B (de) * | 1966-03-19 | 1968-11-28 | Siemens Ag | Metallischer Kontakt an einem Halbleiterbauelement |
US3599054A (en) * | 1968-11-22 | 1971-08-10 | Bell Telephone Labor Inc | Barrier layer devices and methods for their manufacture |
US3640783A (en) * | 1969-08-11 | 1972-02-08 | Trw Semiconductors Inc | Semiconductor devices with diffused platinum |
-
1972
- 1972-05-02 JP JP4414172A patent/JPS5745061B2/ja not_active Expired
-
1973
- 1973-04-27 FR FR7315568A patent/FR2183111B1/fr not_active Expired
- 1973-04-27 DE DE19732321390 patent/DE2321390C3/de not_active Expired
- 1973-04-27 GB GB2009073A patent/GB1379011A/en not_active Expired
- 1973-05-01 CA CA170,129A patent/CA980918A/en not_active Expired
- 1973-05-02 IT IT4975573A patent/IT988158B/it active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60182010A (ja) * | 1984-02-29 | 1985-09-17 | Canon Electronics Inc | ヘツド装置 |
Also Published As
Publication number | Publication date |
---|---|
IT988158B (it) | 1975-04-10 |
DE2321390B2 (de) | 1976-10-28 |
DE2321390A1 (de) | 1973-11-15 |
CA980918A (en) | 1975-12-30 |
FR2183111B1 (ja) | 1976-11-12 |
DE2321390C3 (de) | 1982-07-08 |
FR2183111A1 (ja) | 1973-12-14 |
GB1379011A (en) | 1975-01-02 |
JPS495575A (ja) | 1974-01-18 |