JPS5741714A - Position detecting and positioning method - Google Patents
Position detecting and positioning methodInfo
- Publication number
- JPS5741714A JPS5741714A JP11691680A JP11691680A JPS5741714A JP S5741714 A JPS5741714 A JP S5741714A JP 11691680 A JP11691680 A JP 11691680A JP 11691680 A JP11691680 A JP 11691680A JP S5741714 A JPS5741714 A JP S5741714A
- Authority
- JP
- Japan
- Prior art keywords
- shift
- scan
- comparison
- detected
- scanning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D3/00—Control of position or direction
- G05D3/12—Control of position or direction using feedback
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Control Of Position Or Direction (AREA)
Abstract
PURPOSE:To reduce the positioning time, by forming a V-shaped detection mark on an object to be measured and thus securing the detection for the shift of position in both X and Y directions just through a scanning action. CONSTITUTION:A V-shaped detection mark 1 is formed on a semiconductor wafer. At the same time, a reference scan (starting point Q and scanning line 4) in case when the wafer is at a prescribed position to be positioned and before detecting actual shift of position, and thus a reference scanning signal 4 is obtained. If the scan to detect the shift of position is started at R for instance, the scan 2 produces a scenning signal 5. As a result, the shift of Y direction is detected by a comparison between the spaces G and F of both pulses, and the shift of X direction can be detected by a comparison between the center positions O' and O'' of both pulses respectively.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11691680A JPS5741714A (en) | 1980-08-27 | 1980-08-27 | Position detecting and positioning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11691680A JPS5741714A (en) | 1980-08-27 | 1980-08-27 | Position detecting and positioning method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5741714A true JPS5741714A (en) | 1982-03-09 |
Family
ID=14698829
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11691680A Pending JPS5741714A (en) | 1980-08-27 | 1980-08-27 | Position detecting and positioning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5741714A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6125786A (en) * | 1984-07-11 | 1986-02-04 | 株式会社東芝 | Conveyor |
JPS61100817A (en) * | 1984-10-22 | 1986-05-19 | Canon Inc | Positioning method |
-
1980
- 1980-08-27 JP JP11691680A patent/JPS5741714A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6125786A (en) * | 1984-07-11 | 1986-02-04 | 株式会社東芝 | Conveyor |
JPS61100817A (en) * | 1984-10-22 | 1986-05-19 | Canon Inc | Positioning method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS5741714A (en) | Position detecting and positioning method | |
JPS5355983A (en) | Automatic micro defect detector | |
JPS5429977A (en) | Detection system for position | |
JPS54159876A (en) | Wafer position detection method and its unit | |
JPS5412488A (en) | Method of detecting drum flange hole position | |
JPS5337457A (en) | Distance measuring device | |
JPS57211733A (en) | Detecting device for electron beam exposing marker | |
JPS53148393A (en) | Positioning method | |
JPS53140088A (en) | Flaw detection using eddy current | |
JPS52153468A (en) | Thickness measuring method of substrates | |
JPS55123142A (en) | Rotation positioing method for semiconductor wafer | |
JPS5728333A (en) | Method for detecting aligning mark | |
JPS54145565A (en) | Position detecting method | |
JPS5481782A (en) | Position mark detecting method of electron beam exposure unit | |
JPS5315076A (en) | Electron beam position detection method | |
JPS5337455A (en) | Distance measuring device | |
JPS5365668A (en) | Electron beam exposure device | |
JPS5316651A (en) | Displacement detector | |
JPS5322759A (en) | Thickness de tector of plate form objects | |
JPS57109334A (en) | Electron beam exposing device | |
JPS5740846A (en) | Ion injector | |
JPS5488083A (en) | Manufacture for semiconductor device | |
JPS52136628A (en) | Inclination detection system | |
JPS54153579A (en) | Exposing method of electron beam | |
JPS55155223A (en) | Measuring method of main stress of magnetic material |