JPS57212405A - Focusing method for projection exposure - Google Patents

Focusing method for projection exposure

Info

Publication number
JPS57212405A
JPS57212405A JP56096654A JP9665481A JPS57212405A JP S57212405 A JPS57212405 A JP S57212405A JP 56096654 A JP56096654 A JP 56096654A JP 9665481 A JP9665481 A JP 9665481A JP S57212405 A JPS57212405 A JP S57212405A
Authority
JP
Japan
Prior art keywords
signal
data
lens
shifted
focusing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56096654A
Other languages
Japanese (ja)
Inventor
Susumu Komoriya
Hiroshi Maejima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56096654A priority Critical patent/JPS57212405A/en
Publication of JPS57212405A publication Critical patent/JPS57212405A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Focusing (AREA)

Abstract

PURPOSE:To reduce the variance of the focus position caused by the subjectivity of an operator, by obtaining the data on the height of a detecting signal at a certain rate position and giving the relative comparison to the data at each position of an objective lens or a wafer to obtain the extreme value. CONSTITUTION:An arithmetic part 9 is provided within a control system 7, and the output of a linear image sensor 6 is processed at the part 9. An automatic shift mechanism 10 is provided to an objective lens 4, and the lens 4 is shifted by the system 7 to perform the focusing. In the focusing mode, a detecting signal S1 has a waveform along an ideal signal S0, and the signal width y1 is smaller than that of the defocusing mode. The signal is sliced at a certain rate position Vth of its height, and the lens 4 is shifted to obtain the data on the signal widths y1-y3 from the intersection and the slant angles alpha1-alpha3, etc. at the position Vth. Then these extreme values are calculated to obtain the optimum focal position.
JP56096654A 1981-06-24 1981-06-24 Focusing method for projection exposure Pending JPS57212405A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56096654A JPS57212405A (en) 1981-06-24 1981-06-24 Focusing method for projection exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56096654A JPS57212405A (en) 1981-06-24 1981-06-24 Focusing method for projection exposure

Publications (1)

Publication Number Publication Date
JPS57212405A true JPS57212405A (en) 1982-12-27

Family

ID=14170813

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56096654A Pending JPS57212405A (en) 1981-06-24 1981-06-24 Focusing method for projection exposure

Country Status (1)

Country Link
JP (1) JPS57212405A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6368805A (en) * 1986-09-10 1988-03-28 Rozefu:Kk Automatic focusing method
JP2006064541A (en) * 2004-08-26 2006-03-09 Sumitomo Electric Ind Ltd Apparatus for inspecting film
JP2007140087A (en) * 2005-11-18 2007-06-07 Hitachi Kokusai Electric Inc Method and device for focusing and measuring instrument using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6368805A (en) * 1986-09-10 1988-03-28 Rozefu:Kk Automatic focusing method
JP2006064541A (en) * 2004-08-26 2006-03-09 Sumitomo Electric Ind Ltd Apparatus for inspecting film
JP2007140087A (en) * 2005-11-18 2007-06-07 Hitachi Kokusai Electric Inc Method and device for focusing and measuring instrument using the same

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