JPS57188673A - Formation of thin film by vacuum - Google Patents

Formation of thin film by vacuum

Info

Publication number
JPS57188673A
JPS57188673A JP7134781A JP7134781A JPS57188673A JP S57188673 A JPS57188673 A JP S57188673A JP 7134781 A JP7134781 A JP 7134781A JP 7134781 A JP7134781 A JP 7134781A JP S57188673 A JPS57188673 A JP S57188673A
Authority
JP
Japan
Prior art keywords
film
thin film
vacuum
formation
sticking
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7134781A
Other languages
Japanese (ja)
Inventor
Kazuo Tanida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP7134781A priority Critical patent/JPS57188673A/en
Publication of JPS57188673A publication Critical patent/JPS57188673A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form a thin film of homogeneous crystalline structure extremely easily with good reproducibility in a formation method for thin films by vacuum by irradiating laser beams to the surface of the thin film under growth. CONSTITUTION:The scattering particles A of the film components evaporated from an evaporating source are brought into collision against a substrate 1 in a vacuum, whereby nuclei 2 are formed. The particles A cause a transfer phenomenon on the substrate and form island-like structures 3. When the sticking advances further, a continuous film 4 is formed until finally an intended thin film 5 is formed. At an arbitrary point of time from the commencement of the sticking of the film components until the formation of the film 5, laser beams are irradiated continuously or intermittently, whereby the homogeneous film 5 having no structural defects is formed with good reproducibility.
JP7134781A 1981-05-14 1981-05-14 Formation of thin film by vacuum Pending JPS57188673A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7134781A JPS57188673A (en) 1981-05-14 1981-05-14 Formation of thin film by vacuum

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7134781A JPS57188673A (en) 1981-05-14 1981-05-14 Formation of thin film by vacuum

Publications (1)

Publication Number Publication Date
JPS57188673A true JPS57188673A (en) 1982-11-19

Family

ID=13457867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7134781A Pending JPS57188673A (en) 1981-05-14 1981-05-14 Formation of thin film by vacuum

Country Status (1)

Country Link
JP (1) JPS57188673A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0190051A2 (en) * 1985-01-30 1986-08-06 Kabushiki Kaisha Toshiba Method and apparatus for forming films
WO1987002713A1 (en) * 1985-10-31 1987-05-07 Ncr Corporation A method for forming an abrasion resistant coating on a transparent substrate
JPS6353254A (en) * 1986-08-21 1988-03-07 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン Dry adhering method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5665973A (en) * 1979-11-02 1981-06-04 Komatsu Ltd Vapor depositing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5665973A (en) * 1979-11-02 1981-06-04 Komatsu Ltd Vapor depositing method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0190051A2 (en) * 1985-01-30 1986-08-06 Kabushiki Kaisha Toshiba Method and apparatus for forming films
WO1987002713A1 (en) * 1985-10-31 1987-05-07 Ncr Corporation A method for forming an abrasion resistant coating on a transparent substrate
JPS6353254A (en) * 1986-08-21 1988-03-07 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン Dry adhering method

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