JPS57178323A - Manufacture of semiconductor element - Google Patents

Manufacture of semiconductor element

Info

Publication number
JPS57178323A
JPS57178323A JP6464881A JP6464881A JPS57178323A JP S57178323 A JPS57178323 A JP S57178323A JP 6464881 A JP6464881 A JP 6464881A JP 6464881 A JP6464881 A JP 6464881A JP S57178323 A JPS57178323 A JP S57178323A
Authority
JP
Japan
Prior art keywords
semiconductor element
banks
masks
substrate
manufacture
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6464881A
Other languages
Japanese (ja)
Inventor
Yoshihiro Miyamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP6464881A priority Critical patent/JPS57178323A/en
Publication of JPS57178323A publication Critical patent/JPS57178323A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
    • H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
    • H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Electrodes Of Semiconductors (AREA)

Abstract

PURPOSE:To prevent masks from touching a substrate and so forth by forming banks in regions on the substrate other than the region in which a semiconductor element is to be formed. CONSTITUTION:An insulation film 2 and a photoresistor layer 3 are formed on a substrate 1 which is made of material such as HgCdTe and on which a semiconductor element and so forth have already been formed. Then banks 3' are formed by remaining the photoresistor layer 3 on the circumference of the region 4 in which a semiconductor element is to be formed. Then metal masks 5 are placed on the banks 3' and conductive layer 6a and 6b are formed on the metal masks 5, so that the conductive layer 6b of the specified pattern is formed on the insulation film 2 as a wiring electrode. Then the masks 5 and the banks 3' are removed.
JP6464881A 1981-04-27 1981-04-27 Manufacture of semiconductor element Pending JPS57178323A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6464881A JPS57178323A (en) 1981-04-27 1981-04-27 Manufacture of semiconductor element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6464881A JPS57178323A (en) 1981-04-27 1981-04-27 Manufacture of semiconductor element

Publications (1)

Publication Number Publication Date
JPS57178323A true JPS57178323A (en) 1982-11-02

Family

ID=13264271

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6464881A Pending JPS57178323A (en) 1981-04-27 1981-04-27 Manufacture of semiconductor element

Country Status (1)

Country Link
JP (1) JPS57178323A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103700624A (en) * 2012-09-27 2014-04-02 乐金显示有限公司 Method for manufacturing of organic light emitting display device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103700624A (en) * 2012-09-27 2014-04-02 乐金显示有限公司 Method for manufacturing of organic light emitting display device
US9304397B2 (en) 2012-09-27 2016-04-05 Lg Display Co., Ltd. Method for manufacturing of organic light emitting display device

Similar Documents

Publication Publication Date Title
JPS5324277A (en) Semiconductor devic e and its production
JPS57178323A (en) Manufacture of semiconductor element
JPS5331983A (en) Production of semiconductor substrates
JPS5530803A (en) Producing method of electronic parts
JPS5232671A (en) Manufacturing process of semiconductor device
JPS57167659A (en) Manufacture of semiconductor device
JPS52117066A (en) Semiconductor device
JPS54105987A (en) Manufacture of semiconductor device
JPS5240977A (en) Process for production of semiconductor device
JPS5227274A (en) Semiconductor unit and its manufacturing process
JPS5441673A (en) Semiconductor device and its manufacture
JPS5335488A (en) Production of photoconductive element
JPS5263685A (en) Production of semiconductor device
JPS51113461A (en) A method for manufacturing semiconductor devices
JPS5240061A (en) Semiconductor device and process for production of same
JPS51126775A (en) Semiconductor unit manufacturing process
JPS5317283A (en) Production of semiconductor device
JPS556866A (en) Semiconductor device
JPS5585066A (en) Preparation of semiconductor device
JPS5317286A (en) Production of semiconductor device
JPS51112277A (en) Semiconductor device and its production method
JPS5351978A (en) Manufacture of semiconductor device
JPS56101756A (en) Manufacture of semiconductor device
JPS5743418A (en) Manufacture of semiconductor device
JPS5313882A (en) Production of semiconductor device