JPS57177342A - Plasma treating apparatus of powder - Google Patents

Plasma treating apparatus of powder

Info

Publication number
JPS57177342A
JPS57177342A JP56060683A JP6068381A JPS57177342A JP S57177342 A JPS57177342 A JP S57177342A JP 56060683 A JP56060683 A JP 56060683A JP 6068381 A JP6068381 A JP 6068381A JP S57177342 A JPS57177342 A JP S57177342A
Authority
JP
Japan
Prior art keywords
powder
plasma
microwave
antenna
plasma treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56060683A
Other languages
Japanese (ja)
Other versions
JPH0131933B2 (en
Inventor
Yoshimi Akai
Takashi Anami
Akira Taya
Masahiko Hirose
Tadashi Ido
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP56060683A priority Critical patent/JPS57177342A/en
Publication of JPS57177342A publication Critical patent/JPS57177342A/en
Publication of JPH0131933B2 publication Critical patent/JPH0131933B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/12—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electromagnetic waves
    • B01J19/122—Incoherent waves
    • B01J19/126—Microwaves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J2219/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J2219/0894—Processes carried out in the presence of a plasma

Abstract

PURPOSE:To subject a powder to plasma treatment uniformly in good efficiency by protruding an antenna into a powder plasma treating system capable of supplying and exhausting a discharging gas from a microwave generating system. CONSTITUTION:A microwave transmitting antenna from a microwave generating system 1 is protruded into a powder plasma treating system 2 comprising a cylindrical container 203 equipped with a discharging gas introducing port 201 and an exhaust port 202 and a powder stirring means 214 is further provided. In this condition, the microwave from a wave guide pipe 2 is transmitted into the container 203 by the antenna 205 and high concn. plasma is generated below a cylinder 206 to treat various kinds of powders such as a fluorescent powder, a powder for a electric cell. By this method, a powder is subjected to plasma treatment uniformly in good efficiency and characteristics such as enhancement in light emitting efficiency, electromotive force or the like are increased.
JP56060683A 1981-04-23 1981-04-23 Plasma treating apparatus of powder Granted JPS57177342A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56060683A JPS57177342A (en) 1981-04-23 1981-04-23 Plasma treating apparatus of powder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56060683A JPS57177342A (en) 1981-04-23 1981-04-23 Plasma treating apparatus of powder

Publications (2)

Publication Number Publication Date
JPS57177342A true JPS57177342A (en) 1982-11-01
JPH0131933B2 JPH0131933B2 (en) 1989-06-28

Family

ID=13149346

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56060683A Granted JPS57177342A (en) 1981-04-23 1981-04-23 Plasma treating apparatus of powder

Country Status (1)

Country Link
JP (1) JPS57177342A (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62238721A (en) * 1986-04-10 1987-10-19 Seiko Epson Corp Injection molding substrate
JPS62194433U (en) * 1986-05-30 1987-12-10
WO1998028117A1 (en) * 1996-12-20 1998-07-02 Iveco Gmbh & Co. Kg Installation for low-pressure plasma processing
JP2000186157A (en) * 1998-12-22 2000-07-04 Hitachi Cable Ltd Production of powdery crosslinked fluorine resin
JP2000186155A (en) * 1998-12-22 2000-07-04 Hitachi Cable Ltd Production of powdery crosslinked fluorine resin
WO2006028140A1 (en) * 2004-09-07 2006-03-16 Nisshin Seifun Group Inc. Process and apparatus for producing fine particle
JPWO2004112964A1 (en) * 2003-06-20 2006-07-27 株式会社ホソカワ粉体技術研究所 Powder processing method, powder processing apparatus, and method for producing porous granulated product
JP2007029859A (en) * 2005-07-27 2007-02-08 Nisshin Seifun Group Inc Production method of fine particles and apparatus
JP2014504316A (en) * 2010-12-08 2014-02-20 イノベイティブ・カーボン・リミテッド Granular materials, composite materials containing them, their preparation and use
JP2014064980A (en) * 2012-09-25 2014-04-17 Nippon Kagaku Kikai Seizo Kk Low-energy electromagnetic wave reaction apparatus
JP2021041355A (en) * 2019-09-12 2021-03-18 株式会社ニッシン Plasma treatment apparatus and plasma treatment method
JP2022028496A (en) * 2020-08-03 2022-02-16 株式会社ニッシン Plasma processing apparatus
JP2022527863A (en) * 2019-04-05 2022-06-06 パイロウェーブ・インコーポレイテッド Internally cooled impedance tuner for microwave pyrolysis system
JP2022128353A (en) * 2021-02-22 2022-09-01 エステック株式会社 Plasma treatment method and apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684462A (en) * 1979-12-10 1981-07-09 Shunpei Yamazaki Plasma nitriding method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5684462A (en) * 1979-12-10 1981-07-09 Shunpei Yamazaki Plasma nitriding method

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62238721A (en) * 1986-04-10 1987-10-19 Seiko Epson Corp Injection molding substrate
JPS62194433U (en) * 1986-05-30 1987-12-10
WO1998028117A1 (en) * 1996-12-20 1998-07-02 Iveco Gmbh & Co. Kg Installation for low-pressure plasma processing
JP2000186157A (en) * 1998-12-22 2000-07-04 Hitachi Cable Ltd Production of powdery crosslinked fluorine resin
JP2000186155A (en) * 1998-12-22 2000-07-04 Hitachi Cable Ltd Production of powdery crosslinked fluorine resin
JP4580339B2 (en) * 2003-06-20 2010-11-10 ホソカワミクロン株式会社 Powder processing method and powder processing apparatus
JPWO2004112964A1 (en) * 2003-06-20 2006-07-27 株式会社ホソカワ粉体技術研究所 Powder processing method, powder processing apparatus, and method for producing porous granulated product
US7828999B2 (en) 2004-09-07 2010-11-09 Nisshin Seifun Group Inc. Process and apparatus for producing fine particles
WO2006028140A1 (en) * 2004-09-07 2006-03-16 Nisshin Seifun Group Inc. Process and apparatus for producing fine particle
JP2007029859A (en) * 2005-07-27 2007-02-08 Nisshin Seifun Group Inc Production method of fine particles and apparatus
JP2014504316A (en) * 2010-12-08 2014-02-20 イノベイティブ・カーボン・リミテッド Granular materials, composite materials containing them, their preparation and use
US9764954B2 (en) 2010-12-08 2017-09-19 Haydale Graphene Industries Plc Particulate materials, composites comprising them, preparation and uses thereof
JP2014064980A (en) * 2012-09-25 2014-04-17 Nippon Kagaku Kikai Seizo Kk Low-energy electromagnetic wave reaction apparatus
JP2022527863A (en) * 2019-04-05 2022-06-06 パイロウェーブ・インコーポレイテッド Internally cooled impedance tuner for microwave pyrolysis system
JP2021041355A (en) * 2019-09-12 2021-03-18 株式会社ニッシン Plasma treatment apparatus and plasma treatment method
JP2022028496A (en) * 2020-08-03 2022-02-16 株式会社ニッシン Plasma processing apparatus
JP2022128353A (en) * 2021-02-22 2022-09-01 エステック株式会社 Plasma treatment method and apparatus

Also Published As

Publication number Publication date
JPH0131933B2 (en) 1989-06-28

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