JPS57169240A - Manufacture of mask for x-ray exposure - Google Patents

Manufacture of mask for x-ray exposure

Info

Publication number
JPS57169240A
JPS57169240A JP5357981A JP5357981A JPS57169240A JP S57169240 A JPS57169240 A JP S57169240A JP 5357981 A JP5357981 A JP 5357981A JP 5357981 A JP5357981 A JP 5357981A JP S57169240 A JPS57169240 A JP S57169240A
Authority
JP
Japan
Prior art keywords
film
thin
spacer
beam resist
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5357981A
Other languages
Japanese (ja)
Inventor
Masaki Ito
Sotaro Edokoro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP5357981A priority Critical patent/JPS57169240A/en
Publication of JPS57169240A publication Critical patent/JPS57169240A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To manufacture the mask for x-ray exposure in high yield by partially removing a spacer film, exposing a base thin-film and coating the thin-film with an electronic beam resist. CONSTITUTION:An X-ray transmitting supporter layer 2 is formed onto a silicon single crystal substrate, the layer 2 is coated with the base thin-film 3 for electroplating, the spacer film 4 for plating is applied onto the thin-film 3, the spacer film 4 is removed partially, a spacer removed section 30 is shaped, the base thin-film 3 is exposed and thermally cured, the electronic beam resist 5 is applied, and the surface is exposed by electronic beams. Accordingly, since the electronic beam resist film 5 is soft, an electrical contact is obtained by mechanically pressure-welding a sample to a sample holder, thus resulting in no charging of the sample, then improving yield.
JP5357981A 1981-04-09 1981-04-09 Manufacture of mask for x-ray exposure Pending JPS57169240A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5357981A JPS57169240A (en) 1981-04-09 1981-04-09 Manufacture of mask for x-ray exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5357981A JPS57169240A (en) 1981-04-09 1981-04-09 Manufacture of mask for x-ray exposure

Publications (1)

Publication Number Publication Date
JPS57169240A true JPS57169240A (en) 1982-10-18

Family

ID=12946739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5357981A Pending JPS57169240A (en) 1981-04-09 1981-04-09 Manufacture of mask for x-ray exposure

Country Status (1)

Country Link
JP (1) JPS57169240A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5333058A (en) * 1976-09-09 1978-03-28 Nec Corp Production of bump type semiconductor device
JPS5337703A (en) * 1976-09-20 1978-04-07 Kobe Steel Ltd Conversion of coal
JPS5487478A (en) * 1977-12-23 1979-07-11 Nec Corp Photo mask blank substrate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5333058A (en) * 1976-09-09 1978-03-28 Nec Corp Production of bump type semiconductor device
JPS5337703A (en) * 1976-09-20 1978-04-07 Kobe Steel Ltd Conversion of coal
JPS5487478A (en) * 1977-12-23 1979-07-11 Nec Corp Photo mask blank substrate

Similar Documents

Publication Publication Date Title
DE3575496D1 (en) PHOTORESIST EXPOSURE METHOD AND DEVICE USING AN ELECTRON BEAM WHOSE ENERGY AND CHARGE ARE CONTROLLED.
BR8405362A (en) PROCESS FOR THE MANUFACTURE OF MASKS FOR RADIOLOGICAL LITOGRAPHY
JPS57169240A (en) Manufacture of mask for x-ray exposure
EP0057268A3 (en) Method of fabricating x-ray lithographic masks
JPS6461025A (en) Method of finely processing polyimide film
JPS5594491A (en) Forming method for thick minute metal pattern
JPS54105962A (en) Projection electrode forming method for semiconductor device
JPS57202535A (en) Formation of negative resist pattern
JPS5492527A (en) Manufacture of metal foil having apertures
JPS57164413A (en) Manufacture of thin film magnetic head
JPS5711339A (en) Formation of metallic image
JPS56132343A (en) Mask for x-ray exposure and its manufacture
JPS57185438A (en) Production of x-ray exposure mask
JPS56149042A (en) Manufacture of gravure cylinder made of synthetic resin
SE8503835D0 (en) SET TO MANUFACTURE SOLAR CELLS
JPS5763829A (en) Pattern forming method
JPS5762051A (en) Manufacture of mask for x-ray exposure
JPS5691234A (en) Manufacture of mask for x-ray exposure
JPS5689741A (en) Dryplate for photomasking
JPS57104106A (en) Production of optical circuit
JPS6472309A (en) Manufacture of thin film magnetic head
JPS6462491A (en) Formation of metallic pattern
JPS57102025A (en) Manufacture of semiconductor device
JPS57153435A (en) Manufacture of semiconductor device
JPS55158635A (en) Mask