JPS57167026A - Photo mask - Google Patents
Photo maskInfo
- Publication number
- JPS57167026A JPS57167026A JP5398181A JP5398181A JPS57167026A JP S57167026 A JPS57167026 A JP S57167026A JP 5398181 A JP5398181 A JP 5398181A JP 5398181 A JP5398181 A JP 5398181A JP S57167026 A JPS57167026 A JP S57167026A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- light shielding
- amorphous semiconductor
- pattern
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010409 thin film Substances 0.000 abstract 9
- 239000004065 semiconductor Substances 0.000 abstract 3
- 238000005530 etching Methods 0.000 abstract 2
- 239000002184 metal Substances 0.000 abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000002994 raw material Substances 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02162—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors
- H01L31/02164—Coatings for devices characterised by at least one potential jump barrier or surface barrier for filtering or shielding light, e.g. multicolour filters for photodetectors for shielding light, e.g. light blocking layers, cold shields for infrared detectors
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To prevent an electrically conductive thin film from damage and to avoid pattern deformation in usage, by providing a light shielding thin film such as metal (oxide) on conductive amorphous semiconductor film formed on an insulating transparent substrate. CONSTITUTION:An amorphous semiconductor thin film 5 of high electric conductivity is formed on an insulating transparent substrate 1 with plasma decomposition method, a light shielding thin film 3 made of metal (oxide) is coated to form a bland plate. Photo resist is coated on it, exposure is partially and selectively made with a prescribed pattern and etching is made by taking a pattern 4 of photo resist obtained by development processing as a mask. The photo mask is formed without etching of an amorphous semiconductor thin film 5. Thus, stable conductivity is kept by using substance not chemically similar to the light shielding thin film as the raw material of the transparent conductive thin film, without degradation or removal of the transparent conductive thin film in the processing of light shielding thin film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5398181A JPS57167026A (en) | 1981-04-08 | 1981-04-08 | Photo mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5398181A JPS57167026A (en) | 1981-04-08 | 1981-04-08 | Photo mask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57167026A true JPS57167026A (en) | 1982-10-14 |
JPS627537B2 JPS627537B2 (en) | 1987-02-18 |
Family
ID=12957796
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5398181A Granted JPS57167026A (en) | 1981-04-08 | 1981-04-08 | Photo mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57167026A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59123840A (en) * | 1982-12-29 | 1984-07-17 | Konishiroku Photo Ind Co Ltd | Manufacture of material for exposing mask |
-
1981
- 1981-04-08 JP JP5398181A patent/JPS57167026A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59123840A (en) * | 1982-12-29 | 1984-07-17 | Konishiroku Photo Ind Co Ltd | Manufacture of material for exposing mask |
JPH0437422B2 (en) * | 1982-12-29 | 1992-06-19 | Konishiroku Photo Ind |
Also Published As
Publication number | Publication date |
---|---|
JPS627537B2 (en) | 1987-02-18 |
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