JPS57154236A - Heat development type diazo copying material - Google Patents
Heat development type diazo copying materialInfo
- Publication number
- JPS57154236A JPS57154236A JP3975281A JP3975281A JPS57154236A JP S57154236 A JPS57154236 A JP S57154236A JP 3975281 A JP3975281 A JP 3975281A JP 3975281 A JP3975281 A JP 3975281A JP S57154236 A JPS57154236 A JP S57154236A
- Authority
- JP
- Japan
- Prior art keywords
- alkyl
- substituted
- precoat layer
- high molecular
- layer contg
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/52—Compositions containing diazo compounds as photosensitive substances
- G03C1/60—Compositions containing diazo compounds as photosensitive substances with macromolecular additives
Abstract
PURPOSE:To obtain the titled low-cost material having superior raw stock preservability and giving a high density image by development at low temp. by forming a precoat layer contg. a coupling component with low solubility in water and a hydrophobic high molecular substance on a support and a photosensitive layer contg. a specified diazo compound and a color developing aid on the precoat layer. CONSTITUTION:A precoat layer contg. a coupling component with <=0.1wt% solubility in water at 20 deg.C such as 3-hydroxyphenylurea and 5-20 times as much a hydrophobic high molecular substance as the component by weight is formed on a support. the high molecular substance is obtd. by polymerizing a vinyl monomer and has 50-150 deg.C heat softening temp. On the precoat layer a photosensitive layer contg. a diazo compound represented by formulaI[where each of R<1> and R<2> is 1-5C alkyl; each of R<3> and R<4> is (substituted) alkyl or aralkyl; R<3> and R<4> may form a heterocyclic ring together with N; and X is an anion] and/or formula II [where R<5> is 1-5C alkyl, (substituted) phenyl or the like; each of R<6> and R<7> is (substituted) alkyl or aralkyl; R<6> and R<7> may form a heterocyclic ring together with N; and X is an anion] and a color developing aid represented by formula II (where R is 5-24C alkyl) is formed to manufacture the titled material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3975281A JPS57154236A (en) | 1981-03-19 | 1981-03-19 | Heat development type diazo copying material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3975281A JPS57154236A (en) | 1981-03-19 | 1981-03-19 | Heat development type diazo copying material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57154236A true JPS57154236A (en) | 1982-09-24 |
Family
ID=12561682
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3975281A Pending JPS57154236A (en) | 1981-03-19 | 1981-03-19 | Heat development type diazo copying material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57154236A (en) |
-
1981
- 1981-03-19 JP JP3975281A patent/JPS57154236A/en active Pending
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