JPS57118619A - High speed sputtering device for ferromagnetic material - Google Patents

High speed sputtering device for ferromagnetic material

Info

Publication number
JPS57118619A
JPS57118619A JP390281A JP390281A JPS57118619A JP S57118619 A JPS57118619 A JP S57118619A JP 390281 A JP390281 A JP 390281A JP 390281 A JP390281 A JP 390281A JP S57118619 A JPS57118619 A JP S57118619A
Authority
JP
Japan
Prior art keywords
target
concave groove
generating device
magnetic field
field generating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP390281A
Other languages
Japanese (ja)
Inventor
Kyuzo Nakamura
Hiroki Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Nihon Shinku Gijutsu KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc, Nihon Shinku Gijutsu KK filed Critical Ulvac Inc
Priority to JP390281A priority Critical patent/JPS57118619A/en
Publication of JPS57118619A publication Critical patent/JPS57118619A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)

Abstract

PURPOSE:To obtain ferromagnetic film quickly under a relatively low voltage and improve the mass-productivity by a method wherein a concave groove whose cross section is approximately V-shaped is formed in the front of ferromagnetic target. CONSTITUTION:A ferromagnetic target 2 such as Fe of cathode potential is provided in a vacuum processing chamber and a magnetic field generating device 3 composed of a permanent magnet or an electromagnet is provided to the back of the target 2. An effect of at least one pair of magnetic poles 4 and 4', each polarity of which is different, of the magnetic field generating device 3 is applied to the target 2 placed in front of the device 3. On the front surface of the target 2, a concave groove 6 whose cross section is approximately V-shaped is formed. With this constitution, the field of the magnetic field generating device 3 is applied to the back of the target 2 and leaks into the concave groove 6 and the leakage field opperates so as to increase the plasma density, so that the high speed sputtering can be performed.
JP390281A 1981-01-16 1981-01-16 High speed sputtering device for ferromagnetic material Pending JPS57118619A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP390281A JPS57118619A (en) 1981-01-16 1981-01-16 High speed sputtering device for ferromagnetic material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP390281A JPS57118619A (en) 1981-01-16 1981-01-16 High speed sputtering device for ferromagnetic material

Publications (1)

Publication Number Publication Date
JPS57118619A true JPS57118619A (en) 1982-07-23

Family

ID=11570117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP390281A Pending JPS57118619A (en) 1981-01-16 1981-01-16 High speed sputtering device for ferromagnetic material

Country Status (1)

Country Link
JP (1) JPS57118619A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57149471A (en) * 1981-03-07 1982-09-16 Ulvac Corp High-speed spattering device for ferromagnetic body
JPS5938385A (en) * 1982-08-16 1984-03-02 ヴアツクテツク・システムズ・インコ−ポレ−テツド Sputtering device
WO1999034029A1 (en) * 1997-12-26 1999-07-08 Japan Energy Corporation Magnetic body sputtering target
JP2002200521A (en) * 2000-12-28 2002-07-16 Toyo Seikan Kaisha Ltd Seam part cutting device for can
JP2007090499A (en) * 2005-09-29 2007-04-12 Tokyo Energy & Systems Inc Pipe cutter

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57149471A (en) * 1981-03-07 1982-09-16 Ulvac Corp High-speed spattering device for ferromagnetic body
JPS6332862B2 (en) * 1981-03-07 1988-07-01 Ulvac Corp
JPS5938385A (en) * 1982-08-16 1984-03-02 ヴアツクテツク・システムズ・インコ−ポレ−テツド Sputtering device
WO1999034029A1 (en) * 1997-12-26 1999-07-08 Japan Energy Corporation Magnetic body sputtering target
JP2002200521A (en) * 2000-12-28 2002-07-16 Toyo Seikan Kaisha Ltd Seam part cutting device for can
JP2007090499A (en) * 2005-09-29 2007-04-12 Tokyo Energy & Systems Inc Pipe cutter

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