JPS57117271A - Semiconductor memory unit - Google Patents

Semiconductor memory unit

Info

Publication number
JPS57117271A
JPS57117271A JP56003665A JP366581A JPS57117271A JP S57117271 A JPS57117271 A JP S57117271A JP 56003665 A JP56003665 A JP 56003665A JP 366581 A JP366581 A JP 366581A JP S57117271 A JPS57117271 A JP S57117271A
Authority
JP
Japan
Prior art keywords
oxide film
bit line
semiconductor substrate
junction
neighborhood
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56003665A
Other languages
Japanese (ja)
Inventor
Takayuki Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56003665A priority Critical patent/JPS57117271A/en
Publication of JPS57117271A publication Critical patent/JPS57117271A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells

Landscapes

  • Static Random-Access Memory (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Memories (AREA)

Abstract

PURPOSE:To reduce junction capacitance to be generated between a diffusion layer and a semiconductor substrate avoiding to increase the resistivity of the diffusion layer be a method wherein concentration of impurities of a bit line is made to be reduced only at the neighborhood of the junction part between an impurity layer and the semiconductor substrate. CONSTITUTION:The surface of P type silicon substrate 1 is oxidized, a thin oxide film is formed on the desired bit line region, and a thick field oxide film is formed on an insulating field region. The thin oxide film on the place to form the bit line region is etched, and arsenic and phosphorus ions are implanted therein. By applying heat treatment at 1,000 deg.C for about one hour and half, for example, N type impurity ions are made to be diffused in the semiconductor substrate still more deeply. Accordingly concentration of N type impurities at the neighborhood of the junction face becomes small, and junction capacitance can be made small.
JP56003665A 1981-01-12 1981-01-12 Semiconductor memory unit Pending JPS57117271A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56003665A JPS57117271A (en) 1981-01-12 1981-01-12 Semiconductor memory unit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56003665A JPS57117271A (en) 1981-01-12 1981-01-12 Semiconductor memory unit

Publications (1)

Publication Number Publication Date
JPS57117271A true JPS57117271A (en) 1982-07-21

Family

ID=11563729

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56003665A Pending JPS57117271A (en) 1981-01-12 1981-01-12 Semiconductor memory unit

Country Status (1)

Country Link
JP (1) JPS57117271A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5030484A (en) * 1973-07-18 1975-03-26
JPS5390888A (en) * 1977-01-21 1978-08-10 Nec Corp Integrated circuit device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5030484A (en) * 1973-07-18 1975-03-26
JPS5390888A (en) * 1977-01-21 1978-08-10 Nec Corp Integrated circuit device

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