JPS57108859A - Exposing device for film carrier - Google Patents
Exposing device for film carrierInfo
- Publication number
- JPS57108859A JPS57108859A JP55184350A JP18435080A JPS57108859A JP S57108859 A JPS57108859 A JP S57108859A JP 55184350 A JP55184350 A JP 55184350A JP 18435080 A JP18435080 A JP 18435080A JP S57108859 A JPS57108859 A JP S57108859A
- Authority
- JP
- Japan
- Prior art keywords
- carrier
- warpage
- stand
- vacuum
- film carrier
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To eliminate warpage and distortion of an image and to improve positioning accuracy and enable to expose the whole effective exposed area by subjecting a film carrier to stick to a setting stand with vacuum sucking. CONSTITUTION:In an exposing device for reducing a glass mask 1 to 1/2 size by a projecting lens 2 and to reflect onto a film carrier 3 putting upon a setting stand 4, a warpage is generated in a carrier film consisting of a copper foil and polyimide or polyester, as temp. is applied at a laminated photoresist coating process which is a precedent process of exposing process. Then, a vacuum hole 5 is provided in the stand 4 and the carrier 3 is sucked by vacuum only when it is exposed and the warpage is eliminated by sticking the carrier 3 onto the stand 4. Thereby, fine adjustment both of magnification and focus for every one foil according to the degree of warpage is unnecessary and improvement of positioning accuracy is attained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55184350A JPS57108859A (en) | 1980-12-25 | 1980-12-25 | Exposing device for film carrier |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55184350A JPS57108859A (en) | 1980-12-25 | 1980-12-25 | Exposing device for film carrier |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57108859A true JPS57108859A (en) | 1982-07-07 |
Family
ID=16151719
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55184350A Pending JPS57108859A (en) | 1980-12-25 | 1980-12-25 | Exposing device for film carrier |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57108859A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0443106A2 (en) * | 1990-02-21 | 1991-08-28 | Ushio Denki | Exposure apparatus |
-
1980
- 1980-12-25 JP JP55184350A patent/JPS57108859A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0443106A2 (en) * | 1990-02-21 | 1991-08-28 | Ushio Denki | Exposure apparatus |
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