JPS5696100A - Method and apparatus for purifying chromium plating solution - Google Patents
Method and apparatus for purifying chromium plating solutionInfo
- Publication number
- JPS5696100A JPS5696100A JP17224279A JP17224279A JPS5696100A JP S5696100 A JPS5696100 A JP S5696100A JP 17224279 A JP17224279 A JP 17224279A JP 17224279 A JP17224279 A JP 17224279A JP S5696100 A JPS5696100 A JP S5696100A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- soln
- anodic
- plating soln
- cathodic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
Abstract
PURPOSE: To purify Cr plating soln. by removing impurities, by treating the Cr plating soln. having impurities such as Fe etc. of high concn. electrolytically in a cathodic chamber of a electrolytic cell divided with a diaphragm.
CONSTITUTION: A cathodic chamber A is separated from the anodic chamber B by arranging a cylindrical ceramic diaphragm 2 of high alumina content in a cylindrical electrolytic cell 1. Deteriorated Cr plating soln. 19 increased in the content of impurities such as Fe etc. is put into the cathodic chamber A, and unused, dil. Cr plating soln. is put into the anodic chamber B. Ac voltage is applied across a cathode 3 made of stainless steel and arranged in the cathodic chamber A and an anode 4 made of lead and attached to the inner wall of the anodic chamber B thereby performing electrolysis. Chromic acid ions contained in the deteriorated plating soln. held in the cathodic chamber A enters the anodic chamber B through the diaphragm 2. With decrease in chromic acid ions contained in the plating soln. in the cathodic chamber A, the pH increases and the impurity Fe precipitates as iron oxide etc., which is separated and removed by a thickner 21. The residual soln. enters the anodic chamber B, hereby trivalent Cr is anodic oxidized to hexavalent Cr, hence the deteriorated soln. is regenerated as Cr plating soln to be utilized once again.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17224279A JPS5696100A (en) | 1979-12-28 | 1979-12-28 | Method and apparatus for purifying chromium plating solution |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17224279A JPS5696100A (en) | 1979-12-28 | 1979-12-28 | Method and apparatus for purifying chromium plating solution |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5696100A true JPS5696100A (en) | 1981-08-03 |
Family
ID=15938245
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17224279A Pending JPS5696100A (en) | 1979-12-28 | 1979-12-28 | Method and apparatus for purifying chromium plating solution |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5696100A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997027349A1 (en) * | 1996-01-24 | 1997-07-31 | Patrick Raetzo | Renegeration process and electrolysis apparatus for electrochemical purification of hexavalent chromium bath |
JP2009215581A (en) * | 2008-03-07 | 2009-09-24 | Okuno Chem Ind Co Ltd | Method of removing metallic impurities in trivalent chromium bath |
US8091467B2 (en) | 2008-04-30 | 2012-01-10 | Cascade Corporation | Hydraulic valve circuit with damage-control override |
CN105420768A (en) * | 2015-11-20 | 2016-03-23 | 沈阳黎明航空发动机(集团)有限责任公司 | Method for adjusting bivalent tin ion concentration |
-
1979
- 1979-12-28 JP JP17224279A patent/JPS5696100A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1997027349A1 (en) * | 1996-01-24 | 1997-07-31 | Patrick Raetzo | Renegeration process and electrolysis apparatus for electrochemical purification of hexavalent chromium bath |
JP2009215581A (en) * | 2008-03-07 | 2009-09-24 | Okuno Chem Ind Co Ltd | Method of removing metallic impurities in trivalent chromium bath |
US8091467B2 (en) | 2008-04-30 | 2012-01-10 | Cascade Corporation | Hydraulic valve circuit with damage-control override |
CN105420768A (en) * | 2015-11-20 | 2016-03-23 | 沈阳黎明航空发动机(集团)有限责任公司 | Method for adjusting bivalent tin ion concentration |
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