JPS5696100A - Method and apparatus for purifying chromium plating solution - Google Patents

Method and apparatus for purifying chromium plating solution

Info

Publication number
JPS5696100A
JPS5696100A JP17224279A JP17224279A JPS5696100A JP S5696100 A JPS5696100 A JP S5696100A JP 17224279 A JP17224279 A JP 17224279A JP 17224279 A JP17224279 A JP 17224279A JP S5696100 A JPS5696100 A JP S5696100A
Authority
JP
Japan
Prior art keywords
chamber
soln
anodic
plating soln
cathodic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17224279A
Other languages
Japanese (ja)
Inventor
Yasuo Tanigawa
Minoru Sugiura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to JP17224279A priority Critical patent/JPS5696100A/en
Publication of JPS5696100A publication Critical patent/JPS5696100A/en
Pending legal-status Critical Current

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  • Electroplating And Plating Baths Therefor (AREA)

Abstract

PURPOSE: To purify Cr plating soln. by removing impurities, by treating the Cr plating soln. having impurities such as Fe etc. of high concn. electrolytically in a cathodic chamber of a electrolytic cell divided with a diaphragm.
CONSTITUTION: A cathodic chamber A is separated from the anodic chamber B by arranging a cylindrical ceramic diaphragm 2 of high alumina content in a cylindrical electrolytic cell 1. Deteriorated Cr plating soln. 19 increased in the content of impurities such as Fe etc. is put into the cathodic chamber A, and unused, dil. Cr plating soln. is put into the anodic chamber B. Ac voltage is applied across a cathode 3 made of stainless steel and arranged in the cathodic chamber A and an anode 4 made of lead and attached to the inner wall of the anodic chamber B thereby performing electrolysis. Chromic acid ions contained in the deteriorated plating soln. held in the cathodic chamber A enters the anodic chamber B through the diaphragm 2. With decrease in chromic acid ions contained in the plating soln. in the cathodic chamber A, the pH increases and the impurity Fe precipitates as iron oxide etc., which is separated and removed by a thickner 21. The residual soln. enters the anodic chamber B, hereby trivalent Cr is anodic oxidized to hexavalent Cr, hence the deteriorated soln. is regenerated as Cr plating soln to be utilized once again.
COPYRIGHT: (C)1981,JPO&Japio
JP17224279A 1979-12-28 1979-12-28 Method and apparatus for purifying chromium plating solution Pending JPS5696100A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17224279A JPS5696100A (en) 1979-12-28 1979-12-28 Method and apparatus for purifying chromium plating solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17224279A JPS5696100A (en) 1979-12-28 1979-12-28 Method and apparatus for purifying chromium plating solution

Publications (1)

Publication Number Publication Date
JPS5696100A true JPS5696100A (en) 1981-08-03

Family

ID=15938245

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17224279A Pending JPS5696100A (en) 1979-12-28 1979-12-28 Method and apparatus for purifying chromium plating solution

Country Status (1)

Country Link
JP (1) JPS5696100A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997027349A1 (en) * 1996-01-24 1997-07-31 Patrick Raetzo Renegeration process and electrolysis apparatus for electrochemical purification of hexavalent chromium bath
JP2009215581A (en) * 2008-03-07 2009-09-24 Okuno Chem Ind Co Ltd Method of removing metallic impurities in trivalent chromium bath
US8091467B2 (en) 2008-04-30 2012-01-10 Cascade Corporation Hydraulic valve circuit with damage-control override
CN105420768A (en) * 2015-11-20 2016-03-23 沈阳黎明航空发动机(集团)有限责任公司 Method for adjusting bivalent tin ion concentration

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1997027349A1 (en) * 1996-01-24 1997-07-31 Patrick Raetzo Renegeration process and electrolysis apparatus for electrochemical purification of hexavalent chromium bath
JP2009215581A (en) * 2008-03-07 2009-09-24 Okuno Chem Ind Co Ltd Method of removing metallic impurities in trivalent chromium bath
US8091467B2 (en) 2008-04-30 2012-01-10 Cascade Corporation Hydraulic valve circuit with damage-control override
CN105420768A (en) * 2015-11-20 2016-03-23 沈阳黎明航空发动机(集团)有限责任公司 Method for adjusting bivalent tin ion concentration

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