JPS5692541A - Photomask printing device - Google Patents

Photomask printing device

Info

Publication number
JPS5692541A
JPS5692541A JP17083579A JP17083579A JPS5692541A JP S5692541 A JPS5692541 A JP S5692541A JP 17083579 A JP17083579 A JP 17083579A JP 17083579 A JP17083579 A JP 17083579A JP S5692541 A JPS5692541 A JP S5692541A
Authority
JP
Japan
Prior art keywords
photomask
same time
area
dry plate
printing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17083579A
Other languages
Japanese (ja)
Inventor
Takao Furukawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17083579A priority Critical patent/JPS5692541A/en
Publication of JPS5692541A publication Critical patent/JPS5692541A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To carry out photmask printing and fault detection at the same time, to simplify a photomask checking step, and to reduce operation time, by providing a photomask printing device with a surface detector. CONSTITUTION:A step-and-repeater of a printing device is provided with a surface checking device, and a pattern is printed on a dry plate placed on an exposure stage, and at the same time, the surface of the dry plate is checked. For example, a pattern is printed on area A of the surface of dry plate 4 on exposure stage 5. Beams 19 emitted from laser 11 are separated with prism 12 in a given rate, beam component 20 is projected to electron multiplier 13, other component 21 is reflected with scanning mirror 15, and reaches area B adjacent to area A, thus permitting photomask printing and surface check to be effected at the same time.
JP17083579A 1979-12-27 1979-12-27 Photomask printing device Pending JPS5692541A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17083579A JPS5692541A (en) 1979-12-27 1979-12-27 Photomask printing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17083579A JPS5692541A (en) 1979-12-27 1979-12-27 Photomask printing device

Publications (1)

Publication Number Publication Date
JPS5692541A true JPS5692541A (en) 1981-07-27

Family

ID=15912206

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17083579A Pending JPS5692541A (en) 1979-12-27 1979-12-27 Photomask printing device

Country Status (1)

Country Link
JP (1) JPS5692541A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58105152A (en) * 1981-12-17 1983-06-22 Telmec Co Ltd Dust remover for original plate in lithographic printer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58105152A (en) * 1981-12-17 1983-06-22 Telmec Co Ltd Dust remover for original plate in lithographic printer

Similar Documents

Publication Publication Date Title
US4799791A (en) Illuminance distribution measuring system
NL186353C (en) DEVICE FOR IMAGING A MASK PATTERN ON A SUBSTRATE EQUIPPED WITH AN OPTO-ELECTRONIC DETECTION SYSTEM FOR DETERMINING A DEROGATION BETWEEN THE IMAGE OF A PROJECT SYSTEM AND THE SUBSTRATE PLATE.
JPS6324618A (en) Exposure method
JPS5328375A (en) Inspecting method
JPS57192929A (en) Projector provided with automatic focusing function
JPS647618A (en) Method and apparatus for exposing semiconductor
JPS55149829A (en) Detector for foreign matter in wafer
EP0480195A3 (en) Spot-defined exposure system for a laser printer
JPS5692541A (en) Photomask printing device
JPS52143776A (en) Electron beam exposure apparatus
JPS5750433A (en) Electron beam exposure method
JPS56111218A (en) Projection and exposuring device
JPS5538509A (en) Electrophotographic printer
JPS5437685A (en) Electron beam exposure unit
JPS57104808A (en) Shape measuring apparatus
EP0086410A1 (en) Apparatus and method for exposing a substrate
JPS5329080A (en) Electron beam exposure system
JPS53113480A (en) Reflecting electron beam detector
JPS6194793A (en) Laser marking device
JPS5382492A (en) Surface inspecting method
JPS6224220A (en) Laser marking device
JPS5816239A (en) Photoresist exposing device
JPS55132248A (en) Device for engraving stamp by laser beam
JPS5698601A (en) Cubic form detection device
JPS57176041A (en) Photomask for printing circuit and exposure method using this