JPS5667151A - Electron gun frame - Google Patents

Electron gun frame

Info

Publication number
JPS5667151A
JPS5667151A JP14348179A JP14348179A JPS5667151A JP S5667151 A JPS5667151 A JP S5667151A JP 14348179 A JP14348179 A JP 14348179A JP 14348179 A JP14348179 A JP 14348179A JP S5667151 A JPS5667151 A JP S5667151A
Authority
JP
Japan
Prior art keywords
grid
aperture
deposited material
adhere
discharged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14348179A
Other languages
Japanese (ja)
Inventor
Wataru Imanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14348179A priority Critical patent/JPS5667151A/en
Publication of JPS5667151A publication Critical patent/JPS5667151A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48—Electron guns
    • H01J29/488—Schematic arrangements of the electrodes for beam forming; Place and form of the elecrodes

Abstract

PURPOSE:To prevent cold emission from being discharged from a deposited material by making the aperture diameter of the second grid differ on the first and third grid sides and reducing an electric field applied to the deposited material which is made to adhere on the aperture side wall. CONSTITUTION:The hole diameter viewed from the third grid 14 side of the aperture 32 of the second grid 15 differs from that viewed from the first grid 16 side. Accordingly, when a heater is heated at a rating twice as large as in the aging process, a deposited material 30 evaporated from a cathode powder 25 adhere to only the periphery on the first grid 16 side. It does not adhere on the side surface of the aperture 32 because the side surface is concealed by the first grid 16. On the other hand, since the electric field from third grid 14 is interrupted by the aperture on the third grid side of the second grid during operation, it hardly applies to the deposited material 30. This can prevent cold emission from being discharged from the surface of the deposited material 30.
JP14348179A 1979-11-05 1979-11-05 Electron gun frame Pending JPS5667151A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14348179A JPS5667151A (en) 1979-11-05 1979-11-05 Electron gun frame

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14348179A JPS5667151A (en) 1979-11-05 1979-11-05 Electron gun frame

Publications (1)

Publication Number Publication Date
JPS5667151A true JPS5667151A (en) 1981-06-06

Family

ID=15339698

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14348179A Pending JPS5667151A (en) 1979-11-05 1979-11-05 Electron gun frame

Country Status (1)

Country Link
JP (1) JPS5667151A (en)

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