JPS5661603A - Dimension measuring device - Google Patents

Dimension measuring device

Info

Publication number
JPS5661603A
JPS5661603A JP13724879A JP13724879A JPS5661603A JP S5661603 A JPS5661603 A JP S5661603A JP 13724879 A JP13724879 A JP 13724879A JP 13724879 A JP13724879 A JP 13724879A JP S5661603 A JPS5661603 A JP S5661603A
Authority
JP
Japan
Prior art keywords
sample
electron beams
deflecting
deflected
objective lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13724879A
Other languages
Japanese (ja)
Other versions
JPS6327641B2 (en
Inventor
Mamoru Nakasuji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP13724879A priority Critical patent/JPS5661603A/en
Publication of JPS5661603A publication Critical patent/JPS5661603A/en
Publication of JPS6327641B2 publication Critical patent/JPS6327641B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length-Measuring Devices Using Wave Or Particle Radiation (AREA)

Abstract

PURPOSE: To obtain a dimensional measurement in high precision through simple constitution by providing a deflection system to subject electron beams to deflecting control in parallel with an optical center shaft of a device body between an objective lens and a sample face, thereby detecting SEM image.
CONSTITUTION: Electron beams from an electron gun 1 are deflected at a given angle by, for example, electrostatic diflecting plates 5a, 5b, deflected counter further to pass the center of an objective lens 3 and then deflected counter by an electrostatic deflecting plate 6a so as to be irradiated on a sample 4 in parallel with an optical center shaft of a device body. SEM image of the sample 4 according to a scanning of such electron beams is detected on a sensor 7 and displayed on CRT of a monitor 9 subjected to a deflection control voltage of a voltage generator 8. The deflection control voltage is detected on a voltmeter 10 and further displayed on a display 12 through a conversion circuit 11 functioning as a conversion table of deflecting amplitude of the electron beams. Thus a dimensional measurement in high precision is obtainable simply regardless of some vertical displacement of the sample 4.
COPYRIGHT: (C)1981,JPO&Japio
JP13724879A 1979-10-24 1979-10-24 Dimension measuring device Granted JPS5661603A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13724879A JPS5661603A (en) 1979-10-24 1979-10-24 Dimension measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13724879A JPS5661603A (en) 1979-10-24 1979-10-24 Dimension measuring device

Publications (2)

Publication Number Publication Date
JPS5661603A true JPS5661603A (en) 1981-05-27
JPS6327641B2 JPS6327641B2 (en) 1988-06-03

Family

ID=15194223

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13724879A Granted JPS5661603A (en) 1979-10-24 1979-10-24 Dimension measuring device

Country Status (1)

Country Link
JP (1) JPS5661603A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012108324A (en) * 2010-11-17 2012-06-07 Ricoh Co Ltd Surface charge distribution measuring method and surface charge distribution measuring apparatus
JP2017022115A (en) * 2015-07-14 2017-01-26 アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー Method for reducing frames and color aberration within charged particle beam device, and charged particle beam device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5424262A (en) * 1977-07-26 1979-02-23 Minoru Nakamura Method of making metal granules

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5424262A (en) * 1977-07-26 1979-02-23 Minoru Nakamura Method of making metal granules

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012108324A (en) * 2010-11-17 2012-06-07 Ricoh Co Ltd Surface charge distribution measuring method and surface charge distribution measuring apparatus
JP2017022115A (en) * 2015-07-14 2017-01-26 アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー Method for reducing frames and color aberration within charged particle beam device, and charged particle beam device

Also Published As

Publication number Publication date
JPS6327641B2 (en) 1988-06-03

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