JPS5661170A - Preparation of field effect transistor - Google Patents
Preparation of field effect transistorInfo
- Publication number
- JPS5661170A JPS5661170A JP13915479A JP13915479A JPS5661170A JP S5661170 A JPS5661170 A JP S5661170A JP 13915479 A JP13915479 A JP 13915479A JP 13915479 A JP13915479 A JP 13915479A JP S5661170 A JPS5661170 A JP S5661170A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- layer
- electrode
- concave portion
- extending
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000005669 field effect Effects 0.000 title abstract 2
- 239000000758 substrate Substances 0.000 abstract 8
- 239000007772 electrode material Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/80—Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/1015—Shape
- H01L2924/10155—Shape being other than a cuboid
- H01L2924/10158—Shape being other than a cuboid at the passive surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Die Bonding (AREA)
- Junction Field-Effect Transistors (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Abstract
PURPOSE:To eliminate the need for a wire for connecting electrodes of a field effect transistor and improve its radiating efficiency by making a concave portion for forming a main electrode in the upper surface of a semiconductor substrate and allowing the electrode provided in the concave portion to directly contact with a plated heat sink provided on the substrate lower surface. CONSTITUTION:A concave portion 9 is made in an N type layer 2 on a semiinsulative substrate 1, extending into the substrate 1. The layer 2 is etched so as to leave only a portion of it extending over one of the edges of the concave portion 9 and the central portion of the substrate 1. Then a source electrode 3 is formed covering the side walls and bottom of the concave portion 9 and extending on the end of the remaining layer 2, and a gate electrode 5 and a drain electrode 4 are provided on the layer 2. After that, with only the circumference left, the lower surface of the substrate 1 is etched to allow the electrode 3 at the bottom of the concave portion 9 to be exposed, and the whole lower surface of the substrate 1 is coated with a metal layer 10 so that it contacts with the electrode 3. Then a resist layer 11 is provided on the circumference of the substrate lower surface, and a plated heat sink 12 is secured through a plated layer 14 to the layer 10 surrounded with the resist layer 11. Thus, the sink is used also as an electrode material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13915479A JPS5914906B2 (en) | 1979-10-25 | 1979-10-25 | Method for manufacturing field effect transistors |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP13915479A JPS5914906B2 (en) | 1979-10-25 | 1979-10-25 | Method for manufacturing field effect transistors |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5661170A true JPS5661170A (en) | 1981-05-26 |
JPS5914906B2 JPS5914906B2 (en) | 1984-04-06 |
Family
ID=15238818
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13915479A Expired JPS5914906B2 (en) | 1979-10-25 | 1979-10-25 | Method for manufacturing field effect transistors |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5914906B2 (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5892277A (en) * | 1981-11-28 | 1983-06-01 | Mitsubishi Electric Corp | Manufacture of field effect transistor |
JPS59117171A (en) * | 1982-12-23 | 1984-07-06 | Nec Corp | High-frequency high-output field-effect transistor |
JPS59124750A (en) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | Semiconductor device |
JPS6159753A (en) * | 1984-08-30 | 1986-03-27 | Mitsubishi Electric Corp | Via hole type semiconductor device |
JPS62222656A (en) * | 1986-03-25 | 1987-09-30 | Nec Corp | Semiconductor device |
JPS62252174A (en) * | 1986-04-24 | 1987-11-02 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device |
JPH0399470A (en) * | 1989-09-12 | 1991-04-24 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4655177A (en) * | 1985-06-28 | 1987-04-07 | Cummins Engine Company, Inc. | Rocker arm support assembly |
-
1979
- 1979-10-25 JP JP13915479A patent/JPS5914906B2/en not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5892277A (en) * | 1981-11-28 | 1983-06-01 | Mitsubishi Electric Corp | Manufacture of field effect transistor |
JPS59117171A (en) * | 1982-12-23 | 1984-07-06 | Nec Corp | High-frequency high-output field-effect transistor |
JPS59124750A (en) * | 1982-12-29 | 1984-07-18 | Fujitsu Ltd | Semiconductor device |
JPS6159753A (en) * | 1984-08-30 | 1986-03-27 | Mitsubishi Electric Corp | Via hole type semiconductor device |
JPS62222656A (en) * | 1986-03-25 | 1987-09-30 | Nec Corp | Semiconductor device |
JPS62252174A (en) * | 1986-04-24 | 1987-11-02 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device |
JPH0399470A (en) * | 1989-09-12 | 1991-04-24 | Mitsubishi Electric Corp | Manufacture of semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS5914906B2 (en) | 1984-04-06 |
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