JPS565526A - Shutter for exposure - Google Patents

Shutter for exposure

Info

Publication number
JPS565526A
JPS565526A JP8019379A JP8019379A JPS565526A JP S565526 A JPS565526 A JP S565526A JP 8019379 A JP8019379 A JP 8019379A JP 8019379 A JP8019379 A JP 8019379A JP S565526 A JPS565526 A JP S565526A
Authority
JP
Japan
Prior art keywords
shield
exposure
rotation driving
shutter
actuates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8019379A
Other languages
Japanese (ja)
Inventor
Mineo Nomoto
Minoru Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8019379A priority Critical patent/JPS565526A/en
Publication of JPS565526A publication Critical patent/JPS565526A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shutters For Cameras (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain even exposure time and make exposure intensity distribution even by providing at least two sheets of shield plates which are made identical in the opening direction and the closing direction to the shutter for exposure in a photoresist exposure device for production of semiconductors.
CONSTITUTION: This shutter is provided with e.g. two sheets of shield plates 10, 10' and the light from a mercury arc lamp 5 radiates the portion of the shield pates 10 through a reflecting mirror 6 as shown in (a) in a normal state. As a rotation driving source 8 actuates, the shield plate 10 rotates by the preset angle and opens roughly by as much the an exposure radiation face 7 as shown in (b), causing the radiated light to radiate a wafer surface. When a fixed time elapses, a timer 11 actuates to operate a rotation driving source 8' which in turn rotates the shield plate 10' in the same direction at the same speed as that of the shield plate 10 so as to assure even exposure time, thereby cutting off the radiated light as shown in (c). The shield plte 10' then stops by slightly overlapping the shield palte 10. The rotation driving sources 8, 8' are rotated in the direction opposite from before to return the shield plates 10, 10' to the normal state.
COPYRIGHT: (C)1981,JPO&Japio
JP8019379A 1979-06-27 1979-06-27 Shutter for exposure Pending JPS565526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8019379A JPS565526A (en) 1979-06-27 1979-06-27 Shutter for exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8019379A JPS565526A (en) 1979-06-27 1979-06-27 Shutter for exposure

Publications (1)

Publication Number Publication Date
JPS565526A true JPS565526A (en) 1981-01-21

Family

ID=13711539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8019379A Pending JPS565526A (en) 1979-06-27 1979-06-27 Shutter for exposure

Country Status (1)

Country Link
JP (1) JPS565526A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009222050A (en) * 2008-02-19 2009-10-01 Denso Corp Fuel injection system and accumulator fuel injection system
WO2016107543A1 (en) * 2014-12-31 2016-07-07 上海微电子装备有限公司 Self-damping shutter apparatus for exposure system of photolithography machine

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009222050A (en) * 2008-02-19 2009-10-01 Denso Corp Fuel injection system and accumulator fuel injection system
WO2016107543A1 (en) * 2014-12-31 2016-07-07 上海微电子装备有限公司 Self-damping shutter apparatus for exposure system of photolithography machine
US10133153B2 (en) 2014-12-31 2018-11-20 Shanghai Micro Electronics Equipment (Group) Co., Ltd. Self-damping shutter apparatus for exposure system of photolithography machine

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