JPS5654038A - Checking device for shape of photomask - Google Patents

Checking device for shape of photomask

Info

Publication number
JPS5654038A
JPS5654038A JP12976179A JP12976179A JPS5654038A JP S5654038 A JPS5654038 A JP S5654038A JP 12976179 A JP12976179 A JP 12976179A JP 12976179 A JP12976179 A JP 12976179A JP S5654038 A JPS5654038 A JP S5654038A
Authority
JP
Japan
Prior art keywords
reticle
base
arithmetic unit
photographing
coordinates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12976179A
Other languages
Japanese (ja)
Other versions
JPS643050B2 (en
Inventor
Tomohide Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP12976179A priority Critical patent/JPS5654038A/en
Publication of JPS5654038A publication Critical patent/JPS5654038A/en
Publication of JPS643050B2 publication Critical patent/JPS643050B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To detect an abnormal pattern of a reticle by a method wherein video- signals obtained by photographing the reticle are made binary, and compared with design pattern information dot-converted, the movement of a base and photographing are synchronized, and errors are automatically compensated. CONSTITUTION:The reticle 2 on an X-Y base 10 is irradiated by means of a light source 11, the light is projected to a solid photographing element 3a of a picture input portion 3, and a picture of x coordinates of the reticle is photographed. The positional slippage of the reticle is read from the quantity of movement in the both coordinate axis direction of the base 10 by means of a laser measuring portion 16 operated by instructions from a central arithmetic unit 15, and the positioning of fixed coordinates and continuous feed to designated coordinates are controlled 17 by the base feed information of the arithmetic unit 15. The quantity of slippage is made binary 4 through a compensation controlling portion 18 and a series-parallel converting transferring portion 20, the scanning of the sensor 3a is controlled 3b, and errors being accompanied by travelling of the base are compensated. Design pattern information dot-converted and the signals of the picture input portion 3 are read by means of the arithmetic unit 15 from a buffer memory 21, and compared, and an abnormal pattern is detected.
JP12976179A 1979-10-08 1979-10-08 Checking device for shape of photomask Granted JPS5654038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12976179A JPS5654038A (en) 1979-10-08 1979-10-08 Checking device for shape of photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12976179A JPS5654038A (en) 1979-10-08 1979-10-08 Checking device for shape of photomask

Publications (2)

Publication Number Publication Date
JPS5654038A true JPS5654038A (en) 1981-05-13
JPS643050B2 JPS643050B2 (en) 1989-01-19

Family

ID=15017537

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12976179A Granted JPS5654038A (en) 1979-10-08 1979-10-08 Checking device for shape of photomask

Country Status (1)

Country Link
JP (1) JPS5654038A (en)

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138135A (en) * 1981-02-20 1982-08-26 Hitachi Ltd Method and apparatus for inspecting pattern
JPS57159023A (en) * 1981-03-27 1982-10-01 Hitachi Ltd Inspecting device of pattern
JPS57196530A (en) * 1981-05-28 1982-12-02 Fujitsu Ltd Inspection of pattern
JPS57206025A (en) * 1981-06-01 1982-12-17 Fujitsu Ltd Pattern inspecting system
JPS5837923A (en) * 1981-08-31 1983-03-05 Toshiba Corp Inspection apparatus for photo mask
JPS5846636A (en) * 1981-09-16 1983-03-18 Nippon Jido Seigyo Kk Inspecting device for defect of pattern
JPS59173736A (en) * 1983-03-11 1984-10-01 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン Defect detector
JPS60138921A (en) * 1983-12-27 1985-07-23 Toshiba Corp Inspecting device of pattern shape
JPS60202933A (en) * 1984-03-16 1985-10-14 Fujitsu Ltd Inspecting method of reticle
US5045088A (en) * 1988-08-26 1991-09-03 Exxon Chemical Patents Inc. Chemical compositions and use as fuel additives
US5425789A (en) * 1986-12-22 1995-06-20 Exxon Chemical Patents Inc. Chemical compositions and their use as fuel additives
US5441545A (en) * 1985-08-28 1995-08-15 Exxon Chemical Patents Inc. Middle distillate compositions with improved low temperature properties
US5478368A (en) * 1990-04-19 1995-12-26 Exxon Chemical Patents Inc. Additives for distillate fuels and distillate fuels containing them
US5814110A (en) * 1986-09-24 1998-09-29 Exxon Chemical Patents Inc. Chemical compositions and use as fuel additives

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06323188A (en) * 1993-05-18 1994-11-22 Shin Caterpillar Mitsubishi Ltd Reverse preventing method for engine

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49131015A (en) * 1973-04-17 1974-12-16
JPS5341030A (en) * 1976-09-25 1978-04-14 Nippon Suidou Setsukeishiya Kk Pipe path equipment for place with large head from upper flow to lower flow
JPS5472975A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Mask inspecting method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49131015A (en) * 1973-04-17 1974-12-16
JPS5341030A (en) * 1976-09-25 1978-04-14 Nippon Suidou Setsukeishiya Kk Pipe path equipment for place with large head from upper flow to lower flow
JPS5472975A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Mask inspecting method

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57138135A (en) * 1981-02-20 1982-08-26 Hitachi Ltd Method and apparatus for inspecting pattern
JPS57159023A (en) * 1981-03-27 1982-10-01 Hitachi Ltd Inspecting device of pattern
JPS57196530A (en) * 1981-05-28 1982-12-02 Fujitsu Ltd Inspection of pattern
JPS6239811B2 (en) * 1981-05-28 1987-08-25 Fujitsu Ltd
JPS57206025A (en) * 1981-06-01 1982-12-17 Fujitsu Ltd Pattern inspecting system
JPH0140489B2 (en) * 1981-08-31 1989-08-29 Tokyo Shibaura Electric Co
JPS5837923A (en) * 1981-08-31 1983-03-05 Toshiba Corp Inspection apparatus for photo mask
JPS5846636A (en) * 1981-09-16 1983-03-18 Nippon Jido Seigyo Kk Inspecting device for defect of pattern
JPS59173736A (en) * 1983-03-11 1984-10-01 ケイエルエイ・インストラメンツ・コ−ポレ−シヨン Defect detector
JPS60138921A (en) * 1983-12-27 1985-07-23 Toshiba Corp Inspecting device of pattern shape
JPS6356702B2 (en) * 1983-12-27 1988-11-09 Tokyo Shibaura Electric Co
JPS60202933A (en) * 1984-03-16 1985-10-14 Fujitsu Ltd Inspecting method of reticle
US5441545A (en) * 1985-08-28 1995-08-15 Exxon Chemical Patents Inc. Middle distillate compositions with improved low temperature properties
US5814110A (en) * 1986-09-24 1998-09-29 Exxon Chemical Patents Inc. Chemical compositions and use as fuel additives
US5425789A (en) * 1986-12-22 1995-06-20 Exxon Chemical Patents Inc. Chemical compositions and their use as fuel additives
US5045088A (en) * 1988-08-26 1991-09-03 Exxon Chemical Patents Inc. Chemical compositions and use as fuel additives
US5478368A (en) * 1990-04-19 1995-12-26 Exxon Chemical Patents Inc. Additives for distillate fuels and distillate fuels containing them

Also Published As

Publication number Publication date
JPS643050B2 (en) 1989-01-19

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