JPS5654038A - Checking device for shape of photomask - Google Patents
Checking device for shape of photomaskInfo
- Publication number
- JPS5654038A JPS5654038A JP12976179A JP12976179A JPS5654038A JP S5654038 A JPS5654038 A JP S5654038A JP 12976179 A JP12976179 A JP 12976179A JP 12976179 A JP12976179 A JP 12976179A JP S5654038 A JPS5654038 A JP S5654038A
- Authority
- JP
- Japan
- Prior art keywords
- reticle
- base
- arithmetic unit
- photographing
- coordinates
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
- G03F1/84—Inspecting
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
PURPOSE:To detect an abnormal pattern of a reticle by a method wherein video- signals obtained by photographing the reticle are made binary, and compared with design pattern information dot-converted, the movement of a base and photographing are synchronized, and errors are automatically compensated. CONSTITUTION:The reticle 2 on an X-Y base 10 is irradiated by means of a light source 11, the light is projected to a solid photographing element 3a of a picture input portion 3, and a picture of x coordinates of the reticle is photographed. The positional slippage of the reticle is read from the quantity of movement in the both coordinate axis direction of the base 10 by means of a laser measuring portion 16 operated by instructions from a central arithmetic unit 15, and the positioning of fixed coordinates and continuous feed to designated coordinates are controlled 17 by the base feed information of the arithmetic unit 15. The quantity of slippage is made binary 4 through a compensation controlling portion 18 and a series-parallel converting transferring portion 20, the scanning of the sensor 3a is controlled 3b, and errors being accompanied by travelling of the base are compensated. Design pattern information dot-converted and the signals of the picture input portion 3 are read by means of the arithmetic unit 15 from a buffer memory 21, and compared, and an abnormal pattern is detected.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12976179A JPS5654038A (en) | 1979-10-08 | 1979-10-08 | Checking device for shape of photomask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12976179A JPS5654038A (en) | 1979-10-08 | 1979-10-08 | Checking device for shape of photomask |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5654038A true JPS5654038A (en) | 1981-05-13 |
JPS643050B2 JPS643050B2 (en) | 1989-01-19 |
Family
ID=15017537
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12976179A Granted JPS5654038A (en) | 1979-10-08 | 1979-10-08 | Checking device for shape of photomask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5654038A (en) |
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57138135A (en) * | 1981-02-20 | 1982-08-26 | Hitachi Ltd | Method and apparatus for inspecting pattern |
JPS57159023A (en) * | 1981-03-27 | 1982-10-01 | Hitachi Ltd | Inspecting device of pattern |
JPS57196530A (en) * | 1981-05-28 | 1982-12-02 | Fujitsu Ltd | Inspection of pattern |
JPS57206025A (en) * | 1981-06-01 | 1982-12-17 | Fujitsu Ltd | Pattern inspecting system |
JPS5837923A (en) * | 1981-08-31 | 1983-03-05 | Toshiba Corp | Inspection apparatus for photo mask |
JPS5846636A (en) * | 1981-09-16 | 1983-03-18 | Nippon Jido Seigyo Kk | Inspecting device for defect of pattern |
JPS59173736A (en) * | 1983-03-11 | 1984-10-01 | ケイエルエイ・インストラメンツ・コ−ポレ−シヨン | Defect detector |
JPS60138921A (en) * | 1983-12-27 | 1985-07-23 | Toshiba Corp | Inspecting device of pattern shape |
JPS60202933A (en) * | 1984-03-16 | 1985-10-14 | Fujitsu Ltd | Inspecting method of reticle |
US5045088A (en) * | 1988-08-26 | 1991-09-03 | Exxon Chemical Patents Inc. | Chemical compositions and use as fuel additives |
US5425789A (en) * | 1986-12-22 | 1995-06-20 | Exxon Chemical Patents Inc. | Chemical compositions and their use as fuel additives |
US5441545A (en) * | 1985-08-28 | 1995-08-15 | Exxon Chemical Patents Inc. | Middle distillate compositions with improved low temperature properties |
US5478368A (en) * | 1990-04-19 | 1995-12-26 | Exxon Chemical Patents Inc. | Additives for distillate fuels and distillate fuels containing them |
US5814110A (en) * | 1986-09-24 | 1998-09-29 | Exxon Chemical Patents Inc. | Chemical compositions and use as fuel additives |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06323188A (en) * | 1993-05-18 | 1994-11-22 | Shin Caterpillar Mitsubishi Ltd | Reverse preventing method for engine |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49131015A (en) * | 1973-04-17 | 1974-12-16 | ||
JPS5341030A (en) * | 1976-09-25 | 1978-04-14 | Nippon Suidou Setsukeishiya Kk | Pipe path equipment for place with large head from upper flow to lower flow |
JPS5472975A (en) * | 1977-11-24 | 1979-06-11 | Hitachi Ltd | Mask inspecting method |
-
1979
- 1979-10-08 JP JP12976179A patent/JPS5654038A/en active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49131015A (en) * | 1973-04-17 | 1974-12-16 | ||
JPS5341030A (en) * | 1976-09-25 | 1978-04-14 | Nippon Suidou Setsukeishiya Kk | Pipe path equipment for place with large head from upper flow to lower flow |
JPS5472975A (en) * | 1977-11-24 | 1979-06-11 | Hitachi Ltd | Mask inspecting method |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57138135A (en) * | 1981-02-20 | 1982-08-26 | Hitachi Ltd | Method and apparatus for inspecting pattern |
JPS57159023A (en) * | 1981-03-27 | 1982-10-01 | Hitachi Ltd | Inspecting device of pattern |
JPS57196530A (en) * | 1981-05-28 | 1982-12-02 | Fujitsu Ltd | Inspection of pattern |
JPS6239811B2 (en) * | 1981-05-28 | 1987-08-25 | Fujitsu Ltd | |
JPS57206025A (en) * | 1981-06-01 | 1982-12-17 | Fujitsu Ltd | Pattern inspecting system |
JPH0140489B2 (en) * | 1981-08-31 | 1989-08-29 | Tokyo Shibaura Electric Co | |
JPS5837923A (en) * | 1981-08-31 | 1983-03-05 | Toshiba Corp | Inspection apparatus for photo mask |
JPS5846636A (en) * | 1981-09-16 | 1983-03-18 | Nippon Jido Seigyo Kk | Inspecting device for defect of pattern |
JPS59173736A (en) * | 1983-03-11 | 1984-10-01 | ケイエルエイ・インストラメンツ・コ−ポレ−シヨン | Defect detector |
JPS60138921A (en) * | 1983-12-27 | 1985-07-23 | Toshiba Corp | Inspecting device of pattern shape |
JPS6356702B2 (en) * | 1983-12-27 | 1988-11-09 | Tokyo Shibaura Electric Co | |
JPS60202933A (en) * | 1984-03-16 | 1985-10-14 | Fujitsu Ltd | Inspecting method of reticle |
US5441545A (en) * | 1985-08-28 | 1995-08-15 | Exxon Chemical Patents Inc. | Middle distillate compositions with improved low temperature properties |
US5814110A (en) * | 1986-09-24 | 1998-09-29 | Exxon Chemical Patents Inc. | Chemical compositions and use as fuel additives |
US5425789A (en) * | 1986-12-22 | 1995-06-20 | Exxon Chemical Patents Inc. | Chemical compositions and their use as fuel additives |
US5045088A (en) * | 1988-08-26 | 1991-09-03 | Exxon Chemical Patents Inc. | Chemical compositions and use as fuel additives |
US5478368A (en) * | 1990-04-19 | 1995-12-26 | Exxon Chemical Patents Inc. | Additives for distillate fuels and distillate fuels containing them |
Also Published As
Publication number | Publication date |
---|---|
JPS643050B2 (en) | 1989-01-19 |
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