JPS5642946A - Scanning type electron microscope device - Google Patents

Scanning type electron microscope device

Info

Publication number
JPS5642946A
JPS5642946A JP11974479A JP11974479A JPS5642946A JP S5642946 A JPS5642946 A JP S5642946A JP 11974479 A JP11974479 A JP 11974479A JP 11974479 A JP11974479 A JP 11974479A JP S5642946 A JPS5642946 A JP S5642946A
Authority
JP
Japan
Prior art keywords
electron beam
scanning coil
scanning
electron microscope
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11974479A
Other languages
Japanese (ja)
Inventor
Motosuke Miyoshi
Katsuya Okumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP11974479A priority Critical patent/JPS5642946A/en
Publication of JPS5642946A publication Critical patent/JPS5642946A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To supress the acceleration voltage of a primary electron beam at a low level without causing a change in a cathode electrode and scanning devices, by arranging an electric field generating part for decelerating the electron beam between a scanning coil and a sample. CONSTITUTION:An electron generated by a cathode 1 is accelerated by an anode 2, focused by a condenser lens 3 and object lens 4 and controlled its beam direction by a scanning coil 5. At rear stage of the scanning coil 5 an electric field generating grid 7 is arranged. By applying a positive potential to said grid 7, the electron beam is decelerated, changed into an electron beam at low potential and emitted incident upon a sample 6 like semiconductor or large scale integrated circuit (LSI).
JP11974479A 1979-09-18 1979-09-18 Scanning type electron microscope device Pending JPS5642946A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11974479A JPS5642946A (en) 1979-09-18 1979-09-18 Scanning type electron microscope device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11974479A JPS5642946A (en) 1979-09-18 1979-09-18 Scanning type electron microscope device

Publications (1)

Publication Number Publication Date
JPS5642946A true JPS5642946A (en) 1981-04-21

Family

ID=14769057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11974479A Pending JPS5642946A (en) 1979-09-18 1979-09-18 Scanning type electron microscope device

Country Status (1)

Country Link
JP (1) JPS5642946A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5891643A (en) * 1981-11-26 1983-05-31 Fujitsu Ltd Annealing by electron beam

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5891643A (en) * 1981-11-26 1983-05-31 Fujitsu Ltd Annealing by electron beam

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