JPS564237A - Method of moving sample stage in exposure to electron beam - Google Patents

Method of moving sample stage in exposure to electron beam

Info

Publication number
JPS564237A
JPS564237A JP8036979A JP8036979A JPS564237A JP S564237 A JPS564237 A JP S564237A JP 8036979 A JP8036979 A JP 8036979A JP 8036979 A JP8036979 A JP 8036979A JP S564237 A JPS564237 A JP S564237A
Authority
JP
Japan
Prior art keywords
movement
pulses
sample stage
counted
stage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8036979A
Other languages
Japanese (ja)
Inventor
Eiji Watanabe
Katsuzo Kishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP8036979A priority Critical patent/JPS564237A/en
Publication of JPS564237A publication Critical patent/JPS564237A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3435Target holders (includes backing plates and endblocks)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To shorten movement time, by comparing the quantity of movement corresponding to the number of pulses applied to a pulse motor, with a quantity measured by a laser interferometer, at optional time during the movement of a sample stage to control the number of the pulses. CONSTITUTION:The number N of pulses corresponding to the length of movement of a sample stage 1 is set in a register 7 by a computer 6. A motor 4 is driven by 3 depending on the number N of the pulses. A number N-M is set in another register 14. The number of the pulses supplied to the motor is counted. When the counted number coincides with the number N-M, the latter number is applied to a comparator 11. The actual movement quantity of the stage 1 is measured by a laser interferometer 9. A number corresponding to the movement quantity is counted at 10. Both movement quantities are compared with each other at 11 to determine a number L of compensating pulses corresponding to the difference. The content of the register 7 is modified to N+ or -L depending on the difference between the actual and the theoretical movement quantities. As a result, the movement error of the stage is greatly reduced and its movement time is shortened. Since the movement error is reduced, exposure acuracy is enhanced.
JP8036979A 1979-06-26 1979-06-26 Method of moving sample stage in exposure to electron beam Pending JPS564237A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8036979A JPS564237A (en) 1979-06-26 1979-06-26 Method of moving sample stage in exposure to electron beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8036979A JPS564237A (en) 1979-06-26 1979-06-26 Method of moving sample stage in exposure to electron beam

Publications (1)

Publication Number Publication Date
JPS564237A true JPS564237A (en) 1981-01-17

Family

ID=13716347

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8036979A Pending JPS564237A (en) 1979-06-26 1979-06-26 Method of moving sample stage in exposure to electron beam

Country Status (1)

Country Link
JP (1) JPS564237A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59160948A (en) * 1983-03-02 1984-09-11 Hitachi Ltd Pattern-detecting system
JPS6056343A (en) * 1983-09-07 1985-04-01 Jeol Ltd Charged particle beam apparatus
JPS6136954U (en) * 1984-08-10 1986-03-07 日本電子株式会社 Sample moving device for electron microscopes, etc.

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
NIKKEI ELECTRONICS=1976 *

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59160948A (en) * 1983-03-02 1984-09-11 Hitachi Ltd Pattern-detecting system
JPS6056343A (en) * 1983-09-07 1985-04-01 Jeol Ltd Charged particle beam apparatus
JPS6136954U (en) * 1984-08-10 1986-03-07 日本電子株式会社 Sample moving device for electron microscopes, etc.
JPH037882Y2 (en) * 1984-08-10 1991-02-27

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