JPS564237A - Method of moving sample stage in exposure to electron beam - Google Patents
Method of moving sample stage in exposure to electron beamInfo
- Publication number
- JPS564237A JPS564237A JP8036979A JP8036979A JPS564237A JP S564237 A JPS564237 A JP S564237A JP 8036979 A JP8036979 A JP 8036979A JP 8036979 A JP8036979 A JP 8036979A JP S564237 A JPS564237 A JP S564237A
- Authority
- JP
- Japan
- Prior art keywords
- movement
- pulses
- sample stage
- counted
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To shorten movement time, by comparing the quantity of movement corresponding to the number of pulses applied to a pulse motor, with a quantity measured by a laser interferometer, at optional time during the movement of a sample stage to control the number of the pulses. CONSTITUTION:The number N of pulses corresponding to the length of movement of a sample stage 1 is set in a register 7 by a computer 6. A motor 4 is driven by 3 depending on the number N of the pulses. A number N-M is set in another register 14. The number of the pulses supplied to the motor is counted. When the counted number coincides with the number N-M, the latter number is applied to a comparator 11. The actual movement quantity of the stage 1 is measured by a laser interferometer 9. A number corresponding to the movement quantity is counted at 10. Both movement quantities are compared with each other at 11 to determine a number L of compensating pulses corresponding to the difference. The content of the register 7 is modified to N+ or -L depending on the difference between the actual and the theoretical movement quantities. As a result, the movement error of the stage is greatly reduced and its movement time is shortened. Since the movement error is reduced, exposure acuracy is enhanced.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8036979A JPS564237A (en) | 1979-06-26 | 1979-06-26 | Method of moving sample stage in exposure to electron beam |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8036979A JPS564237A (en) | 1979-06-26 | 1979-06-26 | Method of moving sample stage in exposure to electron beam |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS564237A true JPS564237A (en) | 1981-01-17 |
Family
ID=13716347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8036979A Pending JPS564237A (en) | 1979-06-26 | 1979-06-26 | Method of moving sample stage in exposure to electron beam |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS564237A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59160948A (en) * | 1983-03-02 | 1984-09-11 | Hitachi Ltd | Pattern-detecting system |
JPS6056343A (en) * | 1983-09-07 | 1985-04-01 | Jeol Ltd | Charged particle beam apparatus |
JPS6136954U (en) * | 1984-08-10 | 1986-03-07 | 日本電子株式会社 | Sample moving device for electron microscopes, etc. |
-
1979
- 1979-06-26 JP JP8036979A patent/JPS564237A/en active Pending
Non-Patent Citations (1)
Title |
---|
NIKKEI ELECTRONICS=1976 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59160948A (en) * | 1983-03-02 | 1984-09-11 | Hitachi Ltd | Pattern-detecting system |
JPS6056343A (en) * | 1983-09-07 | 1985-04-01 | Jeol Ltd | Charged particle beam apparatus |
JPS6136954U (en) * | 1984-08-10 | 1986-03-07 | 日本電子株式会社 | Sample moving device for electron microscopes, etc. |
JPH037882Y2 (en) * | 1984-08-10 | 1991-02-27 |
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