JPS5641639A - Exposure mask and exposure method - Google Patents

Exposure mask and exposure method

Info

Publication number
JPS5641639A
JPS5641639A JP11699179A JP11699179A JPS5641639A JP S5641639 A JPS5641639 A JP S5641639A JP 11699179 A JP11699179 A JP 11699179A JP 11699179 A JP11699179 A JP 11699179A JP S5641639 A JPS5641639 A JP S5641639A
Authority
JP
Japan
Prior art keywords
mask
bag
exposure
resist
prescribed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11699179A
Other languages
Japanese (ja)
Inventor
Yoshitaka Katayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP11699179A priority Critical patent/JPS5641639A/en
Publication of JPS5641639A publication Critical patent/JPS5641639A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To allow bag-shaped body of a mask to easily make a close contact with a tubular body, by inserting the bag-shaped body, constituted by a prescribed elastic material with a prescribed pattern on its outer surface, into the tubular body with a photoresist on its inner surface and increasig an internal presure of the bag-shaped body. CONSTITUTION:An exposure mask 14 is formed into a bag-shape with an elastic material almost transparent to a resist exposure electromagnetic wave, and on its cylindrical side face 17 a prescribed pattern is printed by paints. Said mask 14 is inserted into a glass bulb 4 on an inner surface of which a resist 6 is formed, and the pattern on the side face 17 is closely contacted to the resist 6 by increasing an internal pressure of a hollowed part 15. Then the glass bulb 4 to which the mask 14 is equipped is arranged in a prescribed container 20, and an electromagnetic wave is irradiated toward a hollowed part 11 from windows 18, 18' while introducing and discharging gas mixed with an electromagnetic wave dispersing fine particles for resist exposure into and from inlet and outlet ports 19, 19' thus to irradiate the pattern formed surface.
JP11699179A 1979-09-12 1979-09-12 Exposure mask and exposure method Pending JPS5641639A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11699179A JPS5641639A (en) 1979-09-12 1979-09-12 Exposure mask and exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11699179A JPS5641639A (en) 1979-09-12 1979-09-12 Exposure mask and exposure method

Publications (1)

Publication Number Publication Date
JPS5641639A true JPS5641639A (en) 1981-04-18

Family

ID=14700764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11699179A Pending JPS5641639A (en) 1979-09-12 1979-09-12 Exposure mask and exposure method

Country Status (1)

Country Link
JP (1) JPS5641639A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006053337A (en) * 2004-08-11 2006-02-23 Fujitsu Ltd Photomask apparatus, method for manufacturing photomask and method for forming mask pattern
JP2008286406A (en) * 2002-02-28 2008-11-27 Fujitsu Ltd Dynamic pressure bearing manufacturing method, and dynamic pressure bearing manufacturing device

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008286406A (en) * 2002-02-28 2008-11-27 Fujitsu Ltd Dynamic pressure bearing manufacturing method, and dynamic pressure bearing manufacturing device
JP2006053337A (en) * 2004-08-11 2006-02-23 Fujitsu Ltd Photomask apparatus, method for manufacturing photomask and method for forming mask pattern
US7632627B2 (en) 2004-08-11 2009-12-15 Fujitsu Limited Photomask apparatus, photomask manufacturing method, and mask pattern forming method
JP4714440B2 (en) * 2004-08-11 2011-06-29 富士通株式会社 Photomask manufacturing method

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