JPS5641639A - Exposure mask and exposure method - Google Patents
Exposure mask and exposure methodInfo
- Publication number
- JPS5641639A JPS5641639A JP11699179A JP11699179A JPS5641639A JP S5641639 A JPS5641639 A JP S5641639A JP 11699179 A JP11699179 A JP 11699179A JP 11699179 A JP11699179 A JP 11699179A JP S5641639 A JPS5641639 A JP S5641639A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- bag
- exposure
- resist
- prescribed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/60—Substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To allow bag-shaped body of a mask to easily make a close contact with a tubular body, by inserting the bag-shaped body, constituted by a prescribed elastic material with a prescribed pattern on its outer surface, into the tubular body with a photoresist on its inner surface and increasig an internal presure of the bag-shaped body. CONSTITUTION:An exposure mask 14 is formed into a bag-shape with an elastic material almost transparent to a resist exposure electromagnetic wave, and on its cylindrical side face 17 a prescribed pattern is printed by paints. Said mask 14 is inserted into a glass bulb 4 on an inner surface of which a resist 6 is formed, and the pattern on the side face 17 is closely contacted to the resist 6 by increasing an internal pressure of a hollowed part 15. Then the glass bulb 4 to which the mask 14 is equipped is arranged in a prescribed container 20, and an electromagnetic wave is irradiated toward a hollowed part 11 from windows 18, 18' while introducing and discharging gas mixed with an electromagnetic wave dispersing fine particles for resist exposure into and from inlet and outlet ports 19, 19' thus to irradiate the pattern formed surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11699179A JPS5641639A (en) | 1979-09-12 | 1979-09-12 | Exposure mask and exposure method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11699179A JPS5641639A (en) | 1979-09-12 | 1979-09-12 | Exposure mask and exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5641639A true JPS5641639A (en) | 1981-04-18 |
Family
ID=14700764
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11699179A Pending JPS5641639A (en) | 1979-09-12 | 1979-09-12 | Exposure mask and exposure method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5641639A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006053337A (en) * | 2004-08-11 | 2006-02-23 | Fujitsu Ltd | Photomask apparatus, method for manufacturing photomask and method for forming mask pattern |
JP2008286406A (en) * | 2002-02-28 | 2008-11-27 | Fujitsu Ltd | Dynamic pressure bearing manufacturing method, and dynamic pressure bearing manufacturing device |
-
1979
- 1979-09-12 JP JP11699179A patent/JPS5641639A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008286406A (en) * | 2002-02-28 | 2008-11-27 | Fujitsu Ltd | Dynamic pressure bearing manufacturing method, and dynamic pressure bearing manufacturing device |
JP2006053337A (en) * | 2004-08-11 | 2006-02-23 | Fujitsu Ltd | Photomask apparatus, method for manufacturing photomask and method for forming mask pattern |
US7632627B2 (en) | 2004-08-11 | 2009-12-15 | Fujitsu Limited | Photomask apparatus, photomask manufacturing method, and mask pattern forming method |
JP4714440B2 (en) * | 2004-08-11 | 2011-06-29 | 富士通株式会社 | Photomask manufacturing method |
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