JPS56122030A - Photosensitive resin composition developable with aqueous alkali solution - Google Patents

Photosensitive resin composition developable with aqueous alkali solution

Info

Publication number
JPS56122030A
JPS56122030A JP2475780A JP2475780A JPS56122030A JP S56122030 A JPS56122030 A JP S56122030A JP 2475780 A JP2475780 A JP 2475780A JP 2475780 A JP2475780 A JP 2475780A JP S56122030 A JPS56122030 A JP S56122030A
Authority
JP
Japan
Prior art keywords
resin composition
ester
aqueous alkali
acid
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2475780A
Other languages
Japanese (ja)
Inventor
Koichiro Arita
Keiji Kubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Corp
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Corp, Daicel Chemical Industries Ltd filed Critical Daicel Corp
Priority to JP2475780A priority Critical patent/JPS56122030A/en
Publication of JPS56122030A publication Critical patent/JPS56122030A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)

Abstract

PURPOSE:To obtain an alkali-developable resin composition with superior photosensitive by adding the ester compound of novolak type phenolformaldehyde condensate and furylacrylic acid or cinnamylideneacetic acid. CONSTITUTION:In the synthesis of furylacrylic acid ester or cinnamylideneacetic acid ester of novolak type phenol-formaldehyde condensate, >=50, preferably <=90mol% of the phenolic hydroxyl groups is left as unreacted. This photosensitive resin composition contains the ester which is obtd. by a method of ester forming reaction from acid chloride and hydroxyl groups in the presence of an aqueous alkali soln. as catalyst. For example, novolak type phenolic resin is dissolved in an aqueous alkali soln., and furylacrylic acid chloride or cinnamylideneacetic acid chloride in a water-insoluble org. solvent. Both the solns. are then reacted with mixing.
JP2475780A 1980-02-29 1980-02-29 Photosensitive resin composition developable with aqueous alkali solution Pending JPS56122030A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2475780A JPS56122030A (en) 1980-02-29 1980-02-29 Photosensitive resin composition developable with aqueous alkali solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2475780A JPS56122030A (en) 1980-02-29 1980-02-29 Photosensitive resin composition developable with aqueous alkali solution

Publications (1)

Publication Number Publication Date
JPS56122030A true JPS56122030A (en) 1981-09-25

Family

ID=12147011

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2475780A Pending JPS56122030A (en) 1980-02-29 1980-02-29 Photosensitive resin composition developable with aqueous alkali solution

Country Status (1)

Country Link
JP (1) JPS56122030A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5712022A (en) * 1992-09-14 1998-01-27 Yoshino Kogyosho Co., Ltd. Printed thermoplastic resin products and method for printing such products
JP2020037651A (en) * 2018-09-04 2020-03-12 三菱瓦斯化学株式会社 (Meth) acrylate resin, curable resin composition, and cured product

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103975A (en) * 1973-02-02 1974-10-02

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49103975A (en) * 1973-02-02 1974-10-02

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5712022A (en) * 1992-09-14 1998-01-27 Yoshino Kogyosho Co., Ltd. Printed thermoplastic resin products and method for printing such products
JP2020037651A (en) * 2018-09-04 2020-03-12 三菱瓦斯化学株式会社 (Meth) acrylate resin, curable resin composition, and cured product

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