JPS56122030A - Photosensitive resin composition developable with aqueous alkali solution - Google Patents
Photosensitive resin composition developable with aqueous alkali solutionInfo
- Publication number
- JPS56122030A JPS56122030A JP2475780A JP2475780A JPS56122030A JP S56122030 A JPS56122030 A JP S56122030A JP 2475780 A JP2475780 A JP 2475780A JP 2475780 A JP2475780 A JP 2475780A JP S56122030 A JPS56122030 A JP S56122030A
- Authority
- JP
- Japan
- Prior art keywords
- resin composition
- ester
- aqueous alkali
- acid
- photosensitive resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Abstract
PURPOSE:To obtain an alkali-developable resin composition with superior photosensitive by adding the ester compound of novolak type phenolformaldehyde condensate and furylacrylic acid or cinnamylideneacetic acid. CONSTITUTION:In the synthesis of furylacrylic acid ester or cinnamylideneacetic acid ester of novolak type phenol-formaldehyde condensate, >=50, preferably <=90mol% of the phenolic hydroxyl groups is left as unreacted. This photosensitive resin composition contains the ester which is obtd. by a method of ester forming reaction from acid chloride and hydroxyl groups in the presence of an aqueous alkali soln. as catalyst. For example, novolak type phenolic resin is dissolved in an aqueous alkali soln., and furylacrylic acid chloride or cinnamylideneacetic acid chloride in a water-insoluble org. solvent. Both the solns. are then reacted with mixing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2475780A JPS56122030A (en) | 1980-02-29 | 1980-02-29 | Photosensitive resin composition developable with aqueous alkali solution |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2475780A JPS56122030A (en) | 1980-02-29 | 1980-02-29 | Photosensitive resin composition developable with aqueous alkali solution |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS56122030A true JPS56122030A (en) | 1981-09-25 |
Family
ID=12147011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2475780A Pending JPS56122030A (en) | 1980-02-29 | 1980-02-29 | Photosensitive resin composition developable with aqueous alkali solution |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS56122030A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5712022A (en) * | 1992-09-14 | 1998-01-27 | Yoshino Kogyosho Co., Ltd. | Printed thermoplastic resin products and method for printing such products |
JP2020037651A (en) * | 2018-09-04 | 2020-03-12 | 三菱瓦斯化学株式会社 | (Meth) acrylate resin, curable resin composition, and cured product |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49103975A (en) * | 1973-02-02 | 1974-10-02 |
-
1980
- 1980-02-29 JP JP2475780A patent/JPS56122030A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS49103975A (en) * | 1973-02-02 | 1974-10-02 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5712022A (en) * | 1992-09-14 | 1998-01-27 | Yoshino Kogyosho Co., Ltd. | Printed thermoplastic resin products and method for printing such products |
JP2020037651A (en) * | 2018-09-04 | 2020-03-12 | 三菱瓦斯化学株式会社 | (Meth) acrylate resin, curable resin composition, and cured product |
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