JPS5567742A - Glass substrate recording medium - Google Patents
Glass substrate recording mediumInfo
- Publication number
- JPS5567742A JPS5567742A JP14148878A JP14148878A JPS5567742A JP S5567742 A JPS5567742 A JP S5567742A JP 14148878 A JP14148878 A JP 14148878A JP 14148878 A JP14148878 A JP 14148878A JP S5567742 A JPS5567742 A JP S5567742A
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- recording medium
- subjected
- plating
- neutral detergent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title abstract 6
- 239000011521 glass Substances 0.000 title abstract 5
- 239000003599 detergent Substances 0.000 abstract 3
- 230000007935 neutral effect Effects 0.000 abstract 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 abstract 2
- 239000000853 adhesive Substances 0.000 abstract 2
- 238000007772 electroless plating Methods 0.000 abstract 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 abstract 2
- 229910017604 nitric acid Inorganic materials 0.000 abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 abstract 2
- 238000007747 plating Methods 0.000 abstract 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000007598 dipping method Methods 0.000 abstract 1
- 238000009713 electroplating Methods 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000004506 ultrasonic cleaning Methods 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
Abstract
PURPOSE:To obviate peeling of resist film during electroless plating by dipping a substrate in a nitric acid under the specific conditions then washing the same with a neutral detergent and coating the photoresist thereon by way of an adhesive agent layer in the manufacture of the glass substrate recording medium for replica discs. CONSTITUTION:After a glass substrate 3 is subjected to ultrasonic cleaning in acetone, it is rinsed and further it is subjected to neutral detergent cleaning followed by rinsing, whereby the surfaces are cleaned. After this, it is dipped in a nitric acid of concentrations 20-30% for 2-10hrs at if at 50-65 deg.C, 10-30hrs if at 35-50 deg.C, 30-50hrs if at 15-35 deg.C, following to which it is washed with a neutral detergent and is then sufficiently drained of water and is dried, thence an adhesive agent layer such as hexamethyl disilazane is formed on the substrate 3, after which photoresist 1 is coated. This is subjected to exposure and development, whereby the original glass disc is obtained. Next, electroless plating is done on the resist 1 to form a conductive film 5. Current is then supplied to the film 5 and electroplating (Ni plating) 6 is applied and the plating 6 is peeled, whereby the master mother stamper is obtained. In this way, the glass substrate recording medium which does not cause peeling of the resist film is obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14148878A JPS5567742A (en) | 1978-11-16 | 1978-11-16 | Glass substrate recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14148878A JPS5567742A (en) | 1978-11-16 | 1978-11-16 | Glass substrate recording medium |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5567742A true JPS5567742A (en) | 1980-05-22 |
JPS6255130B2 JPS6255130B2 (en) | 1987-11-18 |
Family
ID=15293069
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14148878A Granted JPS5567742A (en) | 1978-11-16 | 1978-11-16 | Glass substrate recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5567742A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0043480A2 (en) * | 1980-06-25 | 1982-01-13 | Hitachi, Ltd. | Process for forming metallic images |
JPS5736446A (en) * | 1980-08-11 | 1982-02-27 | Discovision Ass |
-
1978
- 1978-11-16 JP JP14148878A patent/JPS5567742A/en active Granted
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0043480A2 (en) * | 1980-06-25 | 1982-01-13 | Hitachi, Ltd. | Process for forming metallic images |
JPS5736446A (en) * | 1980-08-11 | 1982-02-27 | Discovision Ass | |
JPH0246366B2 (en) * | 1980-08-11 | 1990-10-15 | Discovision Ass |
Also Published As
Publication number | Publication date |
---|---|
JPS6255130B2 (en) | 1987-11-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US2961746A (en) | Printed circuits | |
JPS5952715B2 (en) | Metsuki method | |
US3457638A (en) | Manufacture of printed circuits | |
JPS6364394A (en) | Manufacture of printed wiring board | |
JPS5567742A (en) | Glass substrate recording medium | |
US3669665A (en) | Process for making resist stencils from photographic stripping films and for using same | |
JPH0118996B2 (en) | ||
US2850411A (en) | Method for removing coatings from film base | |
CN113161414B (en) | Preparation method of PN micron line | |
JPS593421B2 (en) | Soushiyoku Kagamino Seizouhou | |
JPH0373590A (en) | Manufacture of printed board | |
US2316645A (en) | Deep etching lithographic plate | |
JPH0421255B2 (en) | ||
JPS5823735B2 (en) | Method for producing tantalum layers for thin film capacitors or thin film resistors | |
JP2847196B2 (en) | Manufacturing method of stamper for duplicating optical disk | |
JPH0273987A (en) | Method for duplicating stamper | |
JPH0629647A (en) | Peeling method of photo resist | |
US3520745A (en) | Etching of gold alloy encoder discs | |
JPH0380526A (en) | Pretreatment method for photosolder resist | |
JPS63297585A (en) | Manufacture of nickel stamper | |
JPH02290991A (en) | Production of stamper | |
JPS59220953A (en) | Formation of fine pattern | |
JPS56101148A (en) | Photoresist developing method | |
JPS6273744A (en) | Forming method for metal wiring pattern | |
JPS57102018A (en) | Pattern correction |