JPS5558521A - Method of moving - Google Patents

Method of moving

Info

Publication number
JPS5558521A
JPS5558521A JP11684579A JP11684579A JPS5558521A JP S5558521 A JPS5558521 A JP S5558521A JP 11684579 A JP11684579 A JP 11684579A JP 11684579 A JP11684579 A JP 11684579A JP S5558521 A JPS5558521 A JP S5558521A
Authority
JP
Japan
Prior art keywords
moving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11684579A
Other languages
English (en)
Inventor
Fushiingu Chiyangu Maiku
Erisu Kurain Haabei
Richiyaado Antonii Toomasu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of JPS5558521A publication Critical patent/JPS5558521A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/24Alloying of impurity materials, e.g. doping materials, electrode materials, with a semiconductor body
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/02Zone-melting with a solvent, e.g. travelling solvent process
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/06Single-crystal growth by zone-melting; Refining by zone-melting the molten zone not extending over the whole cross-section

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP11684579A 1978-09-21 1979-09-13 Method of moving Pending JPS5558521A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/944,278 US4159215A (en) 1978-09-21 1978-09-21 Droplet migration doping using reactive carriers and dopants

Publications (1)

Publication Number Publication Date
JPS5558521A true JPS5558521A (en) 1980-05-01

Family

ID=25481119

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11684579A Pending JPS5558521A (en) 1978-09-21 1979-09-13 Method of moving

Country Status (4)

Country Link
US (1) US4159215A (ja)
JP (1) JPS5558521A (ja)
DE (1) DE2932191A1 (ja)
GB (1) GB2033778B (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5415267A (en) * 1991-09-30 1995-05-16 Kao Corporation Method and apparatus for orienting articles

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4198247A (en) * 1978-12-07 1980-04-15 General Electric Company Sealant films for materials having high intrinsic vapor pressure
DE2939491A1 (de) * 1979-09-28 1981-04-30 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von halbleitereigenschaften aufweisendem, mit indium hochdotiertem silicium
DE2939492A1 (de) * 1979-09-28 1981-04-16 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von halbleitereigenschaften aufweisendem, mit indium hochdotiertem silicium
DE2939459A1 (de) * 1979-09-28 1981-04-16 Siemens AG, 1000 Berlin und 8000 München Verfahren zum herstellen von halbleitereigenschaften aufweisendem, mit antimon hochdotiertem silicium
GB2090465B (en) * 1980-12-29 1985-11-13 Gen Electric Production of p-n junctions by the electromigration method
DE19727693A1 (de) * 1997-06-20 1998-12-24 Heidenhain Gmbh Dr Johannes Verfahren und Vorrichtung zur Herstellung elektrisch leitfähiger Durchgänge in Halbleiter-Bauelementen
US6247237B1 (en) 1998-05-15 2001-06-19 Alan R. Redburn Archery sight
US6632730B1 (en) * 1999-11-23 2003-10-14 Ebara Solar, Inc. Method for self-doping contacts to a semiconductor
DE102004063959B4 (de) * 2004-06-15 2010-06-02 Infineon Technologies Ag Verfahren zur Herstellung einer niederohmigen Anschlusselektrode als vergrabene metallische Schicht in einem Halbleiterkörper für ein Halbleiterbauelement

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US277061A (en) * 1883-05-08 Box-cover
US2813048A (en) * 1954-06-24 1957-11-12 Bell Telephone Labor Inc Temperature gradient zone-melting

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3988766A (en) * 1974-04-29 1976-10-26 General Electric Company Multiple P-N junction formation with an alloy droplet
US4001047A (en) * 1975-05-19 1977-01-04 General Electric Company Temperature gradient zone melting utilizing infrared radiation

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US277061A (en) * 1883-05-08 Box-cover
US2813048A (en) * 1954-06-24 1957-11-12 Bell Telephone Labor Inc Temperature gradient zone-melting

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5415267A (en) * 1991-09-30 1995-05-16 Kao Corporation Method and apparatus for orienting articles

Also Published As

Publication number Publication date
GB2033778A (en) 1980-05-29
DE2932191A1 (de) 1980-04-03
US4159215A (en) 1979-06-26
GB2033778B (en) 1982-09-08

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