JPS5533716A - Electron microscope focusing lens system - Google Patents

Electron microscope focusing lens system

Info

Publication number
JPS5533716A
JPS5533716A JP10618878A JP10618878A JPS5533716A JP S5533716 A JPS5533716 A JP S5533716A JP 10618878 A JP10618878 A JP 10618878A JP 10618878 A JP10618878 A JP 10618878A JP S5533716 A JPS5533716 A JP S5533716A
Authority
JP
Japan
Prior art keywords
electron beam
focusing lens
objective
optical axis
beam flux
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10618878A
Other languages
Japanese (ja)
Other versions
JPS6019622B2 (en
Inventor
Kouhei Shirota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
INTERNATL PRECISION Inc
KOKUSAI SEIKO
Original Assignee
INTERNATL PRECISION Inc
KOKUSAI SEIKO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by INTERNATL PRECISION Inc, KOKUSAI SEIKO filed Critical INTERNATL PRECISION Inc
Priority to JP10618878A priority Critical patent/JPS6019622B2/en
Publication of JPS5533716A publication Critical patent/JPS5533716A/en
Publication of JPS6019622B2 publication Critical patent/JPS6019622B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To enable arbitrary adjustment of the area irradiated with electron beam flux without deterioration of image quality, through process of making the cross- over point of electron beam passing the initial stage focusing lens coincide with the front focus of the final stage focusing lens.
CONSTITUTION: Set the electron beam flux transmitting irradiation toward specimen 3 parallel to optical axis 7 and make cross-over point 9 formed by objective 8 coincide with the position of objective diaphram 10. Therefore, if the front focus of 2nd focusing lens 2 and cross-over point 4 of 1st focusing lens 1 coincide with each other, the electron beam flux having passed 2nd lens 2 becomes parallel to optical axis 7, resulting in provision of electron beam flux irradiation toward specimen 3 set in parallel to optical axis 7 and at the same time incidence of an electron beam flux toward objective 8 can be also made parallel to optical axis 7. Thus, it becomes possible to reduce impact of various aberrations caused by the objective and the adjust at will the area irradiated with any electron beam directed to the specimen, without deteriorating quality of the final image.
COPYRIGHT: (C)1980,JPO&Japio
JP10618878A 1978-09-01 1978-09-01 Focusing lens system for transmission electron microscope Expired JPS6019622B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10618878A JPS6019622B2 (en) 1978-09-01 1978-09-01 Focusing lens system for transmission electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10618878A JPS6019622B2 (en) 1978-09-01 1978-09-01 Focusing lens system for transmission electron microscope

Publications (2)

Publication Number Publication Date
JPS5533716A true JPS5533716A (en) 1980-03-10
JPS6019622B2 JPS6019622B2 (en) 1985-05-17

Family

ID=14427215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10618878A Expired JPS6019622B2 (en) 1978-09-01 1978-09-01 Focusing lens system for transmission electron microscope

Country Status (1)

Country Link
JP (1) JPS6019622B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5765655A (en) * 1980-10-07 1982-04-21 Internatl Precision Inc Electron microscope
JPS59221951A (en) * 1983-05-31 1984-12-13 Internatl Precision Inc Irradiation system for electron beam system
JPS6261252A (en) * 1985-09-12 1987-03-17 Jeol Ltd Irradiation lens device for electron microscope
JPH01319237A (en) * 1988-06-17 1989-12-25 Jeol Ltd Electron microscope
JP2014056765A (en) * 2012-09-13 2014-03-27 Hokkaido Univ Electron beam irradiation device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5765655A (en) * 1980-10-07 1982-04-21 Internatl Precision Inc Electron microscope
JPS6336109B2 (en) * 1980-10-07 1988-07-19 Akashi Seisakusho Kk
JPS59221951A (en) * 1983-05-31 1984-12-13 Internatl Precision Inc Irradiation system for electron beam system
JPS6261252A (en) * 1985-09-12 1987-03-17 Jeol Ltd Irradiation lens device for electron microscope
JPH01319237A (en) * 1988-06-17 1989-12-25 Jeol Ltd Electron microscope
JP2014056765A (en) * 2012-09-13 2014-03-27 Hokkaido Univ Electron beam irradiation device

Also Published As

Publication number Publication date
JPS6019622B2 (en) 1985-05-17

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