JPS5527637A - Photo-resist-pattern forming method - Google Patents
Photo-resist-pattern forming methodInfo
- Publication number
- JPS5527637A JPS5527637A JP10066478A JP10066478A JPS5527637A JP S5527637 A JPS5527637 A JP S5527637A JP 10066478 A JP10066478 A JP 10066478A JP 10066478 A JP10066478 A JP 10066478A JP S5527637 A JPS5527637 A JP S5527637A
- Authority
- JP
- Japan
- Prior art keywords
- photo
- film
- resist
- wiring layer
- fine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To remarkably improve fine pattern forming precision by operating a double exposure process consisting of No.1 and No.2 exposure, in forming a photo- resist pattern on high level surfaces on a base having high level differences.
CONSTITUTION: Aluminum wiring layer 3 is formed on the upper surface of silicon oxide insulating film 4, which is provided on the surface of permalloy thin film layer 2. On top of this is formed silicon oxide insulating film 5. When a negative photo- resist is coated on this by a spinner, thick photo-resist film 6 is formed on the surface of film 4 and thin photo-resist film 6' is formed on the upper surface of wiring layer 3. By covering the upper surface of wiring layer 3 with photo-mask, other regions are exposed by taking a sufficient time to expose film 6. A proper second- stage exposure is operated on film 6 by using fine photo-mask, and thereby a fine photo-resist pattern is obtained.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10066478A JPS5527637A (en) | 1978-08-18 | 1978-08-18 | Photo-resist-pattern forming method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10066478A JPS5527637A (en) | 1978-08-18 | 1978-08-18 | Photo-resist-pattern forming method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5527637A true JPS5527637A (en) | 1980-02-27 |
Family
ID=14280051
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10066478A Pending JPS5527637A (en) | 1978-08-18 | 1978-08-18 | Photo-resist-pattern forming method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5527637A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54116201A (en) * | 1978-03-02 | 1979-09-10 | Hitachi Ltd | Electroplating apparatus of magnetic discs |
-
1978
- 1978-08-18 JP JP10066478A patent/JPS5527637A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54116201A (en) * | 1978-03-02 | 1979-09-10 | Hitachi Ltd | Electroplating apparatus of magnetic discs |
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