JPS5523125A - Copolymerized polyethylene terephthalate composition - Google Patents

Copolymerized polyethylene terephthalate composition

Info

Publication number
JPS5523125A
JPS5523125A JP9541678A JP9541678A JPS5523125A JP S5523125 A JPS5523125 A JP S5523125A JP 9541678 A JP9541678 A JP 9541678A JP 9541678 A JP9541678 A JP 9541678A JP S5523125 A JPS5523125 A JP S5523125A
Authority
JP
Japan
Prior art keywords
ethylene terephthalate
acid
parts
terephthalate copolymer
pref
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9541678A
Other languages
Japanese (ja)
Inventor
Hiroshi Iida
Masanobu Morikawa
Masaru Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP9541678A priority Critical patent/JPS5523125A/en
Publication of JPS5523125A publication Critical patent/JPS5523125A/en
Pending legal-status Critical Current

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Abstract

PURPOSE: To prepare a polyester composition having excellent impact strength, heat resistance, injection moldability, transparency, dimensional stability, etc., by adding a polycarbonate resin to a high molecular weight ethylene terephthalate copolymer composed mianly of ethylene terephthalate unit.
CONSTITUTION: An ethylene terephthalate copolymer composition having excellent physical properties, composed of (A) 100 parts by weight of an amorphous ethylene terephthalate copolymer wherein 7W40 mol% of the acid component is an acid selected from isophthalic acid I, a cyclohexanedicarboxylic acid II (COOH groups are O-,m- or p-positions), a diphenylcarbonate III (COOH groups are m or p-positions), and carbonic acid IV, and (B) 1W75 parts, pref. 5W50 parts of a polycarbonate (pref. derived from bisphenol A).
COPYRIGHT: (C)1980,JPO&Japio
JP9541678A 1978-08-07 1978-08-07 Copolymerized polyethylene terephthalate composition Pending JPS5523125A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9541678A JPS5523125A (en) 1978-08-07 1978-08-07 Copolymerized polyethylene terephthalate composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9541678A JPS5523125A (en) 1978-08-07 1978-08-07 Copolymerized polyethylene terephthalate composition

Publications (1)

Publication Number Publication Date
JPS5523125A true JPS5523125A (en) 1980-02-19

Family

ID=14137072

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9541678A Pending JPS5523125A (en) 1978-08-07 1978-08-07 Copolymerized polyethylene terephthalate composition

Country Status (1)

Country Link
JP (1) JPS5523125A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4461877A (en) * 1981-05-01 1984-07-24 General Electric Company Polycarbonate/poly(ethylene terephthalate) resin solutions
US4510289A (en) * 1981-05-01 1985-04-09 General Electric Company Polycarbonate/condensation polymer blends
US4645804A (en) * 1981-05-01 1987-02-24 General Electric Company Polycarbonate/imide hetero group condensation polymer blends
US4652617A (en) * 1981-05-01 1987-03-24 General Electric Company Polycarbonate/ester hetero group condensation polymer blends
TR27173A (en) * 1991-03-29 1994-11-10 M & G Ricerche Spa High-weight copolyester resins with low melting point.
US20140141372A1 (en) * 2012-11-20 2014-05-22 Sang-jun Choi Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4461877A (en) * 1981-05-01 1984-07-24 General Electric Company Polycarbonate/poly(ethylene terephthalate) resin solutions
US4510289A (en) * 1981-05-01 1985-04-09 General Electric Company Polycarbonate/condensation polymer blends
US4511693A (en) * 1981-05-01 1985-04-16 General Electric Company Polycarbonate/addition polymer blends
US4645804A (en) * 1981-05-01 1987-02-24 General Electric Company Polycarbonate/imide hetero group condensation polymer blends
US4652617A (en) * 1981-05-01 1987-03-24 General Electric Company Polycarbonate/ester hetero group condensation polymer blends
TR27173A (en) * 1991-03-29 1994-11-10 M & G Ricerche Spa High-weight copolyester resins with low melting point.
US20140141372A1 (en) * 2012-11-20 2014-05-22 Sang-jun Choi Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition
US9023582B2 (en) * 2012-11-20 2015-05-05 Samsung Display Co., Ltd. Photosensitive polymer, resist composition including the photosensitive polymer and method of preparing resist pattern using the resist composition

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