JPS55161825A - Formation of antireflection coating of lens made from synthetic resin - Google Patents
Formation of antireflection coating of lens made from synthetic resinInfo
- Publication number
- JPS55161825A JPS55161825A JP6945679A JP6945679A JPS55161825A JP S55161825 A JPS55161825 A JP S55161825A JP 6945679 A JP6945679 A JP 6945679A JP 6945679 A JP6945679 A JP 6945679A JP S55161825 A JPS55161825 A JP S55161825A
- Authority
- JP
- Japan
- Prior art keywords
- lens
- synthetic resin
- antireflection coating
- source
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29D—PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
- B29D11/00—Producing optical elements, e.g. lenses or prisms
- B29D11/00865—Applying coatings; tinting; colouring
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Abstract
PURPOSE:To form an antireflection coating having excellent wear resistance, by a method wherein glow discharge is generated by means of a probe high-frequency power source in a treating chamber to activate MgF2 vapor which is then deposited on a lens made from a synthetic resin, the surface of the lens being coated with glass. CONSTITUTION:The interior of a treatig chamber 1 is kept at a high vaccum of 1X10<-5>-6X 10<-5> Torr by means of Ar, O2 or other gases. At the lower part of the treating chamber 1 there is provided an evaporating source 5 for MgF2 which is irradiated by means of the output electron beam of an electron gun 3. At the upper part of the chamber 1 there is provided a lens 6 made from a synthetic resin. The surface of the lens is previously coated with a glass 6a. There is provided a probe 8 between the lens and the evaporating source. A high-frequency power source 10 is externally provided and has an output of 0.4-3kW. By the action of the high-frequency source on the probe 8, glow discharge is generated within the treating chamber 1 to activate the vapor of the evaporating source 5, and the vapor is deposited on the surface of the lens 6. Then the lens 6 is kept at 90 deg.C for not less than 12hr to form an antireflection coating having excellent resistance to hot water on the lens 6 made from a synthetic resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6945679A JPS55161825A (en) | 1979-06-05 | 1979-06-05 | Formation of antireflection coating of lens made from synthetic resin |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6945679A JPS55161825A (en) | 1979-06-05 | 1979-06-05 | Formation of antireflection coating of lens made from synthetic resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55161825A true JPS55161825A (en) | 1980-12-16 |
JPS617470B2 JPS617470B2 (en) | 1986-03-06 |
Family
ID=13403160
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6945679A Granted JPS55161825A (en) | 1979-06-05 | 1979-06-05 | Formation of antireflection coating of lens made from synthetic resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55161825A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01100255A (en) * | 1987-10-13 | 1989-04-18 | Ricoh Co Ltd | Formation of antireflection film |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63137071U (en) * | 1987-02-27 | 1988-09-08 |
-
1979
- 1979-06-05 JP JP6945679A patent/JPS55161825A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01100255A (en) * | 1987-10-13 | 1989-04-18 | Ricoh Co Ltd | Formation of antireflection film |
Also Published As
Publication number | Publication date |
---|---|
JPS617470B2 (en) | 1986-03-06 |
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