JPS55141565A - Sputtering apparatus - Google Patents
Sputtering apparatusInfo
- Publication number
- JPS55141565A JPS55141565A JP4674179A JP4674179A JPS55141565A JP S55141565 A JPS55141565 A JP S55141565A JP 4674179 A JP4674179 A JP 4674179A JP 4674179 A JP4674179 A JP 4674179A JP S55141565 A JPS55141565 A JP S55141565A
- Authority
- JP
- Japan
- Prior art keywords
- spherical
- film
- electrode
- substrate
- spherical substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/046—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To form a film of uniform thickness very easily on the inner surface of a spherical substrate in sputtering a film of a dielectric material on the inner surface of a spherical substrate, by arranging a spherical high frequency electrode applied with the material of the film, in the spherical substrate, then by producing glow discharge between the spherical electrode and an earth electrode. CONSTITUTION:A spherical substrate 9, which is similar in shape to a globe of lighting apparatus, is arranged in a vacuum vessel, then the vessl is evacuated and an atmosphere gas is introduced at a constant pressure. A spherical, high frequency electrode 11 applied with a film material 13 is arranged in the center of the spherical substrate 9, and glow discharge is produced between the spherical electrode 11 and a lower cylindrical each electrode 16, whereby the film material 13 painted on the electrode 11 is sputtered by the glow discharge and adheres to the inner surface of the spherical substrate 9 to form a film. Because the high frequency electrode 11 is spherical, the distance from the inner surface of the spherical substrate to the film material is equal at all points of the substrate, so that a film of uniform thickness is formed on the inner surface of the spherical substrate 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4674179A JPS55141565A (en) | 1979-04-18 | 1979-04-18 | Sputtering apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4674179A JPS55141565A (en) | 1979-04-18 | 1979-04-18 | Sputtering apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55141565A true JPS55141565A (en) | 1980-11-05 |
Family
ID=12755747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4674179A Pending JPS55141565A (en) | 1979-04-18 | 1979-04-18 | Sputtering apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55141565A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0262323A2 (en) * | 1986-07-26 | 1988-04-06 | Andreas Biedermann | Process for the interior coating of electrically non-conducting hollow bodies |
-
1979
- 1979-04-18 JP JP4674179A patent/JPS55141565A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0262323A2 (en) * | 1986-07-26 | 1988-04-06 | Andreas Biedermann | Process for the interior coating of electrically non-conducting hollow bodies |
EP0262323A3 (en) * | 1986-07-26 | 1989-07-26 | Andreas Biedermann | Process for the interior coating of electrically non-conducting hollow bodies |
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