GB1405489A - Sputtering apparatus - Google Patents

Sputtering apparatus

Info

Publication number
GB1405489A
GB1405489A GB4550572A GB4550572A GB1405489A GB 1405489 A GB1405489 A GB 1405489A GB 4550572 A GB4550572 A GB 4550572A GB 4550572 A GB4550572 A GB 4550572A GB 1405489 A GB1405489 A GB 1405489A
Authority
GB
United Kingdom
Prior art keywords
sputtering apparatus
chamber
oct
heading
concentrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB4550572A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Balzers Patent und Beteiligungs AG
Original Assignee
Balzers Patent und Beteiligungs AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent und Beteiligungs AG filed Critical Balzers Patent und Beteiligungs AG
Publication of GB1405489A publication Critical patent/GB1405489A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/354—Introduction of auxiliary energy into the plasma
    • C23C14/355—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1405489 Sputtering apparatus BALZERS PATENT-UND BETEILIGUNGS-AG 3 Oct 1972 [6 Oct 1971] 45505/72 Heading C7F Sputtering apparatus comprises a cathode 13 in one chamber and an anode 7 and target 6 in another chamber having a common wall 9 electrically insulated from the chambers by members 10 or a coating of insulating material. Articles 3 to be coated are supported on a frame 2; a coil 15 surrounds the chamber 1 to concentrate the discharge; gas is introduced through a needle valve 12.
GB4550572A 1971-10-06 1972-10-03 Sputtering apparatus Expired GB1405489A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH1476071A CH551497A (en) 1971-10-06 1971-10-06 ARRANGEMENT FOR THE ATOMIZATION OF SUBSTANCES USING AN ELECTRIC LOW VOLTAGE DISCHARGE.

Publications (1)

Publication Number Publication Date
GB1405489A true GB1405489A (en) 1975-09-10

Family

ID=4403604

Family Applications (1)

Application Number Title Priority Date Filing Date
GB4550572A Expired GB1405489A (en) 1971-10-06 1972-10-03 Sputtering apparatus

Country Status (5)

Country Link
US (1) US3839182A (en)
CH (1) CH551497A (en)
FR (1) FR2155589A5 (en)
GB (1) GB1405489A (en)
NL (1) NL7116297A (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH631743A5 (en) * 1977-06-01 1982-08-31 Balzers Hochvakuum METHOD FOR EVAPORATING MATERIAL IN A VACUUM EVAPORATION SYSTEM.
US4111783A (en) * 1977-11-08 1978-09-05 Bell Telephone Laboratories, Incorporated Triode sputtering system
JPS57134559A (en) * 1981-02-12 1982-08-19 Toyota Central Res & Dev Lab Inc Physical vapor deposition device
US4556471A (en) * 1983-10-14 1985-12-03 Multi-Arc Vacuum Systems Inc. Physical vapor deposition apparatus
US5084151A (en) * 1985-11-26 1992-01-28 Sorin Biomedica S.P.A. Method and apparatus for forming prosthetic device having a biocompatible carbon film thereon
US5133845A (en) * 1986-12-12 1992-07-28 Sorin Biomedica, S.P.A. Method for making prosthesis of polymeric material coated with biocompatible carbon
DE3880135T2 (en) * 1988-09-08 1993-09-16 Joshin Uramoto SPRAYING METHOD BY MEANS OF A BAND-SHAPED PLASMA FLOW AND DEVICE FOR HANDLING THIS METHOD.
US4943325A (en) * 1988-10-19 1990-07-24 Black & Veatch, Engineers-Architects Reflector assembly
US4936960A (en) * 1989-01-03 1990-06-26 Advanced Energy Industries, Inc. Method and apparatus for recovery from low impedance condition during cathodic arc processes
US4963238A (en) * 1989-01-13 1990-10-16 Siefkes Jerry D Method for removal of electrical shorts in a sputtering system
DE58907191D1 (en) * 1989-02-09 1994-04-14 Balzers Hochvakuum Method for centering an electron beam.
US5250779A (en) * 1990-11-05 1993-10-05 Balzers Aktiengesellschaft Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field
CH687111A5 (en) * 1992-05-26 1996-09-13 Balzers Hochvakuum A method for generating a low voltage discharge, vacuum treatment system here, as well as for application of the method.
WO1996031899A1 (en) 1995-04-07 1996-10-10 Advanced Energy Industries, Inc. Adjustable energy quantum thin film plasma processing system
JP4806146B2 (en) * 1999-07-13 2011-11-02 エリコン・トレーディング・アクチェンゲゼルシャフト，トリュープバッハ Apparatus and method for vacuum processing or powder production
US20090065045A1 (en) * 2007-09-10 2009-03-12 Zenith Solar Ltd. Solar electricity generation system
US9893223B2 (en) 2010-11-16 2018-02-13 Suncore Photovoltaics, Inc. Solar electricity generation system

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1502647A (en) * 1965-12-17 1968-02-07
FR1534917A (en) * 1967-06-22 1968-08-02 Alcatel Sa Improvements in obtaining deposits by cathodic sputtering
US3708418A (en) * 1970-03-05 1973-01-02 Rca Corp Apparatus for etching of thin layers of material by ion bombardment
US3711398A (en) * 1971-02-18 1973-01-16 P Clarke Sputtering apparatus

Also Published As

Publication number Publication date
US3839182A (en) 1974-10-01
FR2155589A5 (en) 1973-05-18
DE2246983A1 (en) 1973-04-12
NL7116297A (en) 1973-04-10
CH551497A (en) 1974-07-15
DE2246983B2 (en) 1975-11-20

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee