JPS55110041A - Electron beam projector - Google Patents

Electron beam projector

Info

Publication number
JPS55110041A
JPS55110041A JP1617879A JP1617879A JPS55110041A JP S55110041 A JPS55110041 A JP S55110041A JP 1617879 A JP1617879 A JP 1617879A JP 1617879 A JP1617879 A JP 1617879A JP S55110041 A JPS55110041 A JP S55110041A
Authority
JP
Japan
Prior art keywords
lens
focal point
aperture
deflection
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1617879A
Other languages
Japanese (ja)
Inventor
Chikaichi Ito
Masatoshi Utaka
Takayuki Asai
Toshio Eto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP1617879A priority Critical patent/JPS55110041A/en
Publication of JPS55110041A publication Critical patent/JPS55110041A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To reduce projecting deflection, simultaneously improve resolving power by a method wherein a driving input is adjusted by making variable the driving input of an irradiating lens, and by synchronizing it with a deflecting, and the effective focal point of the lens is kept constant. CONSTITUTION:The deflection of the focal point of an irradiating lens is synchronized with the input of a deflecting coil, and corrected by adjusting the focal point of the lens. That is, a small aperture is provided at the position of a minimum aberrated circle near the rear focal point of the lens, and the focal point of the lens is changed so that an electron beam passes through the aperture. At this time, an electron beam sensitive film to which an image is projected is connected to an ammeter as a method for detecting the change, and a method for measuring the passing current is used. Otherwise, the aperture is connected to the ammeter, and the current interrupted by the aperture may be measured. By so doing, it is possible to reduce the deflection by about 1/2 and the resolving power by 1/3 compared with those prior to correction, furthermore to enlarge the projecting area twice as large as before.
JP1617879A 1979-02-16 1979-02-16 Electron beam projector Pending JPS55110041A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1617879A JPS55110041A (en) 1979-02-16 1979-02-16 Electron beam projector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1617879A JPS55110041A (en) 1979-02-16 1979-02-16 Electron beam projector

Publications (1)

Publication Number Publication Date
JPS55110041A true JPS55110041A (en) 1980-08-25

Family

ID=11909250

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1617879A Pending JPS55110041A (en) 1979-02-16 1979-02-16 Electron beam projector

Country Status (1)

Country Link
JP (1) JPS55110041A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4964097A (en) * 1972-06-30 1974-06-21
JPS5392671A (en) * 1977-01-20 1978-08-14 Siemens Ag Particleeray optical device for compressing and focusing specimen on mask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4964097A (en) * 1972-06-30 1974-06-21
JPS5392671A (en) * 1977-01-20 1978-08-14 Siemens Ag Particleeray optical device for compressing and focusing specimen on mask

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