JPS5460571A - Dry developing and etching method - Google Patents

Dry developing and etching method

Info

Publication number
JPS5460571A
JPS5460571A JP12745477A JP12745477A JPS5460571A JP S5460571 A JPS5460571 A JP S5460571A JP 12745477 A JP12745477 A JP 12745477A JP 12745477 A JP12745477 A JP 12745477A JP S5460571 A JPS5460571 A JP S5460571A
Authority
JP
Japan
Prior art keywords
etching method
dry developing
developing
dry
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12745477A
Other languages
Japanese (ja)
Inventor
Kiyokatsu Jinno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHO LSI GIJUTSU KENKYU KUMIAI
Priority to JP12745477A priority Critical patent/JPS5460571A/en
Publication of JPS5460571A publication Critical patent/JPS5460571A/en
Pending legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP12745477A 1977-10-24 1977-10-24 Dry developing and etching method Pending JPS5460571A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12745477A JPS5460571A (en) 1977-10-24 1977-10-24 Dry developing and etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12745477A JPS5460571A (en) 1977-10-24 1977-10-24 Dry developing and etching method

Publications (1)

Publication Number Publication Date
JPS5460571A true JPS5460571A (en) 1979-05-16

Family

ID=14960319

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12745477A Pending JPS5460571A (en) 1977-10-24 1977-10-24 Dry developing and etching method

Country Status (1)

Country Link
JP (1) JPS5460571A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56135928A (en) * 1980-03-27 1981-10-23 Fujitsu Ltd Forming method for pattern of silicone resin
JPS5711344A (en) * 1980-06-25 1982-01-21 Mitsubishi Electric Corp Dry developing method
JPS57211143A (en) * 1981-06-23 1982-12-24 Oki Electric Ind Co Ltd Formation of micropattern
JPS5976428A (en) * 1982-10-26 1984-05-01 Nippon Telegr & Teleph Corp <Ntt> Formation of fine pattern
JPH01102554A (en) * 1987-10-16 1989-04-20 Masataka Murahara Method for developing resist material

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56135928A (en) * 1980-03-27 1981-10-23 Fujitsu Ltd Forming method for pattern of silicone resin
JPH0132650B2 (en) * 1980-03-27 1989-07-10 Fujitsu Ltd
JPS5711344A (en) * 1980-06-25 1982-01-21 Mitsubishi Electric Corp Dry developing method
JPH0313583B2 (en) * 1980-06-25 1991-02-22 Mitsubishi Electric Corp
JPS57211143A (en) * 1981-06-23 1982-12-24 Oki Electric Ind Co Ltd Formation of micropattern
JPH0243172B2 (en) * 1981-06-23 1990-09-27
JPS5976428A (en) * 1982-10-26 1984-05-01 Nippon Telegr & Teleph Corp <Ntt> Formation of fine pattern
JPH01102554A (en) * 1987-10-16 1989-04-20 Masataka Murahara Method for developing resist material

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