JPS5460571A - Dry developing and etching method - Google Patents
Dry developing and etching methodInfo
- Publication number
- JPS5460571A JPS5460571A JP12745477A JP12745477A JPS5460571A JP S5460571 A JPS5460571 A JP S5460571A JP 12745477 A JP12745477 A JP 12745477A JP 12745477 A JP12745477 A JP 12745477A JP S5460571 A JPS5460571 A JP S5460571A
- Authority
- JP
- Japan
- Prior art keywords
- etching method
- dry developing
- developing
- dry
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12745477A JPS5460571A (en) | 1977-10-24 | 1977-10-24 | Dry developing and etching method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12745477A JPS5460571A (en) | 1977-10-24 | 1977-10-24 | Dry developing and etching method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5460571A true JPS5460571A (en) | 1979-05-16 |
Family
ID=14960319
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12745477A Pending JPS5460571A (en) | 1977-10-24 | 1977-10-24 | Dry developing and etching method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5460571A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56135928A (en) * | 1980-03-27 | 1981-10-23 | Fujitsu Ltd | Forming method for pattern of silicone resin |
JPS5711344A (en) * | 1980-06-25 | 1982-01-21 | Mitsubishi Electric Corp | Dry developing method |
JPS57211143A (en) * | 1981-06-23 | 1982-12-24 | Oki Electric Ind Co Ltd | Formation of micropattern |
JPS5976428A (en) * | 1982-10-26 | 1984-05-01 | Nippon Telegr & Teleph Corp <Ntt> | Formation of fine pattern |
JPH01102554A (en) * | 1987-10-16 | 1989-04-20 | Masataka Murahara | Method for developing resist material |
-
1977
- 1977-10-24 JP JP12745477A patent/JPS5460571A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56135928A (en) * | 1980-03-27 | 1981-10-23 | Fujitsu Ltd | Forming method for pattern of silicone resin |
JPH0132650B2 (en) * | 1980-03-27 | 1989-07-10 | Fujitsu Ltd | |
JPS5711344A (en) * | 1980-06-25 | 1982-01-21 | Mitsubishi Electric Corp | Dry developing method |
JPH0313583B2 (en) * | 1980-06-25 | 1991-02-22 | Mitsubishi Electric Corp | |
JPS57211143A (en) * | 1981-06-23 | 1982-12-24 | Oki Electric Ind Co Ltd | Formation of micropattern |
JPH0243172B2 (en) * | 1981-06-23 | 1990-09-27 | ||
JPS5976428A (en) * | 1982-10-26 | 1984-05-01 | Nippon Telegr & Teleph Corp <Ntt> | Formation of fine pattern |
JPH01102554A (en) * | 1987-10-16 | 1989-04-20 | Masataka Murahara | Method for developing resist material |
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