JPS5451832A - Photomask material - Google Patents
Photomask materialInfo
- Publication number
- JPS5451832A JPS5451832A JP11768377A JP11768377A JPS5451832A JP S5451832 A JPS5451832 A JP S5451832A JP 11768377 A JP11768377 A JP 11768377A JP 11768377 A JP11768377 A JP 11768377A JP S5451832 A JPS5451832 A JP S5451832A
- Authority
- JP
- Japan
- Prior art keywords
- film
- chromium
- substrate
- films
- electrically conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE: To form a reflection preventing thin photmask material which has superior film characteristics and is not charged with static electricity, by superposing chromium films and a chromium oxide film by use of specific methods on a substrate covered with a transparent electrically conductive film.
CONSTITUTION: Transparent electrically conductive film 2 made of indium oxide, tin oxide, etc. with a surface resistance less than about 10 KΩ/square is formed on transparent substrate 1. On substrate 1, about 200W800Å thick chromium film 3, about 100W300Å thick chromium film 4 and about 150W400Å thick chromium oxide film 5 are successively formed in layers by sputtering, vacuum deposition and vacuum deposition, respectively. The total light transmission density of films 3,4 is desirable to be a value above 2.5 and near 2.5 in respect of resolving power
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11768377A JPS5451832A (en) | 1977-09-30 | 1977-09-30 | Photomask material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11768377A JPS5451832A (en) | 1977-09-30 | 1977-09-30 | Photomask material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5451832A true JPS5451832A (en) | 1979-04-24 |
JPS5756068B2 JPS5756068B2 (en) | 1982-11-27 |
Family
ID=14717697
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11768377A Granted JPS5451832A (en) | 1977-09-30 | 1977-09-30 | Photomask material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5451832A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5739490U (en) * | 1980-08-18 | 1982-03-03 | ||
JPS5741638A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Photomask for electron beam |
JPS5849945A (en) * | 1981-08-31 | 1983-03-24 | Konishiroku Photo Ind Co Ltd | Manufacture of photomask material |
US4440841A (en) * | 1981-02-28 | 1984-04-03 | Dai Nippon Insatsu Kabushiki Kaisha | Photomask and photomask blank |
US4556608A (en) * | 1980-10-09 | 1985-12-03 | Dai Nippon Insatsu Kabushiki Kaisha | Photomask blank and photomask |
US4563407A (en) * | 1982-11-16 | 1986-01-07 | Hoya Corporation | Photo-mask blank comprising a shading layer having a variable etch rate |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61162459A (en) * | 1984-12-28 | 1986-07-23 | Fuji Photo Film Co Ltd | Paper roll feeding device for electronic photoengraving machine |
-
1977
- 1977-09-30 JP JP11768377A patent/JPS5451832A/en active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5739490U (en) * | 1980-08-18 | 1982-03-03 | ||
JPS6018870Y2 (en) * | 1980-08-18 | 1985-06-07 | 株式会社東芝 | Plug-in unit storage device |
JPS5741638A (en) * | 1980-08-25 | 1982-03-08 | Fujitsu Ltd | Photomask for electron beam |
JPS6262336B2 (en) * | 1980-08-25 | 1987-12-25 | Fujitsu Ltd | |
US4556608A (en) * | 1980-10-09 | 1985-12-03 | Dai Nippon Insatsu Kabushiki Kaisha | Photomask blank and photomask |
US4440841A (en) * | 1981-02-28 | 1984-04-03 | Dai Nippon Insatsu Kabushiki Kaisha | Photomask and photomask blank |
JPS5849945A (en) * | 1981-08-31 | 1983-03-24 | Konishiroku Photo Ind Co Ltd | Manufacture of photomask material |
US4563407A (en) * | 1982-11-16 | 1986-01-07 | Hoya Corporation | Photo-mask blank comprising a shading layer having a variable etch rate |
Also Published As
Publication number | Publication date |
---|---|
JPS5756068B2 (en) | 1982-11-27 |
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