JPS54128678A - Forming method of insulation film - Google Patents

Forming method of insulation film

Info

Publication number
JPS54128678A
JPS54128678A JP3610278A JP3610278A JPS54128678A JP S54128678 A JPS54128678 A JP S54128678A JP 3610278 A JP3610278 A JP 3610278A JP 3610278 A JP3610278 A JP 3610278A JP S54128678 A JPS54128678 A JP S54128678A
Authority
JP
Japan
Prior art keywords
film
oxide film
dielectric strength
poly
oxidation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3610278A
Other languages
English (en)
Other versions
JPS5729842B2 (ja
Inventor
Haruo Okano
Nozomi Harada
Nobuhisa Kubota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3610278A priority Critical patent/JPS54128678A/ja
Publication of JPS54128678A publication Critical patent/JPS54128678A/ja
Publication of JPS5729842B2 publication Critical patent/JPS5729842B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Solid State Image Pick-Up Elements (AREA)
  • Formation Of Insulating Films (AREA)
JP3610278A 1978-03-30 1978-03-30 Forming method of insulation film Granted JPS54128678A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3610278A JPS54128678A (en) 1978-03-30 1978-03-30 Forming method of insulation film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3610278A JPS54128678A (en) 1978-03-30 1978-03-30 Forming method of insulation film

Publications (2)

Publication Number Publication Date
JPS54128678A true JPS54128678A (en) 1979-10-05
JPS5729842B2 JPS5729842B2 (ja) 1982-06-25

Family

ID=12460395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3610278A Granted JPS54128678A (en) 1978-03-30 1978-03-30 Forming method of insulation film

Country Status (1)

Country Link
JP (1) JPS54128678A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5676537A (en) * 1979-11-27 1981-06-24 Fujitsu Ltd Manufacture of semiconductor device
JPS6372129A (ja) * 1986-09-12 1988-04-01 Katsuhiro Yokota ３−５族化合物半導体のための保護膜

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5676537A (en) * 1979-11-27 1981-06-24 Fujitsu Ltd Manufacture of semiconductor device
JPS6211781B2 (ja) * 1979-11-27 1987-03-14 Fujitsu Ltd
JPS6372129A (ja) * 1986-09-12 1988-04-01 Katsuhiro Yokota ３−５族化合物半導体のための保護膜

Also Published As

Publication number Publication date
JPS5729842B2 (ja) 1982-06-25

Similar Documents

Publication Publication Date Title
JPS56115525A (en) Manufacture of semiconductor device
JPS5448484A (en) Forming method of insulation film
JPS56161646A (en) Manufacture of semiconductor device
JPS5516464A (en) Method of forming wafer for semiconductor device
JPS54128678A (en) Forming method of insulation film
JPS57167669A (en) Capacitor and manufacture thereof
JPS6477174A (en) Manufacture of semiconductor device
JPS5568651A (en) Manufacturing method of semiconductor device
JPS57196542A (en) Semiconductor integrated circuit device and manufacture thereof
JPS57130448A (en) Manufacture of semiconductor device
JPS5458381A (en) Manufacture for semiconductor device
JPS5559778A (en) Method of fabricating semiconductor device
JPS551166A (en) Method of fabricating semiconductor
JPS558036A (en) Electrode formation
JPS57112032A (en) Formation of insulating film
JPS57164560A (en) Manufacture of semiconductor integrated circuit device
JPS55110056A (en) Semiconductor device
JPS57126181A (en) Super conductor element
JPS54117690A (en) Production of semiconductor device
JPS57128943A (en) Insulation isolated semiconductor integrated device and manufacture thereof
JPS533066A (en) Electrode formation method
JPS5780768A (en) Semiconductor device
JPS5718362A (en) Semiconductor device and manufacture thereof
JPS57194546A (en) Semiconductor device and manufacture thereof
JPS5513952A (en) Manufacturing method of semiconductor device