JPS54122970A - Objective lens for scanning electronic microscope or the like - Google Patents

Objective lens for scanning electronic microscope or the like

Info

Publication number
JPS54122970A
JPS54122970A JP3014178A JP3014178A JPS54122970A JP S54122970 A JPS54122970 A JP S54122970A JP 3014178 A JP3014178 A JP 3014178A JP 3014178 A JP3014178 A JP 3014178A JP S54122970 A JPS54122970 A JP S54122970A
Authority
JP
Japan
Prior art keywords
coil
auxiliary
distribution
magnetic field
remarkably
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3014178A
Other languages
Japanese (ja)
Other versions
JPS5845782B2 (en
Inventor
Seiichi Nakagawa
Masaji Kikuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP3014178A priority Critical patent/JPS5845782B2/en
Publication of JPS54122970A publication Critical patent/JPS54122970A/en
Publication of JPS5845782B2 publication Critical patent/JPS5845782B2/en
Expired legal-status Critical Current

Links

Abstract

PURPOSE: To remarkably reduce aberration, by providing the coil producing the magnetic field of rotational symmetry to the light axis, at the center or inside of the auxiliary gap.
CONSTITUTION: When power is fed to the coil 6, magnetomotive force is produced, and it is distributed to the main and auxiliary gaps 4, 5 depending on the gaps S, S'. S'/S is less than 2/3. The auxiliary coil 7 produces the magnetic field of rotational symmetry to the light axis. The coil 8 is used for deflection. The magnetic field distribution a in the main gap 4 having half value d1 and that b of the auxiliary gap 5 are synthesized, and the resultant distribution c is extended to the half value d2. Further, the magnetic field distribution d of the auxiliary coil 7 is synthesized causing the distribution e and the half value d3 can remarkably be increased. When adjusting the exciting current to the coil 7 and changing the distribution d, d3 can arbitrarily be selected. With this method, the spherical aberration and astigmatism can remarkably be decreased with slight increase in the magnetomotive force.
COPYRIGHT: (C)1979,JPO&Japio
JP3014178A 1978-03-16 1978-03-16 Objective lenses for scanning electron microscopes, etc. Expired JPS5845782B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3014178A JPS5845782B2 (en) 1978-03-16 1978-03-16 Objective lenses for scanning electron microscopes, etc.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3014178A JPS5845782B2 (en) 1978-03-16 1978-03-16 Objective lenses for scanning electron microscopes, etc.

Publications (2)

Publication Number Publication Date
JPS54122970A true JPS54122970A (en) 1979-09-22
JPS5845782B2 JPS5845782B2 (en) 1983-10-12

Family

ID=12295482

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3014178A Expired JPS5845782B2 (en) 1978-03-16 1978-03-16 Objective lenses for scanning electron microscopes, etc.

Country Status (1)

Country Link
JP (1) JPS5845782B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5994350A (en) * 1982-11-19 1984-05-31 Akashi Seisakusho Co Ltd Electromagnetic objective lens
JPS5996758U (en) * 1982-12-20 1984-06-30 株式会社明石製作所 Electromagnetic objective lens
JPH02216745A (en) * 1989-02-16 1990-08-29 Shimadzu Corp Electronic optical system to get false parallel microdiameter electron beam
WO2006088159A1 (en) * 2005-02-21 2006-08-24 National University Corporation Kyoto Institute Of Technology Electron microscope and composite irradiation lens

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5994350A (en) * 1982-11-19 1984-05-31 Akashi Seisakusho Co Ltd Electromagnetic objective lens
JPS5996758U (en) * 1982-12-20 1984-06-30 株式会社明石製作所 Electromagnetic objective lens
JPH02216745A (en) * 1989-02-16 1990-08-29 Shimadzu Corp Electronic optical system to get false parallel microdiameter electron beam
WO2006088159A1 (en) * 2005-02-21 2006-08-24 National University Corporation Kyoto Institute Of Technology Electron microscope and composite irradiation lens
EP1852890A1 (en) * 2005-02-21 2007-11-07 National University Corporation Kyoto Institute of Technology Electron microscope and composite irradiation lens
US7601957B2 (en) 2005-02-21 2009-10-13 National University Corporation Kyoto Institute Of Technology Electron microscope and combined illumination lens
EP1852890A4 (en) * 2005-02-21 2010-11-24 Nat Univ Corp Kyoto Inst Tech Electron microscope and composite irradiation lens
JP4807592B2 (en) * 2005-02-21 2011-11-02 国立大学法人京都工芸繊維大学 Electron microscope and compound irradiation lens

Also Published As

Publication number Publication date
JPS5845782B2 (en) 1983-10-12

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