JPS54121971A - Continuous exposure apparatus for longgsized flexible substrate - Google Patents
Continuous exposure apparatus for longgsized flexible substrateInfo
- Publication number
- JPS54121971A JPS54121971A JP2939778A JP2939778A JPS54121971A JP S54121971 A JPS54121971 A JP S54121971A JP 2939778 A JP2939778 A JP 2939778A JP 2939778 A JP2939778 A JP 2939778A JP S54121971 A JPS54121971 A JP S54121971A
- Authority
- JP
- Japan
- Prior art keywords
- longgsized
- exposure apparatus
- flexible substrate
- continuous exposure
- continuous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2939778A JPS54121971A (en) | 1978-03-15 | 1978-03-15 | Continuous exposure apparatus for longgsized flexible substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2939778A JPS54121971A (en) | 1978-03-15 | 1978-03-15 | Continuous exposure apparatus for longgsized flexible substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54121971A true JPS54121971A (en) | 1979-09-21 |
Family
ID=12274996
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2939778A Pending JPS54121971A (en) | 1978-03-15 | 1978-03-15 | Continuous exposure apparatus for longgsized flexible substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54121971A (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0467654U (ja) * | 1990-10-24 | 1992-06-16 | ||
JP2007225884A (ja) * | 2006-02-23 | 2007-09-06 | Mitsubishi Paper Mills Ltd | 連続露光装置 |
US7947429B2 (en) | 2006-08-03 | 2011-05-24 | 3M Innovative Properties Company | Long length flexible circuits and method of making same |
WO2013035489A1 (ja) * | 2011-09-06 | 2013-03-14 | 株式会社ニコン | 基板処理装置 |
WO2013136834A1 (ja) * | 2012-03-15 | 2013-09-19 | 株式会社ニコン | マスクユニット、基板処理装置及びマスクユニット製造方法並びに基板処理方法 |
-
1978
- 1978-03-15 JP JP2939778A patent/JPS54121971A/ja active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0467654U (ja) * | 1990-10-24 | 1992-06-16 | ||
JP2007225884A (ja) * | 2006-02-23 | 2007-09-06 | Mitsubishi Paper Mills Ltd | 連続露光装置 |
US7947429B2 (en) | 2006-08-03 | 2011-05-24 | 3M Innovative Properties Company | Long length flexible circuits and method of making same |
WO2013035489A1 (ja) * | 2011-09-06 | 2013-03-14 | 株式会社ニコン | 基板処理装置 |
JPWO2013035489A1 (ja) * | 2011-09-06 | 2015-03-23 | 株式会社ニコン | 基板処理装置 |
WO2013136834A1 (ja) * | 2012-03-15 | 2013-09-19 | 株式会社ニコン | マスクユニット、基板処理装置及びマスクユニット製造方法並びに基板処理方法 |
JP2018077530A (ja) * | 2012-03-15 | 2018-05-17 | 株式会社ニコン | 基板処理装置、及びパターン形成方法 |
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