JPS54109769A - Semiconductor device connecting tape - Google Patents
Semiconductor device connecting tapeInfo
- Publication number
- JPS54109769A JPS54109769A JP1715478A JP1715478A JPS54109769A JP S54109769 A JPS54109769 A JP S54109769A JP 1715478 A JP1715478 A JP 1715478A JP 1715478 A JP1715478 A JP 1715478A JP S54109769 A JPS54109769 A JP S54109769A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- semiconductor device
- wiring
- vamp
- adhered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/50—Tape automated bonding [TAB] connectors, i.e. film carriers; Manufacturing methods related thereto
Landscapes
- Wire Bonding (AREA)
Abstract
PURPOSE: To avoid the short circuit on the side surface of the device when the electrode terminal of the semiconductor device is connected to the wiring through the opening by forming the film carrier by adhering the metal foil wiring on the surface of the flexible tape which is insulating electrically and then coating the electric insulating organic resin containing the fixed opening on the metal foil wiring.
CONSTITUTION: The copper foil is adhered with use of no adhesive on one surface of polyimide film 51, and then lead pattern 52 is formed through the photo etching. Then polyimide resin layer 53 is coated thin on pattern 52 and then hardened by burning, and then fixed opening part 54 is drilled again to layer 53 through the photo etching. After this, the tin plating is applied on exposed pattern 52, and gold vamp 56 of the semiconductor device is pressed there to cause the gold-tin eutectic alloy which is then adhered. In such way, no position shift is caused between vamp 56 and pattern 52, and at the same time the thin copper foil can be used. As a result, pattern 52 becomes minute.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1715478A JPS54109769A (en) | 1978-02-16 | 1978-02-16 | Semiconductor device connecting tape |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1715478A JPS54109769A (en) | 1978-02-16 | 1978-02-16 | Semiconductor device connecting tape |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54109769A true JPS54109769A (en) | 1979-08-28 |
Family
ID=11936055
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1715478A Pending JPS54109769A (en) | 1978-02-16 | 1978-02-16 | Semiconductor device connecting tape |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54109769A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01276637A (en) * | 1988-03-22 | 1989-11-07 | Bull Sa | High density integrated circuit supporter and equipment for selective tin-plating of conductor of the supporter |
JPH02209742A (en) * | 1988-09-16 | 1990-08-21 | Natl Semiconductor Corp <Ns> | Gold/tin entectic bonding for tape automaization bonding process |
JPH05235109A (en) * | 1992-02-19 | 1993-09-10 | Sumitomo Metal Mining Co Ltd | Coplanar-type tape carrier with grounding metal plane and its manufacture |
-
1978
- 1978-02-16 JP JP1715478A patent/JPS54109769A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01276637A (en) * | 1988-03-22 | 1989-11-07 | Bull Sa | High density integrated circuit supporter and equipment for selective tin-plating of conductor of the supporter |
JPH02209742A (en) * | 1988-09-16 | 1990-08-21 | Natl Semiconductor Corp <Ns> | Gold/tin entectic bonding for tape automaization bonding process |
JPH05235109A (en) * | 1992-02-19 | 1993-09-10 | Sumitomo Metal Mining Co Ltd | Coplanar-type tape carrier with grounding metal plane and its manufacture |
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