JPS5372573A - Mask alignment device - Google Patents

Mask alignment device

Info

Publication number
JPS5372573A
JPS5372573A JP14780176A JP14780176A JPS5372573A JP S5372573 A JPS5372573 A JP S5372573A JP 14780176 A JP14780176 A JP 14780176A JP 14780176 A JP14780176 A JP 14780176A JP S5372573 A JPS5372573 A JP S5372573A
Authority
JP
Japan
Prior art keywords
alignment device
mask alignment
mask
wafer
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14780176A
Other languages
Japanese (ja)
Other versions
JPS5346698B2 (en
Inventor
Mitsuo Takasugi
Kimio Muramatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP14780176A priority Critical patent/JPS5372573A/en
Publication of JPS5372573A publication Critical patent/JPS5372573A/en
Publication of JPS5346698B2 publication Critical patent/JPS5346698B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE: To obtain a mask matching device using a highly durable Cr mask, by driving the wafer chuck with a high-vacuum intensive force after exposure to separate the wafer from the mask.
COPYRIGHT: (C)1978,JPO&Japio
JP14780176A 1976-12-10 1976-12-10 Mask alignment device Granted JPS5372573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14780176A JPS5372573A (en) 1976-12-10 1976-12-10 Mask alignment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14780176A JPS5372573A (en) 1976-12-10 1976-12-10 Mask alignment device

Publications (2)

Publication Number Publication Date
JPS5372573A true JPS5372573A (en) 1978-06-28
JPS5346698B2 JPS5346698B2 (en) 1978-12-15

Family

ID=15438511

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14780176A Granted JPS5372573A (en) 1976-12-10 1976-12-10 Mask alignment device

Country Status (1)

Country Link
JP (1) JPS5372573A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS605118U (en) * 1983-06-21 1985-01-14 日本電気株式会社 Alignment mechanism for exposure equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS605118U (en) * 1983-06-21 1985-01-14 日本電気株式会社 Alignment mechanism for exposure equipment

Also Published As

Publication number Publication date
JPS5346698B2 (en) 1978-12-15

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