JPS5372573A - Mask alignment device - Google Patents
Mask alignment deviceInfo
- Publication number
- JPS5372573A JPS5372573A JP14780176A JP14780176A JPS5372573A JP S5372573 A JPS5372573 A JP S5372573A JP 14780176 A JP14780176 A JP 14780176A JP 14780176 A JP14780176 A JP 14780176A JP S5372573 A JPS5372573 A JP S5372573A
- Authority
- JP
- Japan
- Prior art keywords
- alignment device
- mask alignment
- mask
- wafer
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE: To obtain a mask matching device using a highly durable Cr mask, by driving the wafer chuck with a high-vacuum intensive force after exposure to separate the wafer from the mask.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14780176A JPS5372573A (en) | 1976-12-10 | 1976-12-10 | Mask alignment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14780176A JPS5372573A (en) | 1976-12-10 | 1976-12-10 | Mask alignment device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5372573A true JPS5372573A (en) | 1978-06-28 |
JPS5346698B2 JPS5346698B2 (en) | 1978-12-15 |
Family
ID=15438511
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14780176A Granted JPS5372573A (en) | 1976-12-10 | 1976-12-10 | Mask alignment device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5372573A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS605118U (en) * | 1983-06-21 | 1985-01-14 | 日本電気株式会社 | Alignment mechanism for exposure equipment |
-
1976
- 1976-12-10 JP JP14780176A patent/JPS5372573A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS605118U (en) * | 1983-06-21 | 1985-01-14 | 日本電気株式会社 | Alignment mechanism for exposure equipment |
Also Published As
Publication number | Publication date |
---|---|
JPS5346698B2 (en) | 1978-12-15 |
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