JPS536026A - Amendment of mask substrate - Google Patents
Amendment of mask substrateInfo
- Publication number
- JPS536026A JPS536026A JP8016876A JP8016876A JPS536026A JP S536026 A JPS536026 A JP S536026A JP 8016876 A JP8016876 A JP 8016876A JP 8016876 A JP8016876 A JP 8016876A JP S536026 A JPS536026 A JP S536026A
- Authority
- JP
- Japan
- Prior art keywords
- amendment
- mask substrate
- substrate
- amend
- scratches
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C11/00—Auxiliary processes in photography
- G03C11/06—Smoothing; Renovating; Roughening; Matting; Cleaning; Lubricating; Flame-retardant treatments
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To amend the scratches of the substrate and improve the yield of the product, by forming a protective film on the surface opposite to a pattern side and polishing this.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51080168A JPS6036579B2 (en) | 1976-07-06 | 1976-07-06 | How to repair mask board |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51080168A JPS6036579B2 (en) | 1976-07-06 | 1976-07-06 | How to repair mask board |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS536026A true JPS536026A (en) | 1978-01-20 |
JPS6036579B2 JPS6036579B2 (en) | 1985-08-21 |
Family
ID=13710783
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51080168A Expired JPS6036579B2 (en) | 1976-07-06 | 1976-07-06 | How to repair mask board |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6036579B2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60233103A (en) * | 1984-05-07 | 1985-11-19 | Shin Etsu Chem Co Ltd | Polymerization of vinyl monomers |
WO2005124455A1 (en) * | 2004-06-22 | 2005-12-29 | Hoya Corporation | Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask |
JP2006039525A (en) * | 2004-06-22 | 2006-02-09 | Hoya Corp | Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask |
JP2010170011A (en) * | 2009-01-26 | 2010-08-05 | Hoya Corp | Method of correcting photomask |
CN110161800A (en) * | 2019-04-26 | 2019-08-23 | 信利光电股份有限公司 | A kind of light shield damage rehabilitation method |
-
1976
- 1976-07-06 JP JP51080168A patent/JPS6036579B2/en not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60233103A (en) * | 1984-05-07 | 1985-11-19 | Shin Etsu Chem Co Ltd | Polymerization of vinyl monomers |
WO2005124455A1 (en) * | 2004-06-22 | 2005-12-29 | Hoya Corporation | Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask |
JP2006039525A (en) * | 2004-06-22 | 2006-02-09 | Hoya Corp | Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask |
US7862960B2 (en) | 2004-06-22 | 2011-01-04 | Hoya Corporation | Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks |
US8039178B2 (en) | 2004-06-22 | 2011-10-18 | Hoya Corporation | Manufacturing method of transparent substrate for mask blanks, manufacturing method of mask blanks, manufacturing method of exposure masks, manufacturing method of semiconductor devices, manufacturing method of liquid crystal display devices, and defect correction method of exposure masks |
JP2010170011A (en) * | 2009-01-26 | 2010-08-05 | Hoya Corp | Method of correcting photomask |
CN110161800A (en) * | 2019-04-26 | 2019-08-23 | 信利光电股份有限公司 | A kind of light shield damage rehabilitation method |
Also Published As
Publication number | Publication date |
---|---|
JPS6036579B2 (en) | 1985-08-21 |
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