JPS5317583A - Process for forming vacuum evaporation layer on largeesized substrate surface - Google Patents
Process for forming vacuum evaporation layer on largeesized substrate surfaceInfo
- Publication number
- JPS5317583A JPS5317583A JP9267276A JP9267276A JPS5317583A JP S5317583 A JPS5317583 A JP S5317583A JP 9267276 A JP9267276 A JP 9267276A JP 9267276 A JP9267276 A JP 9267276A JP S5317583 A JPS5317583 A JP S5317583A
- Authority
- JP
- Japan
- Prior art keywords
- largeesized
- substrate surface
- vacuum evaporation
- evaporation layer
- forming vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9267276A JPS5317583A (en) | 1976-08-02 | 1976-08-02 | Process for forming vacuum evaporation layer on largeesized substrate surface |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9267276A JPS5317583A (en) | 1976-08-02 | 1976-08-02 | Process for forming vacuum evaporation layer on largeesized substrate surface |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5317583A true JPS5317583A (en) | 1978-02-17 |
Family
ID=14060963
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9267276A Pending JPS5317583A (en) | 1976-08-02 | 1976-08-02 | Process for forming vacuum evaporation layer on largeesized substrate surface |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5317583A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4514275A (en) * | 1981-02-12 | 1985-04-30 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Apparatus for physical vapor deposition |
US5529815A (en) * | 1994-11-03 | 1996-06-25 | Lemelson; Jerome H. | Apparatus and method for forming diamond coating |
FR2839459A1 (en) * | 2002-05-13 | 2003-11-14 | Pvdco | Reactor for the deposition of a metal or ceramic coating under a rarefied atmosphere which can be applied in a sealed manner over a predefined zone on the surface of a substrate |
US7845548B2 (en) | 2005-09-01 | 2010-12-07 | Ho-Sup Kim | Lamination method |
-
1976
- 1976-08-02 JP JP9267276A patent/JPS5317583A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4514275A (en) * | 1981-02-12 | 1985-04-30 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Apparatus for physical vapor deposition |
US5529815A (en) * | 1994-11-03 | 1996-06-25 | Lemelson; Jerome H. | Apparatus and method for forming diamond coating |
FR2839459A1 (en) * | 2002-05-13 | 2003-11-14 | Pvdco | Reactor for the deposition of a metal or ceramic coating under a rarefied atmosphere which can be applied in a sealed manner over a predefined zone on the surface of a substrate |
US7845548B2 (en) | 2005-09-01 | 2010-12-07 | Ho-Sup Kim | Lamination method |
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