JPS5315765A - Vacuum caontact prevention method of hard mask - Google Patents
Vacuum caontact prevention method of hard maskInfo
- Publication number
- JPS5315765A JPS5315765A JP8910576A JP8910576A JPS5315765A JP S5315765 A JPS5315765 A JP S5315765A JP 8910576 A JP8910576 A JP 8910576A JP 8910576 A JP8910576 A JP 8910576A JP S5315765 A JPS5315765 A JP S5315765A
- Authority
- JP
- Japan
- Prior art keywords
- hard mask
- vacuum
- caontact
- prevention method
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE: To prevent the vacuum contact of a hard mask by providing grooves to the opposing surfaces of a wafer and the hard mask thereby escaping air.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8910576A JPS5315765A (en) | 1976-07-28 | 1976-07-28 | Vacuum caontact prevention method of hard mask |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8910576A JPS5315765A (en) | 1976-07-28 | 1976-07-28 | Vacuum caontact prevention method of hard mask |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5315765A true JPS5315765A (en) | 1978-02-14 |
Family
ID=13961598
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8910576A Pending JPS5315765A (en) | 1976-07-28 | 1976-07-28 | Vacuum caontact prevention method of hard mask |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5315765A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5376397A (en) * | 1976-12-18 | 1978-07-06 | Agency Of Ind Science & Technol | Photo mask for manufacturing magnetic bubble element |
JPS63187147U (en) * | 1987-05-18 | 1988-11-30 |
-
1976
- 1976-07-28 JP JP8910576A patent/JPS5315765A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5376397A (en) * | 1976-12-18 | 1978-07-06 | Agency Of Ind Science & Technol | Photo mask for manufacturing magnetic bubble element |
JPS6019159B2 (en) * | 1976-12-18 | 1985-05-14 | 工業技術院長 | Photomask for magnetic bubble element production |
JPS63187147U (en) * | 1987-05-18 | 1988-11-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51111072A (en) | Photo etching method | |
JPS5315765A (en) | Vacuum caontact prevention method of hard mask | |
JPS51145005A (en) | Lubrication method of air compressor | |
JPS5321574A (en) | Contact and separation method of photo mask | |
JPS51136289A (en) | Semi-conductor producing | |
JPS51126052A (en) | Semi-conductor equipment | |
JPS53116077A (en) | Etching method | |
JPS5373504A (en) | Removal of octafluoroisobutene | |
JPS543473A (en) | Manufacture of semiconductor device | |
JPS51116355A (en) | Gasket having graphite | |
JPS5359368A (en) | Plasma etching | |
JPS533169A (en) | Production of semiconductor device | |
JPS51117254A (en) | Corrosion-resisting bearing with countermeasure for prevention of pit-corrosion of rolling surface | |
JPS5221574A (en) | Vacuum multiplying force device | |
JPS5216171A (en) | Mask fitting device | |
JPS5220764A (en) | Manufacturing system of mesa type semi-conductor unit | |
JPS51133046A (en) | High reduction rate objective lens | |
JPS51123790A (en) | Surfactant | |
JPS51123787A (en) | Surfactant | |
JPS51112279A (en) | Semiconductor device | |
JPS5368070A (en) | Etching method | |
JPS5235891A (en) | Composition method for blade rest spring for joint | |
JPS5311581A (en) | Etching method | |
JPS5287986A (en) | Etching method | |
JPS5335849A (en) | Shaft sealing method and equipment |